Measuring device for determining an extrapolated position of an object, processing device, method for determining an extrapolated position of an object, computer program and computer-readable medium

Abstract

Measuring device (10) for determining an extrapolated position (RC) of an object (7) with at least one measuring control device (12), characterized in that the measuring device (10) is configured to - to carry out respective measurement processes at at least two different times in order to determine the respective positions (RA, RB) of the object (7) at the at least two times in a given reference system (R1), and - to determine the extrapolated position (RC) of the object (7) from the at least two positions (RA, RB) according to a predetermined extrapolation procedure, wherein - the measuring device (10) comprises at least one laser diode measuring beam device (11) which is configured to output at least one measuring beam (14) along a predetermined respective beam path for the projection of a predetermined measuring pattern area (9) onto a surface (8) of the object (7) in the respective measuring process, - the measuring device (10) comprises at least one detector device (13) which is configured to detect at least one reflected measuring beam (15) of the at least one measuring beam (14) in the respective measuring process, which is reflected at a respective reflection point (16) of the at least one measuring beam (14) of the predetermined measuring pattern area (9) on the surface (8) of the object (7), and to determine reflection point coordinates (17) of the at least one reflection point (16) with respect to the predetermined reference system (R1), - the at least one measuring control device (12) is configured to identify a predetermined referencing feature (26) of the object (7) according to a predetermined identification procedure by means of the at least one reflection point (16) of the predetermined measurement pattern area (9) on the surface (8) of the object (7) of the respective measurement process, wherein a predetermined position of the predetermined referencing feature (26) in relation to the object (7) is stored in the at least one measuring control device (12), - which is equipped to determine, according to a predetermined position determination procedure, a position of the predetermined referencing feature (26) in relation to the predetermined reference system (R1) as a function of the reflection point coordinates (17) of the at least one reflection point (16) in relation to the predetermined reference system (R1), - to determine the position (RA, RB) of the object (7) in the reference system (R1) of the respective measurement process from the position of the referencing feature (26) in relation to the predetermined reference system (R1) and the position of the referencing feature (26) in relation to the object, wherein - the measuring device (10) is configured as a time-of-flight lidar, wherein the at least one laser diode measuring beam device (11) is configured to output the at least one measuring beam (14) in pulsed form, wherein the at least one detector device (13) is configured to detect the reflection point coordinates (17) of the respective at least one reflection point (16) using a time-of-flight measurement which describes a measurement of the time of flight of the respective reflected measuring beam (15) from a time of emission of the measuring beam (14) by the laser diode measuring beam device (11) until a time of reception of the reflected measuring beam (15) by the detector device (13), and / or - the measuring device (10) is configured as a modulated continuous-wave lidar, wherein the at least one laser diode measuring beam device (11) is configured to output the at least one measuring beam (14) in a time-modulated manner, and the at least one detector device (13) is configured to determine the reflection point coordinates (17) of the respective at least one reflection point (16) using a modulation deviation between a current modulation of the measuring beam (14) and a detected modulation of the reflected measuring beam (15), and / or - the measuring device (10) is configured as an intensity lidar, wherein the at least one laser diode measuring beam device (11) is configured to output the at least one measuring beam (14) with a predetermined output intensity, and the at least one detector device (13) is configured to detect a received intensity of the respective reflected measuring beam (15), wherein the at least one detector device (13) is configured to determine the reflection point coordinates (17) of the respective at least one reflection point (16) as a function of an intensity difference between the output intensity and the received intensity, and / or - the measuring device (10) is configured to output the measuring beams (14) simultaneously, and / or - which is equipped to determine a height distribution of the measurement pattern area (9) in the predetermined identification procedure and to identify the predetermined referencing feature (26) of the object (7) depending on a predetermined height feature of the predetermined referencing feature (26).

Description

[0001] The invention relates to a measuring device for determining an extrapolated position of an object according to the features of the preamble of claim 1. The invention also relates to a processing device comprising at least one measuring device according to the features of claim 14, a method for operating a measuring device according to the features of claim 16, a computer program according to the features of claim 17, and a computer-readable medium according to the features of claim 18.

[0002] Processing devices for laser-based processing of an object are known from the prior art and are used, for example, in the surface treatment of metal objects. Another area of ​​application for laser-based processing devices is medical technology. Laser-based processing devices are used in medical technology, for example, to correct optical ametropia and / or pathologically or abnormally altered areas of the cornea. For example, a pulsed laser and a beam focusing device can be configured such that laser pulses in a focus located within an organic tissue cause photodisruption and / or photoablation in order to remove tissue, in particular a tissue lenticle, from the cornea.

[0003] The beam focusing device is configured to focus the processing laser for processing the object on predefined points whose positions are defined relative to the object. The predefined points can be arranged in a predefined pattern in or on the object, for example, to provide a predefined separation surface. During processing of the object, the processing laser beam can be sequentially focused by the processing device on the predefined points in order to incorporate the predefined pattern into the object and / or to cut the object along the predefined points.

[0004] Especially with relatively finely designed patterns, it is necessary to fix the object to be processed appropriately to minimize movement and vibration during processing and to avoid incorrect processing. However, adequate fixation of the object may not be possible, or even a possible fixation may not be sufficient to minimize movement and / or vibration to a sufficient extent.

[0005] In order to compensate for movements and / or vibrations of the object during processing, it is common practice to record the movement of the object using a measuring device and to control the processing laser in such a way that the movement of the object is taken into account. This method is used, among other things, in eye treatment when the object is an eye. In this context, this process is referred to as eye tracking. Here, the gaze direction of the eye is recorded at different times during an eye treatment and, based on the recorded gaze directions, a future gaze direction of the eye is predicted in order to align the processing laser according to the future gaze direction of the eye. This means that the desired pattern is provided on the eye despite the movement of the eye.

[0006] For example, it is known from the prior art to project a predetermined infrared pattern onto the eye, which is then captured by a camera unit of the measuring device. The disadvantages of this type of eye tracking are the relatively high computational effort required to capture the pattern in images, as well as the necessary provision of a corresponding light source, which increases the space required for the measuring device.

[0007] US 2020 / 0142479 A1 discloses an eye tracking method, an eye tracking system, and an integration of the eye tracking system into wearable head-up displays. The eye tracking method for tracking a gaze position of an eye in a target space within a field of view of the eye over an eye tracking period involves performing a plurality of scans of the eye with infrared light within the eye tracking period. Each scan comprises generating infrared light signals over a scanning period and projecting the infrared light signals from a plurality of virtual light projectors onto the eye to form a plurality of illumination areas on the eye. During each scan, the reflections of the infrared light signals from the eye are detected. The gaze position of the eye in the target space is determined from the detected reflections of the infrared light signals for each scan.

[0008] EP 3 371 973 B1 describes eye tracking using a diffraction pattern of coherent light on an ocular surface. An eye tracking system images the ocular surface of each eye of a user to capture an optical flow field resulting from a texture of the imaged ocular surface. The eye tracking system comprises an illumination source and a detector. The illumination source illuminates a portion of the eye, which the detector images. As the eye moves, different areas of the eye are imaged, allowing a map of a portion of the eye to be created. An image of a portion of the eye contains a diffraction pattern corresponding to the portion of the eye. Through a calibration process, the optical flow is mapped to a location at which the eye is looking.

[0009] EP 3 757 655 A1 describes a method, a system and a non-transitory computer-readable storage medium for performing a three-dimensional 3D position estimation for the corneal center of a user's eye using a remote eye tracking system.

[0010] The invention is based on the object of providing a measuring device which enables a space-saving and low-computation-intensive determination of a future position of the object.

[0011] This object is achieved by the measuring device according to the invention according to the features of claim 1, the processing device according to the invention according to the features of claim 14, the method according to the invention according to the features of claim 16, the computer program according to the invention according to the features of claim 17 and the computer-readable medium according to the invention according to the features of claim 18. Advantageous embodiments with expedient further developments of the invention are specified in the respective subclaims, wherein advantageous embodiments of each aspect of the invention are to be regarded as advantageous embodiments of the respective other aspects of the invention.

[0012] A first aspect of the invention relates to a measuring device for determining an extrapolated position of an object, comprising at least one measurement control device. In other words, the measuring device is configured to determine a future position of the object using an extrapolation method. The measuring device is configured to perform respective measuring processes at at least two different times in order to determine respective positions of the object at the at least two times in a predetermined reference system. In other words, the measuring device is configured to determine, in each of the measuring processes, the position that the object has at the respective times. The predetermined reference system can, for example, describe a Cartesian coordinate system, which can be described with respect to a predetermined reference point and predetermined reference directions.The reference point can, for example, be related to the measuring device or a processing laser of a processing device.

[0013] The measuring device is configured to determine the extrapolated position of the object from the at least two positions according to a predetermined extrapolation method. In other words, the measuring device is configured to determine the extrapolated position of the object from the at least two positions of the object according to the predetermined extrapolation method, which describes a position of the object at a specific future point in time. The extrapolated position of the object can, for example, be provided to a processing device in order to align a beam path of a processing laser and / or a focus of the processing laser depending on the extrapolated position of the object.

[0014] The measuring device comprises at least one laser diode measuring beam device configured to emit at least one measuring beam along a predetermined respective beam path for projecting a predetermined measurement pattern area onto a surface of the object during a respective measuring process. In other words, the laser diode measuring beam device of the measuring device is configured to emit the at least one measuring beam onto the object along the predetermined beam path in order to image the predetermined measurement pattern area on the surface of the object. The predetermined measurement pattern area can be defined by predetermined geometric relationships between the predetermined beam path of the at least one measuring beam and predetermined beam paths of other measuring beams.The predefined measurement pattern surface can specify a predetermined arrangement of reflection points of respective measuring beams and / or a reflection surface to be generated on the surface by the at least one measuring beam, wherein the reflection surface can have a predefined or known intensity distribution. The laser diode measuring beam device can, for example, have at least one lens mirror device, which can be configured in particular as a MEMS, which can have at least one mirror unit that can be aligned in a predefined direction by means of an actuator. The measuring device can have one or a plurality of radiation sources. The one or more radiation sources can be aligned in predefined directions by one or more actuators. Additionally or alternatively, it can be provided that the laser diode measuring beam device can be configured as an array, which can have multiple radiation sources.Based on the exemplary features, the measuring beam device can be configured to output the at least one measuring beam in a respective, predetermined direction. It can be provided that the laser diode measuring beam device is configured as a digital mirror device having a plurality of mirrors. The mirrors can be individually adjusted to either output the respective measuring beam or to block the output. The design as a digital mirror device can make it possible to provide the measuring pattern area by adjusting the respective mirrors. A respective mirror can be assigned to each of the beam sources. The laser diode measuring beam device can also be configured to align the measuring beam in a predetermined direction by positioning the mirror.The alignment of the mirror can be adjusted by the laser diode measuring beam device to emit the measuring beam in different directions during a measurement process, for example, to enable scanning of the surface. The laser diode measuring beam device can be configured to adjust the wavelength of the measuring beam within a predetermined spectrum. The laser diode measuring beam device can be configured, for example, as a tunable laser device.

[0015] The measuring device comprises at least one detector device configured to detect at least one reflected measuring beam of the measuring beam during the respective measuring process. The at least one reflected measuring beam can be the at least one measuring beam that is reflected by a reflection of the measuring beam emitted by the laser diode measuring beam device at at least one respective reflection point on the surface of the object. The detector device is configured to determine reflection point coordinates of the at least one reflection point of the measuring pattern surface with respect to the predetermined reference system.In other words, the measuring device comprises at least one detector device configured to detect the at least one reflected measuring beam and to determine the reflection point coordinates of the at least one reflection point at which the at least one measuring beam is reflected on the surface of the object. The detector device can be configured to determine the reflection point coordinates of the at least one reflection point with respect to the predetermined reference system using a prior art method, for example, by means of triangulation, intensity measurement, or time-of-flight detection.

[0016] The at least one measurement control device is configured to identify a predetermined reference feature with respect to the object using a predetermined identification method, using the at least one reflection point of the predetermined measurement pattern area of ​​the respective measurement process. The predetermined reference feature is stored in the at least one measurement control device. The predetermined reference feature can, for example, be a region of the object that can be identified, for example, due to a particular characteristic of the object, and can be particularly suitable for determining the position of the object.

[0017] The at least one measurement control device is configured to determine a position of the predetermined reference feature relative to the predetermined reference system according to a predetermined position determination method, depending on the reflection point coordinates of the at least one reflection point of the measurement pattern surface. In other words, the measurement control device is provided to use the at least one reflection point in the predetermined identification method to identify the predetermined reference feature of the object. In the predetermined identification method, for example, a detected intensity of the reflection point or the reflection point coordinates can be used to identify the reference feature of the object.For example, it can be provided that the presence of the predetermined reference feature is determined by the at least one measurement control device when the detected intensity of the at least one reflection point exceeds a predetermined threshold value. This can be the case, for example, if the reference feature is a predetermined point on the object that can be easily delimited from other areas of the object based on its reflection properties. The position of the reference feature relative to the object is stored in the at least one measurement control device.

[0018] The at least one measurement control device is configured to determine, according to a predetermined position determination method, a position of the predetermined referencing feature relative to the predetermined reference system as a function of the reflection point coordinates of at least one reflection point relative to the predetermined reference system. In this case, it can be provided that the reflection point coordinates of the reflection point whose intensity value exceeds the predetermined threshold value are defined as the position of the reference feature relative to the predetermined reference system. In other words, the predetermined position determination method determines the location of the reference feature of the object in the reference system.

[0019] At least one measurement control device is configured to determine the position of the object in the reference system of the respective measurement process from the position of the reference feature relative to the predetermined reference system and the position of the referencing feature relative to the object. In other words, the position of the predetermined referencing feature of the object is known both relative to the predetermined reference system and relative to the object. Based on the known position of the predetermined referencing feature relative to the reference system, the at least one measurement control device is capable of determining the position of the object relative to the predetermined reference system.

[0020] The invention provides the advantage that positions of the object can be recorded from respective measurement processes using the Lidar method and used to predict the future position.

[0021] It is provided that the measuring device is configured as a time-of-flight measuring lidar. In other words, the measuring device is a lidar device which is configured to determine a distance of a reflection point from the sensor device or another reference using a time-of-flight measurement. Lidar stands for light detection and ranging or light imaging, detection and ranging. The laser diode measuring beam device is configured to output the at least one measuring beam in pulsed form. In other words, it is provided that the at least one measuring beam is not output as a continuous wave, but only as time-limited pulses with a predetermined pulse duration. The output of the at least one measuring beam is thus effected in such a way that the respective output during the measuring process has a predetermined start time and a predetermined end time.The at least one detector device is configured to detect the coordinates of the at least one reflection point using a time-of-flight measurement, which describes a measurement of a time-of-flight of the respective reflected measuring beam from a time of transmission by the laser diode measuring beam device to a time of reception of the reflected measuring beam by the detector device. In other words, the detector device is configured to determine a time from which the transmitted pulse is received by the detector device. The measuring device is configured to determine the time-of-flight from the time of transmission of the pulse and the time of reception of the pulse by the measuring device. Taking geometric relationships into account, the distance between the reflection point and the detector device can be determined from the time-of-flight.Taking into account the determined distance, the detector device can determine the reflection point coordinates of the respective reflection point.

[0022] The measuring device can, for example, be configured to determine a reception time at which the respective reflected measuring beam is detected by the detector device. The measuring device can, for example, be configured to specify a respective emission time of the measuring beam by the laser diode measuring beam device and / or to retrieve it from the laser diode measuring beam device. The measuring device can be configured to retrieve the reception time of the reflected measuring beam by the detector device from the detector device and to determine a travel time of the measuring beam from a time difference between the emission time and the reception time. If the beam path of the measuring beam is known, a distance of the reflection point to the detector device and thus to the surface of the object can be determined by the measuring device from the travel time of the measuring beam.The measuring device can also be configured to determine a direction of the reflection point with respect to the at least one detector device. For this purpose, the detector device can, for example, have a predetermined two-dimensional pattern of detector units. The detector device can be configured to determine the detector unit that receives the reflected measuring beam. As a result, an impact position of the reflected measuring beam on the detector device is known. The detector device can, for example, be configured to determine the reflection point coordinates of the reflection point with respect to the predetermined reference system from a position of the detector device, a position of the laser diode measuring beam device, the beam path, and the travel time of the measuring beam.The predetermined reference system may be defined by a reference origin and reference directions, which may be defined, for example, with respect to a processing device which may comprise the measuring device.

[0023] Additionally or alternatively, it is provided that the measuring device is configured as a modulated continuous wave lidar. In other words, the measuring device is configured to emit the at least one measuring beam over a predetermined period of time during the measuring process, wherein the at least one measuring beam has a time-dependent predetermined modulation. The modulation can relate, for example, to a frequency of the at least one measuring beam. The at least one detector device is configured to determine the coordinates of the respective reflection points using a modulation deviation between a current modulation and a detected modulation of the reflected measuring beam. In other words, the modulation exhibited by the reflected measuring beam detected by the detector device can be related to the emitted at least one measuring beam, whereby a propagation time can be determined.

[0024] Additionally or alternatively, it is provided that the measuring device is configured as an intensity lidar, wherein the at least one laser diode measuring beam device is configured to output the at least one measuring beam with an output intensity, and the at least one detector device is configured to detect a reception intensity of the respective reflected measuring beam.

[0025] The at least one detector device is configured to determine the reflection point coordinates of the respective at least one reflection point as a function of an intensity difference between the output intensity and the received intensity. In other words, the measuring device is configured to determine the coordinates of the at least one reflection point from a difference between an intensity of the measuring beam emitted by the laser diode measuring beam device and an intensity of the reflected measuring beam received by at least one detector device.

[0026] Additionally or alternatively, the measuring device is configured to emit the measuring beams simultaneously. In other words, the measuring beams are emitted at an identical time during a measuring process. For example, the measuring beams can be emitted by splitting an original beam into the measuring beams using an optical system. This refinement offers the advantage of reducing the duration of a measuring process.

[0027] Additionally or alternatively, it is provided that the at least one measurement control device is configured to determine a height distribution of the measurement sample surface in the predetermined identification method and to identify the predefined reference feature of the object as a function of a predefined height feature of the predefined reference feature. In other words, the measurement control device is configured to determine the height distribution of the measurement sample surface. The height distribution of the measurement sample surface can be determined, for example, from reflection point coordinates on the surface. The measuring device is configured to carry out the predetermined identification method, taking into account the determined height distribution of the measurement sample surface, in order to identify the predefined reference feature.The reference feature of the object is identified depending on the specified height feature of the object in the measurement sample area. It can therefore be provided that the specified height feature describes a specified threshold value, which describes a height difference between the reference feature and other areas of the object. The predetermined height feature can, for example, specify that a reference feature provided as a point has a maximum height with respect to a reference. In particular, it can be provided to identify an apex of an eye as a reference feature of the object based on a characteristic height profile as a height feature.

[0028] The invention also includes further developments which result in additional advantages.

[0029] A further development of the invention provides that the object is a human or animal eye. In other words, the measuring device is configured to determine a position of a volume model of a human or animal eye in the reference system. The measuring device is configured to determine the extrapolated position of the volume model from the at least two positions. This results in the advantage that the measuring device is configured to perform so-called eye tracking. The extrapolated position of the volume model can be used, for example, in a laser treatment of the eye or in devices configured to provide virtual reality.

[0030] A further development of the invention provides that the at least one laser diode measuring beam device is configured to output the at least one measuring beam as a collimated beam. In other words, the laser diode measuring beam device is configured to output the at least one measuring beam with a focal point located at infinity. The at least one laser diode measuring beam device can, for example, have a collimator through which the generated measuring beam can be guided before being directed onto the object.

[0031] A further development of the invention provides that the at least one laser diode measuring beam device has at least one expansion element in the respective beam path of the at least one measuring beam, which expansion element is designed to expand the at least one measuring beam to a predetermined optical beam diameter in order to generate the at least one reflection point of the measuring pattern with a predetermined reflection surface on the surface of the object. In other words, it is provided that the laser diode measuring beam device is designed to provide the at least one measuring beam with a predetermined optical beam diameter. In order to provide the measuring beam with the predetermined optical beam diameter, the laser diode measuring beam device comprises at least one expansion element.The expansion element can, for example, comprise lenses arranged in a reverse Galilean arrangement and can have a converging lens and a diverging lens. The laser diode measuring beam device is configured to guide the measuring beam through the expansion element so that the optical beam diameter of the measuring beam is enlarged by the expansion element to the predetermined optical beam diameter. For example, it can be provided that the laser diode measuring beam device can provide the measuring beam with an optical beam diameter of 2-4 mm by means of the expansion element. In other words, the measuring beam provided by the laser diode measuring beam device can have the beam diameter which is, for example, 2.0 mm, 2.1 mm, 2.2 mm, 2.3 mm, 2.4 mm, 2.5 mm, 2.6 mm, 2.7 mm, 2.8 mm, 2.9 mm, 3.0 mm, 3.1 mm, 3.2 mm, 3.3 mm, 3.4 mm, 3.5 mm, 3.6 mm, 3.7 mm, 3.8 mm, 3.9 mm or 4.0 mm.A beam diameter of 2 mm to 4 mm can be provided, for example, if the at least one measuring beam is intended to provide a measurement pattern area for detecting a corneal apex. The laser diode measuring beam device can also be configured to provide a measuring beam with a beam diameter of up to 3 cm. In other words, the beam diameter can be 0.1 cm, 0.2 cm, 0.3 cm, 0.4 cm, 0.5 cm, 0.6 cm, 0.7 cm, 0.8 cm, 0.9 cm, 1.0 cm, 1.1 cm, 1.2 cm, 1.3 cm, 1.4 cm, 1.5 cm, 1.6 cm, 1.7 cm, 1.8 cm, 1.9 cm, 2.0 cm, 2.1 cm, 2.2 cm, 2.3 cm, 2.4 cm, 2.5 cm, 2.6 cm, 2.7 cm, 2.8 cm, 2.9 cm or 3.0 cm. The provision of this beam diameter can be provided, for example, if a measurement pattern area is to be provided for detecting an eye. The widening of the measurement beam makes it possible to generate a measurement pattern area with one measurement beam.It can also be provided that several measuring beams are guided through respective expansion elements or at least one expansion element in order to increase their beam diameter.

[0032] A further development of the invention provides that the laser diode measuring beam device is configured to output a plurality of measuring beams along predetermined respective beam paths for projecting the predetermined measuring pattern area onto the surface of the object during the respective measuring process. In other words, the laser diode measuring beam device is configured to output a plurality of the measuring beams during the respective measuring process for projecting the predetermined measuring pattern area onto the surface of the object. It is thus provided that the predetermined measuring pattern area is generated by a plurality of measuring beams. The measuring beams can be guided along respective, different beam paths, so that the predetermined measuring pattern area can have a plurality of reflection points.This refinement offers the advantage that the measurement sample surface can have multiple reflection points, each of which can have its own reflection point coordinates. This makes it possible to determine the location of the feature from multiple reflection point coordinates.

[0033] A further development of the invention provides that the measuring device is configured to output the measuring beams sequentially during a measuring process. In other words, the respective measuring beams are output one after the other. For example, it can be provided that the object is scanned during a measuring process, with the individual measuring beams being output one after the other. The measuring device can, for example, be configured to direct the original beam onto a mirror and change the orientation of the mirror during the measuring process in order to provide the individual measuring beams along the respective beam paths.

[0034] A further development of the invention provides that the measurement control device is configured to determine an intensity distribution of the measurement pattern area for the predetermined identification method. In other words, the measurement control device is configured to determine which intensity the predetermined measurement pattern area has at respective positions on the surface of the object. In other words, the measurement control device is configured for spatially resolved intensity detection of the measurement pattern area. In particular, it can be provided that the measurement pattern area has a plurality of reflection points. The measurement control device is configured to detect the intensity of the at least one measurement beam reflected by a respective reflection point. As a result, the intensity of the respective reflected measurement beam can be assigned to each of the reflection points.Additionally or alternatively, it can be provided that the measurement control device is configured to determine the intensity distribution within a respective reflection point. This is particularly advantageous if the reflection point is generated by a measuring beam with an enlarged beam diameter. The measurement control device can thus be configured to determine how the intensity is distributed within the respective reflection point. The measuring device is configured to identify the predetermined referencing feature of the object in accordance with a predetermined intensity feature of the predetermined referencing feature using predetermined identification methods. The predetermined intensity feature can, for example, describe a property which is related to the intensity of the referencing feature and enables identification of the referencing feature based on the intensity.The predefined intensity feature can, for example, specify a threshold value, whereby the referencing feature can be identified by the intensity falling below or exceeding the threshold value. This can, for example, make it possible to identify all referencing features defined as points or areas based on their reflection behavior. For example, it can be provided that the referencing feature is a predefined area. This can have a surface texture that absorbs and acts, whereby reflection points within the predefined area have a lower intensity than reflection points located outside the predefined area. This makes it possible to identify the predefined area by the intensity of the respective reflection points falling below the threshold.

[0035] A further development of the invention provides that the referencing feature comprises at least one predetermined reference point of the object. In other words, the referencing feature is at least one predetermined reference point. The referencing feature can also have several reference points. For example, it can be provided that the referencing feature can have one or more points that can be reliably detected by the measuring device. The predetermined reference points can also be characterized in that their respective position in relation to the object is precisely known and relatively independent of the boundary conditions of the measuring process. It can therefore be provided that the at least one reference feature comprises at least one reference point of the object that is arranged on a relatively strong area of ​​the object.This has the advantage that it can be assumed that the position of the reference point in relation to the object does not change due to local deformations of the object.

[0036] A further development of the invention provides that the reference feature comprises a predetermined surface topology of the surface of the object. In other words, the measuring device is configured to identify the predetermined surface topology of the surface of the object and to determine the position of the surface topology. It can be provided that the at least one reference feature comprises a characteristic depression in a height profile of the object.

[0037] In other words, the measuring device is configured to detect the predefined surface topology of the surface of the object. Because the reflection point coordinates of the reflection points are specified with respect to the predefined reference system, the measurement control device is capable of also determining the surface topology of the surface of the object with respect to the predefined reference system. The at least one measurement control device can, for example, be configured to arrange the respective reflection point coordinates of the reflection points in a point cloud and to connect the reflection points of the point cloud to one another according to a predefined method, such as a marching cubes algorithm. The position determination can, for example, comprise searching for a section of the surface of the object whose surface topology has a maximum match with the predefined surface topology.The position of the surface topology in the object can be determined, for example, in a coordinate system of the object.

[0038] A further development of the invention provides that the at least one reference feature comprises a predefined volume model of the object. In other words, the measuring device is configured to detect a predefined volume model of the object as a reference feature. The at least one measurement control device is configured to identify the predefined volume model of the object and to determine a position of the volume model of the object.

[0039] A further development of the invention provides that the laser diode measuring beam device comprises at least one surface emitter unit. In other words, the measuring device is configured to emit measuring beams through the at least one surface emitter unit. The surface emitter unit is designed, in particular, as a semiconductor element configured to emit a measuring beam perpendicular to the plane of the semiconductor element. This further development of the invention provides the advantage that the laser diode measuring beam device can be provided in a space-saving and cost-effective manner.

[0040] A further development of the invention provides that the laser diode measuring beam device comprises at least one surface emitter array. In other words, the laser diode measuring beam device has at least one array for emitting the measuring beams, which array comprises a plurality of surface emitter units. The surface emitter array can be a one-dimensional or two-dimensional arrangement of surface emitter units in a plane. The surface emitter units can be provided, for example, in a checkerboard pattern. This further development offers the advantage that the laser diode measuring beam device enables the emission of multiple measuring beams.

[0041] A further development of the invention provides that the laser diode measuring beam device is configured to emit the measurement pattern in an infrared spectrum and / or a near-infrared spectrum. In other words, the measuring beams emitted by the laser diode measuring beam device have wavelengths in the infrared spectrum and / or in the near-infrared spectrum. The measuring beams can thus have a wavelength in the near-infrared spectrum between 780 and 3000 nm, in particular in the infrared spectrum between 780 nm and 1000 nm. This further development provides the advantage that the measuring beams have a wavelength range that causes minimal damage to surfaces. This makes it possible to use the measuring device even on sensitive surfaces, in particular biological surfaces.

[0042] A second aspect of the invention relates to a processing device with at least one processing laser for processing an object and at least one processing control device, wherein the processing device comprises at least one measuring device for determining an extrapolated position of the object with at least one measuring control device.

[0043] In other words, the measuring device is configured to determine a future position of the object using an extrapolation method. The measuring device is configured to carry out respective measuring processes at at least two different points in time in order to determine respective positions of the object at the at least two points in time in a predetermined reference system. In other words, the measuring device is configured to determine the position that the object has at the respective points in time in a respective one of the measuring processes. The predetermined reference system can, for example, describe a Cartesian coordinate system, which can be described with reference to a predetermined reference point and predetermined reference directions. The reference point can, for example, be related to the measuring device or a processing laser of a processing device.

[0044] The measuring device is configured to determine the extrapolated position of the object from the at least two positions according to a predetermined extrapolation method. In other words, the measuring device is configured to determine the extrapolated position of the object from the at least two positions of the object according to the predetermined extrapolation method, which describes a position of the object at a specific future point in time. The extrapolated position of the object can, for example, be provided to a processing device in order to align a beam path of a processing laser and / or a focus of the processing laser depending on the extrapolated position of the object.

[0045] The measuring device comprises at least one laser diode measuring beam device configured to emit at least one measuring beam along a predetermined respective beam path for projecting a predetermined measurement pattern area onto a surface of the object during a respective measuring process. In other words, the laser diode measuring beam device of the measuring device is configured to emit the at least one measuring beam onto the object along the predetermined beam path in order to image the predetermined measurement pattern area on the surface of the object. The predetermined measurement pattern area can be defined by predetermined geometric relationships between the predetermined beam path of the at least one measuring beam and predetermined beam paths of other measuring beams.The predefined measurement pattern surface can specify a predetermined arrangement of reflection points of respective measuring beams and / or a reflection surface to be generated on the surface by the at least one measuring beam, wherein the reflection surface can have a predefined or known intensity distribution. The laser diode measuring beam device can, for example, have at least one lens mirror device, which can be configured in particular as a MEMS, which can have at least one mirror unit that can be aligned in a predefined direction by means of an actuator. The measuring device can have one or a plurality of radiation sources. The one or more radiation sources can be aligned in predefined directions by one or more actuators. Additionally or alternatively, it can be provided that the laser diode measuring beam device can be configured as an array, which can have multiple radiation sources.Based on the exemplary features, the measuring beam device can be configured to output the at least one measuring beam in a respective, predetermined direction. It can be provided that the laser diode measuring beam device is configured as a digital mirror device having a plurality of mirrors. The mirrors can be individually adjusted to either output the respective measuring beam or to block the output. The design as a digital mirror device can make it possible to provide the measuring pattern area by adjusting the respective mirrors. A respective mirror can be assigned to each of the beam sources. The laser diode measuring beam device can also be configured to align the measuring beam in a predetermined direction by positioning the mirror.The alignment of the mirror can be adjusted by the laser diode measuring beam device to emit the measuring beam in different directions during a measurement process, for example, to enable scanning of the surface. The laser diode measuring beam device can be configured to adjust the wavelength of the measuring beam within a predetermined spectrum. The laser diode measuring beam device can be configured, for example, as a tunable laser device.

[0046] The measuring device comprises at least one detector device configured to detect at least one reflected measuring beam of the measuring beam during the respective measuring process. The at least one reflected measuring beam can be the at least one measuring beam that is reflected by a reflection of the measuring beam emitted by the laser diode measuring beam device at at least one respective reflection point on the surface of the object. The detector device is configured to determine reflection point coordinates of the at least one reflection point of the measuring pattern surface with respect to the predetermined reference system.In other words, the measuring device comprises at least one detector device configured to detect the at least one reflected measuring beam and to determine the reflection point coordinates of the at least one reflection point at which the at least one measuring beam is reflected on the surface of the object. The detector device can be configured to determine the reflection point coordinates of the at least one reflection point with respect to the predetermined reference system using a prior art method, for example, by means of triangulation, intensity measurement, or time-of-flight detection.

[0047] The at least one measurement control device is configured to identify a predetermined reference feature with respect to the object using a predetermined identification method, using the at least one reflection point of the predetermined measurement pattern area of ​​the respective measurement process. The predetermined reference feature is stored in the at least one measurement control device. The predetermined reference feature can, for example, be a region of the object that can be identified, for example, due to a particular characteristic of the object, and can be particularly suitable for determining the position of the object.

[0048] The at least one measurement control device is configured to determine a position of the predetermined reference feature relative to the predetermined reference system according to a predetermined position determination method, depending on the reflection point coordinates of the at least one reflection point of the measurement pattern surface. In other words, the measurement control device is provided to use the at least one reflection point in the predetermined identification method to identify the predetermined reference feature of the object. In the predetermined identification method, for example, a detected intensity of the reflection point or the reflection point coordinates can be used to identify the reference feature of the object.For example, it can be provided that the presence of the predetermined reference feature is determined by the at least one measurement control device when the detected intensity of the at least one reflection point exceeds a predetermined threshold value. This can be the case, for example, if the reference feature is a predetermined point on the object that can be easily delimited from other areas of the object based on its reflection properties. The position of the reference feature relative to the object is stored in the at least one measurement control device.

[0049] The at least one measurement control device is configured to determine, according to a predetermined position determination method, a position of the predetermined referencing feature relative to the predetermined reference system as a function of the reflection point coordinates of at least one reflection point relative to the predetermined reference system. In this case, it can be provided that the reflection point coordinates of the reflection point whose intensity value exceeds the predetermined threshold value are defined as the position of the reference feature relative to the predetermined reference system. In other words, the predetermined position determination method determines the location of the reference feature of the object in the reference system.

[0050] At least one measurement control device is configured to determine the position of the object in the reference system of the respective measurement process from the position of the reference feature relative to the predetermined reference system and the position of the referencing feature relative to the object. In other words, the position of the predetermined referencing feature of the object is known both relative to the predetermined reference system and relative to the object. Based on the known position of the predetermined referencing feature relative to the reference system, the at least one measurement control device is capable of determining the position of the object relative to the predetermined reference system.

[0051] The respective processing laser can be configured to process a predefined object. For example, the respective processing laser can be configured to at least partially separate a corneal volume with predefined interfaces of a human or animal eye by means of photodisruption and / or to remove corneal layers by means of ablation and / or to cause a laser-induced refractive index change in the cornea and / or the lens of the eye.

[0052] A further development of the invention provides that the processing control device of the processing devices is configured to change an alignment and / or focusing of the respective processing laser for processing the object depending on the extrapolated position of the volume model and / or the movement of the volume model. In other words, the processing control device is configured to align and / or focus the respective processing laser. The processing control device is configured to adjust the alignment and / or focusing of the respective processing laser depending on the determined extrapolated position of the volume model. For example, it can be provided that the respective processing laser is aligned and / or focused depending on the extrapolated position of the volume model so that a movement of the object can be compensated.

[0053] A third aspect of the invention relates to a method for operating a measuring device for determining an extrapolated position of an object by means of a measuring device with at least one measurement control device. In the method, the measuring device performs respective measuring processes at at least two different times, wherein respective positions of the object are determined in a reference system at the at least two times. The measuring device determines the extrapolated position of the object from the at least two positions according to a predetermined extrapolation method.

[0054] The method provides that, during the respective measuring process, at least one measuring beam is emitted by at least one laser diode measuring beam device of the measuring apparatus along a predetermined respective beam path for projecting a predetermined measuring pattern area onto a surface of the object. During the respective measuring process, at least one reflected measuring beam of the at least one measuring beam is detected by at least one detector device of the measuring apparatus, which is reflected at a respective reflection point of the at least one measuring beam of the predetermined measuring pattern area on the surface of the object. The at least one detector device determines reflection point coordinates of the at least one reflection point with respect to the predetermined reference system.

[0055] By means of the at least one measurement control device of the measuring device, a predetermined reference feature of the object is identified according to a predetermined identification method by means of the at least one reflection point of the predetermined measurement pattern on the surface of the object.

[0056] It is provided that a predetermined position of the predetermined referencing feature relative to the object is stored in the at least one measurement control device. The at least one measurement control device of the measuring device determines a position of the predetermined referencing feature relative to the predetermined reference system according to a predetermined position determination method, depending on the reflection point coordinates of the at least one reflection point relative to the predetermined reference system.

[0057] The at least one measurement control device of the measuring device determines the position of the object in the reference system of the respective measuring process from the position of the referencing feature in relation to the predetermined reference system and the position of the referencing feature in relation to the object.

[0058] The respective method may include at least one additional step that is executed precisely when a use case or application situation occurs that has not been explicitly described here. This step may, for example, include outputting an error message and / or a request for user feedback. Additionally or alternatively, it may be provided that a default setting and / or a predetermined initial state is set.

[0059] A further aspect of the invention relates to a computer program. The computer program comprises instructions that, for example, form a program code. The program code can comprise at least one control data set with the respective control data for the respective laser. When the program code is executed by a computer or a computer network, it is caused to execute the previously described method or at least one embodiment thereof.

[0060] A further aspect of the invention relates to a computer-readable medium (storage medium) on which the aforementioned computer program or its instructions are stored. To execute the computer program, a computer or a computer network can access the computer-readable medium and read its contents. The storage medium is designed, for example, as a data memory, in particular at least partially as a volatile or non-volatile data memory. A non-volatile data memory can be a flash memory and / or an SSD (solid state drive) and / or a hard disk. A volatile data memory can be a RAM (random access memory). The instructions can be present, for example, as source code of a programming language and / or as assembler and / or as binary code.

[0061] Further features and advantages of one of the described aspects of the invention may arise from the further development of another aspect of the invention. The features of the embodiments of the invention may thus be present in any combination with one another, unless explicitly described as mutually exclusive.

[0062] Additional features and advantages of the invention are described below with reference to the figures in the form of advantageous exemplary embodiments. The features or combinations of features of the exemplary embodiments described below can be present in any combination with one another and / or with the features of the embodiments. This means that the features of the exemplary embodiments can supplement and / or replace the features of the embodiments, and vice versa. Thus, the invention also encompasses and discloses configurations that are not explicitly shown or explained in the figures, but which emerge and can be produced through separate combinations of features from the exemplary embodiments and / or embodiments.Thus, embodiments are also considered to be disclosed that do not have all the features of an originally formulated claim or that go beyond or deviate from the combinations of features set forth in the claims' references. The embodiments are shown in: Fig. 1 a schematic representation of a processing device which has a measuring device; Fig. 2 a schematic representation of a measuring device; Fig. 3 a schematic representation of another measuring device; Fig. 4 a schematic representation of another measuring device; Fig. 5 a schematic representation of another measuring device; and Fig. 6 a schematic representation of a sequence of a method for operating a measuring device.

[0063] In the figures, identical or functionally identical elements are provided with the same reference numerals.

[0064] Fig. 1 shows a schematic representation of a processing device which has a measuring device.

[0065] Fig. 1 shows a schematic representation of the processing device 1, which can have a processing laser beam source 2 and a processing control device 3. The processing laser beam source 2 can be configured to output a processing laser beam 4, which can be intended to process a surface 8 of an object 7 to be processed. The processing control device 3 can be configured to control the laser beam source and a beam deflection device 5 as well as a focusing device 6 in order to focus the processing laser beam 4 onto predetermined processing points on the object 7 to be processed. The processing laser beam 4 can be guided by the processing control device 3 such that a predetermined pattern can be generated on a surface 8 of the object 7.It can be provided that in order to process the object 7, a predetermined power and / or energy density must be exceeded by the processing laser beam 4 at the positions of the processing points in order to enable, for example, melting and / or an optical breakthrough in the object 7.

[0066] For this reason, it may be necessary for a position RA of the object 7 to be known during processing. This can ensure, for example, that the processing laser beam 4 is adapted to the position RA of the object 7 and is thus focused to the predetermined depth despite a possible change in the position RA. When the position of the object 7 changes, a situation may arise in which a latency in the adaptation of the processing laser beam 4 to a position RA of the object 7 detected during a measurement process may occur, so that the object 7 may already have a different position RB after the adaptation of the processing laser beam 4.

[0067] It may therefore be necessary to carry out a first measuring process at a first point in time in order to record the first position RA of the object 7 and to carry out a second measuring process at a second point in time in order to record the second position RB of the object 7 in order to be able to determine a future, predicted position RC of the object 7 in an extrapolation process.

[0068] To enable the determination of the object positions RA, RB of the object 7 in a predetermined reference system R1, which may, for example, be related to the processing device 1, the processing device 1 may have a measuring device 10. The measuring device 10 may have at least one laser diode measuring beam device 11, which can be operated by a measurement control device 12 of the measuring device 10. The measuring device 10 may also have at least one detector device 13. The laser diode measuring beam device 11 may be configured to emit measuring beams 14 along predetermined respective beam paths during a measuring process. The measuring beams 14 may have predetermined geometric relationships to one another, so that they can be arranged in a predetermined geometric measuring pattern.It can be provided that the emission of the measuring beams 14 by the laser diode measuring beam device 11 can take place in such a way that no adjustment of the focus of the respective measuring beams 14 occurs. The detector device 13 can be configured to detect reflected measuring beams 15 that were reflected at reflection points 16 on the surface 8 of the object 7. The detector device 13 can be configured to detect respective reflection point coordinates 17 for at least some of the reflection points 16 on the surface 8 of the object 7. The reflection points 16 can be arranged on a cornea 18, toward which the processing laser can be aligned. The detector device 13 can be configured to provide the reflection point coordinates 17 of the reflection points 16 to the measurement control device 12.The measurement control device 12 can be configured to determine a surface topology 19 of the surface 8 from the reflection point coordinates 17. For this purpose, the measurement control device 12 can be configured to arrange the reflection points 16 at respective reflection point coordinates 17 in a point cloud and to connect them to one another according to a predetermined method in order to be able to reconstruct the surface 8. The reflection point coordinates 17 can be described in the reference system R1. This makes it possible for the measurement control device 12 to be configured to also describe the surface topology 19 in the reference system. Thus, a position of the cornea 18 can be determined in the reference system R1.The object position RA of the object 7 in the reference system R1 can be determined by the measurement control device 12 by providing the measurement control device 12 with a volume model 20 of the object 7, which can describe the volume of the object 7. The measurement control device 12 can be configured to identify and localize the detected surface topology 19 in the volume element. This makes it possible to determine a position of the surface topology 19 with respect to the volume model 20. The surface topology 19 can be determined in the volume model 20, for example, by determining a maximum match between the detected surface topology 19 and a local topology of the volume model 20. It can be provided that the volume model 20 corresponding to the object 7 is predetermined.Alternatively, it can be provided that the measurement control device 12 is configured to reconstruct the volume model 20 from previous measurement processes.

[0069] Because the position of the surface topology 19 in the reference system R1 is known, as is the position R2 of the surface topology 19 in the volume model 20, it is possible to derive the object position RA of the volume model 20 using the reference system R1. Since the volume model 20 describes the volume of object 7, the object position RA of object 7 in the reference system R1 can thus be determined.

[0070] The measuring device 10 can be configured to perform a second measuring process at a second point in time in order to determine a second object position RB of the object 7. The measuring device 10 can be configured to determine a future, predicted object position RC for a specific future point in time from the two object positions RA, RB.

[0071] In a further step, it may be possible for the processing device 1 to be configured to output the processing laser depending on the predicted object position RC of the object 7 in order to thus take into account a movement of the object 7.

[0072] Fig. 2 shows a schematic representation of a measuring device.

[0073] It can be provided that the measurement pattern area 9 is to be projected onto the surface 8 of the object 7 by the at least one measurement beam 14, wherein it can be provided that the measurement beam 14 is to have a predetermined beam diameter 28 in order to image an area on the surface 8 of the object 7 by the measurement beam 14. The laser diode measurement beam device 11 can have an expansion element 27, which can be configured to expand the measurement beam 14 to the predetermined beam diameter 28. The measuring device 10 can have a surface emitter unit 22 as the laser diode measurement beam device 11, which can be configured to emit the at least one measurement beam 14. The laser diode measurement beam device 11 can be configured to guide the measurement beam 14 emitted by the surface emitter unit 22 through the expansion element 27 in order to provide a predetermined beam diameter 28.Beam diameter 28 can, for example, be widened to a value of 3 mm, whereby the measurement pattern area 9 formed by the at least one measurement beam 14 can have a suitable size for measuring a central region of an eye. To measure an entire visible region of an eye, it can be provided to widen the beam diameter 28 to a value of, for example, 2 cm using the widening element 27. The widened measurement beam 14 can image a continuous measurement pattern area 9 on the surface 8 of the object 7. The detector device 13 can be configured to detect a plurality of reflection points 16 formed by the at least one measurement beam 14 on the surface 8 of the object 7. A respective reflected measurement beam 14 is emitted at a respective one of the reflection points 16. Each of the reflected measurement beams 14 can have a respective intensity.The detector device 13 can be configured to determine the intensity of a respective measuring beam 14. Intensity can depend, for example, on the intensity of the widened measuring beam 14 that was reflected at the respective reflection point 16. For example, the measuring beam 14 may have a maximum intensity in a center and the intensity of the measuring beam 14 may decrease toward the edge of the measuring beam 14. The intensity of the reflected measuring beam 15 can also be influenced by an angle of the surface 8 or by a local reflectivity of the surface 8 of the object 7.

[0074] The detector device 13 can be configured to detect respective reflection points 16 in the measurement pattern area 9 on the surface 8 of the object 7 and to determine their reflection point coordinates 17 as well as their respective intensities. Due to the continuous measurement pattern, the measurement pattern area 9 can have an infinite number of reflection points 16. For this reason, the detector device 13 can determine reflection points 16 according to a predetermined interval. For example, it can be provided that reflections which have predetermined distances from one another are examined. From the respective reflection point coordinates 17, the detector device 13 can determine a height profile of the surface 8 of the object 7. From the respective intensities, the detector device 13 can determine an intensity distribution of the measurement pattern area 9 on the surface 8 of the object 7.The detector device 13 can be configured to identify the referencing feature 26 based on the reflection points 16. The referencing feature 26 can, for example, be a predetermined topology of the surface 8 of the object 7 or a predetermined reference point of the object 7. The referencing feature 26 can, for example, have a height feature and an intensity feature through the detector device 13, the referencing feature 26, for example in the intensity distribution and / or the height profile. In the figure shown, the referencing feature 26 can be a reference point which can be arranged at an apex 29 of an eye. The position of the apex 29 with respect to the object 7 can be stored in the measurement control device 12. The apex 29 can, for example, have a height feature such that the apex 29 is a point which has a maximum height.For example, it can be provided that the detector device 13 can evaluate a height profile of the surface 8 in order to identify the referencing feature 26. From the reflection point coordinates 17 of the respective reflection points 16, the detector device 13 can determine the position of the referencing feature 26 with respect to the predetermined reference system R1. From the position of the referencing point with respect to the predetermined reference system R1 and from the position of the referencing point with respect to the object 7 stored in the control device, the measurement control device 12 can determine the position of the object 7 in the reference system R1.

[0075] Fig. 3 shows another schematic representation of a measuring device.

[0076] The measuring device 10 can have a surface emitter array 21 as the laser diode measuring beam device 11, which can have a plurality of surface emitter units 22 that can be arranged one-dimensionally or two-dimensionally in a predetermined pattern. The detector device 13 can be arranged in combination in the laser diode measuring beam device 11 and have a plurality of detector units 23 that can also be arranged in a predetermined pattern. The laser diode measuring beam device 11 can be configured to emit, by means of the surface emitter units 22, respective measuring beams 14 that are arranged in the predetermined pattern relative to one another. The predetermined pattern can be defined, for example, by means of distances and / or angles between the individual measuring beams 14. The measuring beams 14 can be guided onto the object 7 and, for example, directed onto the entrance surface of the object 7.The measuring beams 14 can be reflected at respective reflection points 16 and returned as reflected measuring beams 15. The reflected measuring beams 15 can be detected by the detector units 23 of the detector device 13. The measuring beams 14 can be emitted in pulsed form in a respective measuring cycle, so that an emission time of the measuring beams 14 by the respective surface emitter units 22 is known. The detector units 23 of the detector device 13 can be configured to detect the reflected pulses and measure the detection times of the reflected pulses. As a result, the measuring device 10 can be configured to determine a travel time of the measuring beam 14 to the reflection point 16 and from the reflection point 16 to the detector unit 23. Taking the speed of light into account, a path length of the pulse can thus be determined.With a known direction of the detected reflected measuring beams 15, it is thus possible to determine three-dimensional reflection point coordinates 17 of the respective reflection points 16. The reflection point coordinates 17 can be provided to the measurement control device 12, which can use them to reconstruct the surface topology 19 of the object 7. The surface topology 19 can, for example, include a general orientation of the cornea 18 and / or unevenness of the cornea 18. Alternatively, it can also be provided that the measuring beams 14 are output in a modulated manner, for example by means of so-called chirping, wherein the measuring beams 14 are not output in a pulsed manner, but rather continuously, wherein the measuring beam 14 is modulated in a predetermined manner over time.For example, it may be provided to modulate a frequency of the measuring beam 14 and to determine the time and thus the path length of the measuring beam 14 and the reflected measuring beam 15 by superimposing a frequency of an emitted measuring beam 14 with a frequency of a detected reflected measuring beam 15. It may be provided that the measuring device 10 operates using a so-called flash lidar method, wherein the measuring beams 14 are emitted simultaneously and the arrival times of the respective reflected measuring beams 15 are detected by the detector device 13 at the respective times. This makes it possible to perform a simultaneous measurement, in contrast to a rasterized measurement, in which an emitted measuring beam 14 is guided sequentially along several directions.

[0077] Fig. 4 shows another schematic representation of a measuring device.

[0078] The measuring device 10 shown can comprise spatially separated laser diode measuring beam devices 11 and detector devices 13. It may be possible to provide several detector devices 13, which detect respective reflection point coordinates 17 of at least some of the reflection points 16. The reflection point coordinates 17 can then be combined by the measurement control device 12 to form a surface topology 19.

[0079] Fig. 5 shows another schematic representation of a measuring device.

[0080] The measuring device 10 can have a deflection unit 25, which can be, for example, a mirror that can reflect a provided original laser beam 24 in different directions at different times, so that the respective measuring beams 14 can be provided along the respective beam paths. In this case, a sequential scanning of the surface 8 of the object 7 can take place. The detector device 13 can also be spatially resolving in this case, but it is also possible for the detector device 13 to be configured only to detect the travel time of the respective measuring beams.

[0081] Fig. 6 shows a schematic representation of a possible sequence of a method for operating a measuring device.

[0082] The method can be provided for determining an extrapolated position RC of a volume model 20 of an object 7.

[0083] In the method, respective measuring processes can be carried out by the measuring device 10 at at least two different times, wherein respective positions RA, RB of the object 7 are determined at the at least two times in a reference system R1.

[0084] In a step S1, at least one measuring beam 14 can be emitted along a predetermined respective beam path for projecting a predetermined measuring pattern area onto a surface 8 of the object 7 in the respective measuring process by at least one laser diode measuring beam device 11 of the measuring device 10.

[0085] In a step S2, at least one reflected measuring beam 15 of the at least one measuring beam 14 can be detected by at least one detector device 13 of the measuring device 10 during the respective measuring process, which reflected beam is reflected at a respective reflection point 16 of the at least one measuring beam 14 on the surface 8 of the object 7. The at least one detector device 13 of the measuring device 10 can determine reflection point coordinates 17 of at least some of the reflection points 16 with respect to the predetermined reference system R1.

[0086] In a step S3, a predetermined reference feature of the object 7 can be identified by the at least one measurement control device 12 of the measuring apparatus 10 according to a predetermined identification method using the at least one reflection point of the predetermined measurement pattern on the surface 8 of the object 7 of the respective measurement process. A predetermined position of the predetermined reference feature with respect to the object 7 can be stored in the at least one measurement control device 12.

[0087] In a step S4, the at least one measurement control device 12 of the measuring device 10 can determine a position of the predetermined referencing feature with respect to the predetermined reference system R1 according to a predetermined position determination method as a function of the reflection point coordinates 17 of the at least one reflection point 16 with respect to the predetermined reference system R1. In a step S5, the at least one measurement control device 12 of the measuring device 10 can determine the position RA, RB of the object 7 in the reference system R1 of the respective measuring process from the position of the referencing feature with respect to the predetermined reference system R1 and the position of the referencing feature 26 with respect to the object.

[0088] In a step S6, the extrapolated position RC of the object 7 can be determined from the at least two positions RA, RB by the at least one measurement control device 12 of the measuring device 10 according to a predetermined extrapolation method.

[0089] Overall, the examples show how a measuring device can be provided to determine an extrapolated position of an object.

Claims

[1] Measuring device (10) for determining an extrapolated position (RC) of an object (7) with at least one measurement control device (12), characterized by that the measuring device (10) is designed to - to carry out respective measuring processes at at least two different times in order to determine respective positions (RA, RB) of the object (7) at the at least two times in a predetermined reference system (R1), and - to determine the extrapolated position (RC) of the object (7) from the at least two positions (RA, RB) according to a predetermined extrapolation method, wherein - the measuring device (10) comprises at least one laser diode measuring beam device (11) which is designed to output at least one measuring beam (14) along a predetermined respective beam path for projecting a predetermined measuring pattern area (9) onto a surface (8) of the object (7) in the respective measuring process, - the measuring device (10) comprises at least one detector device (13) which is designed to detect, in the respective measuring process, at least one reflected measuring beam (15) of the at least one measuring beam (14) which is reflected at a respective reflection point (16) of the at least one measuring beam (14) of the predetermined measuring pattern area (9) on the surface (8) of the object (7), and to determine reflection point coordinates (17) of the at least one reflection point (16) with respect to the predetermined reference system (R1), - the at least one measurement control device (12) is configured to identify a predetermined referencing feature (26) of the object (7) according to a predetermined identification method by means of the at least one reflection point (16) of the predetermined measurement pattern area (9) on the surface (8) of the object (7) of the respective measurement process, wherein a predetermined position of the predetermined referencing feature (26) with respect to the object (7) is stored in the at least one measurement control device (12), - the at least one measurement control device (12) is configured to determine a position of the predetermined referencing feature (26) with respect to the predetermined reference system (R1) according to a predetermined position determination method as a function of the reflection point coordinates (17) of the at least one reflection point (16) with respect to the predetermined reference system (R1), - to determine the position (RA, RB) of the object (7) in the reference system (R1) of the respective measuring process from the position of the referencing feature (26) in relation to the predetermined reference system (R1) and the position of the referencing feature (26) in relation to the object, wherein - the measuring device (10) is configured as a time-of-flight measurement lidar, wherein the at least one laser diode measuring beam device (11) is configured to output the at least one measuring beam (14) in a pulsed manner, wherein the at least one detector device (13) is configured to detect the reflection point coordinates (17) of the respective at least one reflection point (16) using a time-of-flight measurement, which describes a measurement of a time-of-flight of the respective reflected measuring beam (15) from a time of emission of the measuring beam (14) by the laser diode measuring beam device (11) to a time of reception of the reflected measuring beam (15) by the detector device (13), and / or - the measuring device (10) is configured as a modulated continuous wave lidar, wherein the at least one laser diode measuring beam device (11) is configured to output the at least one measuring beam (14) in a time-modulated manner, and the at least one detector device (13) is configured to determine the reflection point coordinates (17) of the respective at least one reflection point (16) using a modulation deviation between a current modulation of the measuring beam (14) and a detected modulation of the reflected measuring beam (15), and / or - the measuring device (10) is configured as an intensity lidar, wherein the at least one laser diode measuring beam device (11) is configured to output the at least one measuring beam (14) with a predetermined output intensity, and the at least one detector device (13) is configured to detect a reception intensity of the respective reflected measuring beam (15), wherein the at least one detector device (13) is configured to determine the reflection point coordinates (17) of the respective at least one reflection point (16) as a function of an intensity difference between the output intensity and the reception intensity, and / or - the measuring device (10) is designed to emit the measuring beams (14) simultaneously, and / or - the at least one measurement control device (12) is configured to determine a height distribution of the measurement pattern surface (9) in the predetermined identification method and to identify the predetermined referencing feature (26) of the object (7) as a function of a predetermined height feature of the predetermined referencing feature (26). [2] Measuring device (10) according to claim 1, wherein the at least one laser diode measuring beam device (11) is configured to output the at least one measuring beam (14) as a collimated beam. [3] Measuring device (10) according to claim 2, wherein the at least one laser diode measuring beam device (11) has at least one widening element (27) in the respective beam path of the at least one measuring beam (14), which is designed to widen the at least one measuring beam (14) to a predetermined optical beam diameter (28) in order to generate the at least one reflection point (16) of the measuring pattern surface (9) with a predetermined reflection surface on the surface (8) of the object (7). [4] Measuring device (10) according to one of the preceding claims, wherein the at least one laser diode measuring beam device (11) is configured to output, in the respective measuring process, a plurality of measuring beams (14) along predetermined respective beam paths for projecting the predetermined measuring pattern area (9) onto the surface (8) of the object (7). [5] Measuring device (10) according to one of the preceding claims, wherein the measuring device (10) is configured to output the measuring beams (14) sequentially in a measuring process. [6] Measuring device (10) according to one of the preceding claims, wherein the at least one measurement control device (12) is configured to determine an intensity distribution of the measurement pattern area (9) in the predetermined identification method and to identify the predetermined referencing feature (26) of the object (7) as a function of a predetermined intensity feature of the predetermined referencing feature (26). [7] Measuring device (10) according to one of the preceding claims, wherein the referencing feature (26) comprises at least one predetermined referencing point of the object (7). [8] Measuring device (10) according to one of the preceding claims, wherein the referencing feature (26) comprises a predetermined surface topology (19) of the surface (8) of the object (7). [9] Measuring device (10) according to one of the preceding claims, wherein the referencing feature (26) comprises a predetermined volume model (20) of the object (7). [10] Measuring device (10) according to one of the preceding claims, wherein the object (7) is a human or animal eye. [11] Measuring device (10) according to one of the preceding claims, wherein the laser diode measuring beam device (11) comprises at least one surface emitter unit (22). [12] Measuring device (10) according to claim 11, wherein the laser diode measuring beam device (11) comprises at least one surface emitter array (21). [13] Measuring device (10) according to one of the preceding claims, wherein the laser diode measuring beam device (11) is arranged to emit the measuring beams (14) in an infrared spectrum and / or a near-infrared spectrum. [14] Processing device (1) with at least one processing laser beam source (2) for processing an object (7) and at least one processing control device (3), characterized by that the processing device (1) comprises at least one measuring device (10) for determining an extrapolated position (RC) of the object (7) with at least one measurement control device (12), wherein the measuring device (10) is designed to - to carry out respective measuring processes at at least two different times in order to determine respective positions (RA, RB) of the object (7) at the at least two times in a predetermined reference system (R1), and - to determine the extrapolated position (RC) of the object (7) from the at least two positions (RA, RB) according to a predetermined extrapolation method, wherein - the measuring device (10) comprises at least one laser diode measuring beam device (11) which is designed to output at least one measuring beam (14) along a predetermined respective beam path for projecting a predetermined measuring pattern area (9) onto a surface (8) of the object (7) in the respective measuring process, - the measuring device (10) comprises at least one detector device (13) which is designed to detect, in the respective measuring process, at least one reflected measuring beam (15) of the at least one measuring beam (14) which is reflected at a respective reflection point (16) of the at least one measuring beam (14) of the predetermined measuring pattern area (9) on the surface (8) of the object (7), and to determine reflection point coordinates (17) of the at least one reflection point (16) with respect to the predetermined reference system (R1), - the at least one measurement control device (12) is configured to identify a predetermined referencing feature (26) of the object (7) according to a predetermined identification method by means of the at least one reflection point (16) of the predetermined measurement pattern area (9) on the surface (8) of the object (7) of the respective measurement process, wherein a predetermined position of the predetermined referencing feature (26) with respect to the object (7) is stored in the at least one measurement control device (12), - the at least one measurement control device (12) is configured to determine a position of the predetermined referencing feature (26) with respect to the predetermined reference system (R1) in accordance with a predetermined position determination method as a function of the reflection point coordinates (17) of the at least one reflection point (16) with respect to the predetermined reference system (R1), and to determine the position (RA, RB) of the object (7) in the reference system (R1) of the respective measuring process from the position of the referencing feature (26) with respect to the predetermined reference system (R1) and the position of the referencing feature (26) with respect to the object. [15] Processing device (1) according to claim 14, wherein the processing control device (3) is configured to change an alignment and / or focusing of a processing laser for processing the object (7) depending on the extrapolated position (RC) of the volume model (20). [16] Method for determining an extrapolated position (RC) of an object (7) by a measuring device (10) according to one of claims 1 to 13, characterized by , that - respective measuring processes are carried out by the measuring device (10) at at least two different times in order to determine respective positions (RA, RB) of the object (7) at the at least two times in a predetermined reference system, and - the measuring device (10) determines the extrapolated position (RC) of the object (7) from the at least two positions (RA, RB) according to a predetermined extrapolation method, wherein - by at least one laser diode measuring beam device (11) of the measuring device (10), in the respective measuring process at least one measuring beam (14) is emitted along a predetermined respective beam path for projecting a predetermined measuring pattern area onto a surface (8) of the object (7), - by at least one detector device (13) of the measuring device (10), in the respective measuring process at least one reflected measuring beam (15) of the at least one measuring beam (14) is detected, which is reflected at a respective reflection point (16) of the at least one measuring beam (14) of the predetermined measuring pattern area on the surface (8) of the object (7), and reflection point coordinates (17) of the at least one reflection point (16) are to be determined in relation to the predetermined reference system (R1). [17] A computer program comprising instructions causing the measuring device (10) according to any one of claims 1 to 13 to carry out a method according to claim 16. [18] A computer-readable medium on which a computer program according to claim 17 is stored.

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