Display device and manufacturing process therefor

Abstract

Display device comprising: a pixel electrode (310) in an opening area (OA); a common electrode (320) with at least one area overlapping the pixel electrode (310) in the opening area (OA); a gate line (GL) extending along a row direction (X) in a non-opening area (NOA), the non-opening area (NOA) surrounding the opening area (OA); a data line (DL) extending along the non-opening area (NOA) in a column direction (Y) perpendicular to the row direction (X); and a touch sensing line (SL) extending in the column direction (Y) across the opening area (OA);a transistor (200) with a top-gate configuration and a two-gate structure, comprising a gate electrode (220) that overlaps two separate channel regions (CH1, CH2) in an active layer (210); and a substrate (100) on which a light-blocking layer (110) is formed that overlaps with the two separate channel regions (CH1, CH2); wherein the opening region (OA) has a length in the row direction (X) that is greater than a length in the column direction (Y).

Description

[0001] This application claims priority over Korean patent application No. 10-2021-0193659, which was filed on December 31, 2021 and is incorporated herein in full by reference. Background Technical field

[0002] The present disclosure relates to a display device and a manufacturing process therefor. Description of the state of the art

[0003] With the development of the information society, various types of display devices have been developed. Recently, various display devices have been used, such as liquid crystal displays (LCDs), plasma display panels (PDPs), and organic light-emitting displays (OLEDs).

[0004] Touchscreens, capable of displaying images or videos and registering user touch, have become widespread recently. Touchscreens can have an add-on, cell-overlaid, or cell-in-cell structure. Of these, touchscreens with a cell-in-cell structure can reduce thickness and improve the durability of the display device. Summary Technical Problem

[0005] The embodiments described here relate to the cell-internal type structure of a display device having a common electrode extending in a horizontal direction, and to a manufacturing method for it.

[0006] Furthermore, the embodiments describe a display device in which a touch detection line and a source-drain electrode are arranged on the same layer, and a manufacturing method for it. Technical solution

[0007] The problem is solved by the features of the independent claims. Preferred embodiments are specified in the dependent claims.

[0008] A display device of an embodiment of the present disclosure comprises a pixel electrode arranged in an opening region; a common electrode with at least one region that overlaps the pixel electrode in the opening region; a gate line extending along a row direction in a non-opening region, the non-opening region surrounding the opening region; a data line extending along the non-opening region in a column direction perpendicular to the row direction; and a touch sensing line extending across the opening region in a column direction. The opening region has a shape such that the length of the opening region in the row direction is longer than the length of the opening region in the column direction.

[0009] In one embodiment, a manufacturing method of a display device of an embodiment of the present disclosure comprises: forming a light-blocking layer on a substrate using a first mask, wherein the substrate comprises an opening region and a non-opening region surrounding the opening region; forming an active layer on the light-blocking layer using a second mask; forming an intermediate insulating layer covering the gate conductor; forming a first contact hole exposing a region of the active layer using a fourth mask;Forming a data line extending in a column direction perpendicular to the row direction in the non-opening region and a touch sensing line extending in a column direction across the opening region, using a fifth mask; and forming a pixel electrode in the opening region using a sixth mask, wherein the opening region has a shape such that a length of the opening region in the row direction is longer than a length of the opening region in the column direction.

[0010] In one embodiment, a display device comprises: several pixels, each comprising a pixel with an opening area in which an image is displayed and a non-opening area in which the image is not displayed, the opening area having a length in a first direction that is longer than a length of the opening area in a second direction that differs from the first direction; several gate lines connected to the several pixels, the several gate lines comprising a gate line extending in the first direction into the non-opening area of ​​the pixel; several data lines connected to the several pixels, the several data lines comprising a data line extending in the second direction into the non-opening area of ​​the pixel;multiple touch sensing lines comprising a touch sensing line extending in the second direction across the opening area of ​​the pixel; wherein the pixel comprises a pixel electrode in the opening area of ​​the pixel and a common electrode with a section overlapping the pixel electrode in the opening area, the section of the common electrode having a length in the first direction that is longer than a length of the section of the common electrode in the second direction.

[0011] In one or more embodiments, the touch detection line can be located on the same layer as the data line and does not overlap with the data line.

[0012] In one or more embodiments, the pixel electrode can have a rectangular shape.

[0013] In one or more embodiments, the pixel electrode can have a length of the pixel electrode in the row direction that is longer than a length of the pixel electrode in the column direction.

[0014] In one or more embodiments, the common electrode can have several branching sections extending in the line direction in the opening area.

[0015] In one or more embodiments, the multiple branching sections can be arranged in the column direction at equal intervals, so that the distance between each pair of adjacent branching sections is the same among the multiple branching sections.

[0016] In one or more embodiments, the common electrode can have a stem section that connects the multiple branch sections, the stem section extending in the direction of the slit.

[0017] In one or more embodiments, the display device may further include a color filter in the opening area.

[0018] In one or more embodiments, the display device may further comprise a black matrix around the color filter that overlaps the touch detection line.

[0019] In one or more embodiments, the display device may further comprise a substrate that includes the opening area and the non-opening area.

[0020] In one or more embodiments, the display device may further comprise a first conductive layer on the substrate, wherein the first conductive layer comprises the gate line.

[0021] In one or more embodiments, the display device may further comprise a second conductive layer on top of the first conductive layer.

[0022] In one or more embodiments, the second conductive layer can include the data line and the touch detection line.

[0023] In one or more embodiments, the display device may further comprise a passivation layer on the second conductive layer.

[0024] In one or more embodiments, the pixel electrode can be arranged on the passivation layer.

[0025] In one or more embodiments, the common electrode can be arranged on the pixel electrode.

[0026] In one or more embodiments, the formation of the gate conductor may include the formation of a gate electrode of a transistor that overlaps a channel region of the active layer.

[0027] In one or more embodiments, the formation of the data line and the touch sensing line may include the formation of a drain electrode and a source electrode of the transistor that overlap the first contact hole.

[0028] In one or more embodiments, the manufacturing process may further comprise: forming a passivation layer covering the pixel electrode; forming a second contact hole exposing an area of ​​the drain electrode using a seventh mask; and forming a common electrode with at least one area overlapping the pixel electrode using an eighth mask, wherein the common electrode is connected to the drain electrode through the second contact hole.

[0029] In one or more embodiments, the data line and the touch detection line can be formed on the same layer and do not overlap.

[0030] In one or more embodiments, the pixel electrode can have a rectangular shape, in which the length of the pixel electrode in the row direction is longer than the length of the pixel electrode in the column direction.

[0031] In one or more embodiments, the common electrode can be structured to include: several branching sections extending in the row direction in the opening region, wherein the several branching sections are arranged at equal intervals in the column direction, such that the distance between each pair of adjacent branching sections is the same among the several branching sections; and a stem section connecting the several branching sections, wherein the stem section extends in the column direction.

[0032] In one or more embodiments, the method may further include: forming a color filter in the opening area; and / or forming a black matrix around the color filter that overlaps the touch detection line.

[0033] In one or more embodiments, the section of the common electrode in the opening area can have several projections extending in the first direction in the opening area, wherein the several projections are arranged at equal intervals in the second direction, such that the distance between each pair of adjacent projections is the same among the several projections.

[0034] In one or more embodiments, the common electrode may further have a connecting section extending in the second direction in the non-opening area, the connecting section connecting the multiple projections together.

[0035] In one or more embodiments, the pixel electrode can have a rectangular shape in which the length of the pixel electrode in the first direction is longer than the length of the pixel electrode in the second direction.

[0036] In one or more embodiments, the display device may further comprise: a substrate; a first conductive layer on the substrate, wherein the first conductive layer comprises the gate line; a second conductive layer on the first conductive layer, wherein the second conductive layer comprises the data line and the touch sensing line; and a passivation layer on the second conductive layer, wherein the pixel electrode is on the passivation layer and the common electrode is on the pixel electrode.

[0037] In one or more embodiments, the touch detection line can be located on the same layer as the data line and does not overlap with the data line.

[0038] In one or more embodiments, the display device may further comprise: a color filter in the aperture area; and a black matrix around the color filter that overlaps the touch detection line. List of characters Fig. Figure 1 is a block diagram representing a configuration of a display device of an embodiment of the present disclosure. Fig. Figure 2 is a top view showing the structure of a touch detection electrode and a touch detection lead, which are in Fig. 1 are shown according to an embodiment of the present disclosure. Fig. 3 is an enlarged top view of area AA of Fig. 2 according to one embodiment of the present disclosure. Fig. Figure 4 is a cross-sectional view along line II' of Fig. 3 according to one embodiment of the disclosure. Fig. 5 is a cross-sectional view along line II-II' of Fig. 3 according to one embodiment of the disclosure. Fig. 6 to Fig. Figure 21 are cross-sectional views illustrating a manufacturing process of a display device of an embodiment of the present disclosure. Fig. 22 is an enlarged top view of an area of ​​a display device of an embodiment of the disclosure. Detailed description

[0039] The following describes embodiments of the present disclosure with reference to the drawings. Whenever in this description a component (or an area, a layer, a part, etc.) is referred to as being “on”, “connected” to, or “joined” to another component, this means that the component may be directly coupled / connected to the other component, or that a third component may be arranged between them.

[0040] Identical reference symbols refer to identical components. Furthermore, in the drawings, the thickness, ratio, and dimensions of the components are exaggerated for the effective description of the technical content. An "and / or" encompasses one or more combinations, which can be defined by the associated configurations.

[0041] Terms such as "first" and "second" may be used to describe different components, but the components are not limited by these terms. The terms are used only to distinguish one component from another. For example, the first component may be referred to as the second component without altering the scope of the present embodiments, and likewise, the second component may also be referred to as the first component. Singular expressions include plural expressions unless the context clearly indicates otherwise.

[0042] Terms such as "under", "lower", "above", "upper", etc. are used to describe the arrangement of components shown in the figures. These terms are relative concepts and are explained based on the directions indicated in the drawings.

[0043] It is understood that terms such as "include" or "contain" etc. are intended to indicate that a feature, number, step, operation, component, part or combination thereof is described in the description and that the possibility of the presence or addition of one or more further features or numbers, steps, operations, components, parts or combinations thereof is not excluded in advance.

[0044] Fig. Figure 1 is a block diagram representing a configuration of a display device of an embodiment of the present disclosure.

[0045] With reference to Fig. 1 comprises a display device 1, a timer controller 10, a gate driver 20, a data driver 30, a touch driver 40 and a display panel 50.

[0046] The timing controller 10 can receive an RGB image signal and a CS control signal from outside the display device (e.g., a host system). The RGB image signal can include multiple grayscale data. The CS control signal can, for example, include a horizontal synchronization signal, a vertical synchronization signal, and a master clock signal.

[0047] The timing controller 10 processes the RGB image signal and the CS control signal according to an operating condition of the display panel 50 and can generate and output image data DATA, a gate control signal CONT1, a data control signal CONT2 and a touch control signal CONT3.

[0048] The gate driver 20 can be connected to pixels (or subpixels) PX of the display panel 50 via multiple gate lines GL1 to GLn. The gate driver 20 can generate gate signals based on the gate control signal CONT1, which is output by the timing controller 10. The gate driver 20 can supply the generated gate signals to the pixels PX via the multiple gate lines GL1 to GLn.

[0049] The data driver 30 can be connected to pixels PX of the display panel 50 via multiple data lines DL1 to DLM. The data driver 30 can generate data signals based on the data control signal CONT2 and the image data DATA output by the timing controller 10. The data driver 30 can deliver the generated data signals to pixels PX DL1 to DLM via the multiple data lines. The data signals can be applied to the pixels PX of the pixel column selected by the gate signal. For this purpose, the data driver 30 can deliver data signals to the multiple data lines DL1 to DLM in such a way that they are synchronized with the gate signal.

[0050] The touch driver 40 can be connected to pixels PX of the display panel 50 via multiple sensing lines SL1 to SLm. The touch driver 40 can generate a touch sampling signal based on the touch control signal CONT3, which is output by the timing controller 10, and deliver this signal to the pixels PX. The touch driver 40 can receive a touch sensing signal via multiple sensing lines SL1 to SLm and detect a touch input based on the received touch sensing signal.

[0051] Several pixels (PX) are arranged on the scoreboard 50. The pixels (PX) can, for example, be arranged in a matrix form on the scoreboard 50.

[0052] Each pixel PX can be electrically connected to a corresponding gate line and data line. The pixel PX can emit light with a luminance corresponding to the gate signals and data signals supplied via gate lines GL1 to GLn and data lines DL1 to DLm.

[0053] Each pixel PX can display one of the first three colors. According to one aspect, each pixel PX can display one of the colors red, green, and blue. According to another aspect, each pixel PX can display one of the colors cyan, magenta, and yellow. In various embodiments, the pixels PX can be configured to display one of four or more colors. For example, each pixel PX can display one of the colors red, green, blue, and white.

[0054] The display panel 50 can be configured as a cell-internal type touch panel capable of detecting touch input. For example, the display panel 50 can be configured to have a pixel electrode that is driven by receiving a common voltage during a display period within a single frame and by receiving a touch sampling voltage during a touch detection period within a single frame. The common voltage for displaying an image during the display period and the touch sampling voltage for detecting a touch during the touch detection period can be applied to a pixel electrode of pixels PX.During the display period, the pixel electrode can function as a display driver electrode, driving a liquid crystal along with the common electrode, and during the touch detection period, it can function as a touch sensing electrode (TE), detecting a touch position. The touch sensing electrode can be driven sequentially for a single frame, but is not limited to this.

[0055] The timing controller 10, the gate driver 20, the data driver 30, and the touch driver 40 can each be designed as a separate integrated circuit (IC) or can be designed as an integrated circuit in which at least one section is integrated. For example, the data driver 30 and / or the touch driver 40 can be integrated into the timing controller 10 such that it is designed as a single integrated circuit.

[0056] Although the gate driver 20 and the data driver 30 in Fig. Since components 1 are shown as separate from the display panel 50, at least one of the gate driver 20 and the data driver 30 can be designed internally within the panel in such a way that it is formed as a single unit with the display panel 50. For example, the gate driver 20 can be formed as a single unit with the display panel 50 according to a gate-in-panel (GIP) design.

[0057] Fig. Figure 2 is a top view showing the structure of a touch detection electrode and a touch detection lead, which are in Fig. Figure 1 shows an embodiment.

[0058] With reference to Fig. 2. The display panel can include 50 multiple touch sensing electrodes TE. The touch sensing electrode TE can include one or more common electrodes 320.

[0059] Each touch sensing electrode TE is connected to a corresponding touch sensing lead SL. The touch sensing electrode TE and the touch sensing lead SL can be connected in a one-to-one relationship. For example, each touch sensing lead SL can be connected to a common electrode 320 located within a touch sensing electrode TE.

[0060] A touch detection line SL can transmit the common voltage to the touch detection electrode TE connected to the touch detection line SL during the display period and transmit the touch sampling signal to the touch detection electrode TE during the touch detection period. Furthermore, the touch detection line SL can detect a change in an electrical property of the touch detection electrode TE (e.g., a change in capacitance load) and output it as an electrical signal.

[0061] The touch sensing signal supplied by the touch detection line SL can consist of multiple clock signals. When a user touches the display panel 50 using a finger or an electronic stylus, a capacitance is created between the touch detection electrodes TE. A touch input can be detected. When a user touches the display panel 50 using a finger or an electronic stylus, a capacitance is created between the touch detection electrodes TE, and the touch input can be detected by comparing the created capacitance with the reference capacitance.

[0062] Fig. 3 is an enlarged top view of area AA of Fig. 2 according to one embodiment.

[0063] Each pixel PX comprises an opening region OA, in which an image is displayed by an electric field between a pixel electrode 310 and the common electrode 320, and a non-opening region NOA, which, for example, contains a driver element, such as a thin-film transistor 200, arranged to drive the common electrode 320 and the pixel electrode 310 of the opening region OA, and which surrounds the opening region. Here, the opening region OA can be a display region in which an image is shown, and the non-opening region NOA can be a non-display region in which no image is shown. The opening region OA and the non-opening region NOA can be arranged alternately along a row direction X. In the present embodiment, the opening region OA can have a shape in which a length in the row direction X can be equal to or longer than a length in the column direction Y.

[0064] The common electrode 320 receives a common voltage during one display period in a single frame and forms an electric field with the pixel electrode 310. The common electrode 320 comprises branching sections 321 (e.g., projections) arranged side by side at equal intervals in the column direction Y, and a stem section 322 (e.g., a connecting part) that connects the branching sections 321 to one another. By arranging the branching sections 321 at equal intervals in the column direction Y, the distance between each pair of adjacent branching sections 321 is equal. The branching sections 321 can extend substantially in the row direction X within the aperture area OA, and the stem section 322 can extend in the column direction Y, connecting the branching sections 321 to one another at both ends.Here, the length of the branching sections 321 can be longer than the length of the main sections 322. The common electrode 320 is generally formed in the opening region OA and can be arranged to extend from the opening region OA to the non-opening region NOA.

[0065] The pixel electrode 310 can be wide in the opening area OA. If the opening area OA is configured such that a length in the row direction X is longer than a length in the column direction Y, the pixel electrode 310 can generally have a rectangular shape, where along the shape of the opening area OA a length in the row direction X is longer than a length in the column direction Y.

[0066] The data line DL, the gate line GL and the control element such as the thin-film transistor 200 can be located in the non-opening region NOA.

[0067] The data line DL extends along the column direction Y in the non-opening area NOA, which is located between the opening areas OA of adjacent pixel columns. The data line DL is connected to the pixel electrode 310 and can transmit the data signal to the pixel electrode 310.

[0068] The gate line GL extends along the row direction X in the non-opening area NOA, which is located between the opening areas OA of adjacent pixel rows.

[0069] The touch detection line SL crosses the opening area OA and extends along the column direction Y. The touch detection line SL is located on the same layer as the data lines DL, which are located in the non-opening area NOA. The touch detection line SL is configured in the column direction Y, which crosses the opening area OA, and therefore does not overlap the data lines DL. Here, the data lines DL and the touch detection lines SL can be arranged alternately along the row direction X on the display panel 50.

[0070] The thin-film transistor 200 comprises a gate electrode 220 connected to the gate line GL, a source electrode 230 connected to the data line DL, and a drain electrode 240 spaced apart from the source electrode 230. The thin-film transistor 200 can be connected to the pixel electrode 310 via a contact hole.

[0071] As shown, the pixel PX of the present embodiment has a horizontal electrode structure such that the opening area OA of the pixel PX extends substantially in the row direction X and the branching section 321 of the common electrode 320 extends substantially in the row direction X.

[0072] The following section describes in detail a stacked structure of the pixel structure above.

[0073] Fig. Figure 4 is a cross-sectional view along line II' of Fig. 3 according to one embodiment and Fig. 5 is a cross-sectional view along line II-II' of Fig. 3 according to one embodiment.

[0074] With reference to Fig. 3 together with Fig. 4 and Fig. 5 The display device 1 of an embodiment comprises a substrate 100, circuit elements arranged on the substrate, and the common electrode 320 and the pixel electrode 310 for displaying an image.

[0075] Substrate 100 can be a translucent substrate serving as the base substrate for display panel 50. Substrate 100 can be a rigid substrate containing glass or tempered glass, or a flexible substrate made of plastic material. For example, substrate 100 can be made of a plastic material such as polyimide, polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polycarbonate (PC), and the like. However, the material of substrate 100 is not limited to these.

[0076] The opening region OA and the non-opening region NOA are formed on the substrate 100. The opening region OA can be defined as an area in which an image is displayed according to an electric field between the pixel electrode 310 and the common electrode. The non-opening region NOA can be defined as an area in which a control element for driving the pixel electrode 310 of the opening region OA, for example the thin-film transistor 200 and wiring, is arranged.

[0077] A light-blocking layer 110 can be formed on the substrate 100. The light-blocking layer 110 is arranged such that it overlaps with a semiconductor pattern of the thin-film transistor 200 (e.g., channel regions (CH1, CH2) of an active layer 210 in a top view), thereby protecting the oxide semiconductor device from external light.

[0078] A buffer layer 120 covers the light-blocking layer 110. The buffer layer 120 can prevent or at least reduce the diffusion of ions or impurities from the substrate 100 and block or at least reduce the penetration of moisture. Furthermore, the buffer layer 120 can improve the surface flatness of the substrate 100. The buffer layer 120 can contain an inorganic material such as oxide and nitride, an organic material, or an organic-inorganic complex material and can be formed in a single-layer or multi-layer structure. For example, the buffer layer 120 can have a structure of three or more layers consisting of silicon dioxide, silicon nitride, and silicon dioxide.

[0079] The active layer 210 is formed on the buffer layer 120. The active layer 210 can be made of a silicon-based semiconductor material or an oxide-based semiconductor material. Amorphous silicon or polycrystalline silicon can be used as the silicon-based semiconductor material. Oxide-based semiconductor materials include quaternary metal oxides such as indium tin gallium zinc oxide (InSnGaZnO), ternary metal oxides such as indium gallium zinc oxide (InGaZnO), indium tin zinc oxide (InSnZnO), indium aluminum zinc oxide (InAlZnO), tin gallium zinc oxide (SnGaZnO), aluminum gallium zinc oxide (AlGaZnO) and tin aluminum zinc oxide (SnAlZnO), and binary metal oxides such as indium zinc oxide (InZnO), tin zinc oxide (SnZnO), aluminum zinc oxide (AlZnO), and zinc magnesium oxide (ZnMgO). Tin magnesium oxide (SnMgO), indium magnesium oxide (InMgO), indium gallium oxide (InGaO) and indium oxide (InO), tin oxide (SnO) and zinc oxide (ZnO), and the like are used.

[0080] The active layer 210 can have a source region and a drain region containing p-type or n-type defects, and channel regions CH1 and CH2 formed between the source region and the drain region. In one embodiment, at least two spaced-apart channel regions CH1 and CH2 can be formed between the source region and the drain region in the active layer 210. In this case, the two spaced-apart channel regions CH1 and CH2 can be arranged side by side in the X-direction due to the curved shape of the active layer 210. However, the shape of the active layer 210 is not limited to this. For example, in another embodiment, one channel region CH1 or CH2 can be formed in the active layer 210, and the active layer 210 can be formed in a straight, bar-like shape.

[0081] A gate insulating layer 130 can be formed on the active layer 210. The gate insulating layer 130 can be silicon dioxide (SiOx), silicon nitride (SiNx), or multiple layers thereof.

[0082] The first conductive layer is formed on the gate insulating layer 130. The first conductive layer can include the gate electrode 220. Furthermore, the first conductive layer can also include the gate trace GL. In one embodiment, the gate trace GL is configured to extend substantially along one side of the opening region OA in the line direction X.

[0083] Here, the gate electrode 220 can be arranged so that it overlaps with the channel region of the corresponding active layer 210. If the two channel regions CH1 and CH2 are formed on the active layer 210, the gate electrode 220 is arranged as shown so that it overlaps the two channel regions CH1 and CH2, and can form the thin-film transistor 200 with a two-gate structure.

[0084] The gate electrode 220 can be formed integrally with the gate line GL, which is electrically connected to the gate electrode 220, to form a pattern. For example, the gate electrode 220 can be an area that overlaps the channel regions CH1 and CH2 of the active layer 210 on the gate line GL.

[0085] An intermediate insulating layer 140 can cover the first conductive layer. The intermediate insulating layer 140 can be silicon dioxide (SiOx), silicon nitride (SiNx), or multiple layers thereof.

[0086] The second conductive layer is formed on the intermediate insulating layer 140. The second conductive layer can comprise the source electrode 230 and the drain electrode 240. Additionally, the second conductive layer can further comprise the data line DL. The source electrode 230 and the drain electrode 240 can each be connected to the source region and the drain region of the active layer 210, respectively. According to one embodiment, at least one of the source electrode 230 and the drain electrode 240 can be formed integrally with the electrically connected data line DL, thereby forming a pattern. For example, the source electrode 230 can be a region of the data line DL located on the same layer.

[0087] In one embodiment, the data line DL extends along the column direction Y in the non-opening region NOA. In such an embodiment, the source electrode 230 and the drain electrode 240 are a single region on the data line DL extending in the column direction (Y), or a single region branching off from the extended data line DL.

[0088] In the present embodiment, the second conductive layer can further comprise the touch detection line SL. The touch detection line SL crosses the opening area OA and extends along the column direction Y. The touch detection line SL is arranged on the same layer as the data lines DL and is located in the non-opening area NOA. For example, the data lines DL and the touch detection lines SL can be arranged alternately along the row direction X on the display panel 50.

[0089] In one embodiment, the data line DL and the touch sensing line SL can be arranged such that they overlap each other at different layers. In such an embodiment, a planarization layer or the like can be inserted between the data line DL and the touch sensing line SL. The planarization layer can be provided to reduce a step difference in the underlying structure.

[0090] However, in the present embodiment, the data line DL and the sensing line SL are arranged on the same layer and spaced apart from each other. In this case, the source-drain electrodes 230 and 240, the data line DL, and the sensing line SL can be formed in a single process. Furthermore, the process for forming the planarization layer is omitted, since the data line DL and the sensing line SL are located on the same layer and are formed during the single process. As a result, the manufacturing process for the display device 1 of the present embodiment can be simplified, the number of masks required for the process can be reduced, and the production costs can be lowered.

[0091] The second conductive layer can be covered by a first passivation layer 150.

[0092] According to one embodiment, a third conductive layer can be formed on the first passivation layer 150. The third conductive layer can, for example, comprise a dummy line. In an embodiment in which the data line DL and the touch sensing line SL are arranged on different layers such that they overlap, the dummy line is arranged such that it overlaps with the data line DL and the touch sensing line SL in at least one section. The dummy line can be electrically suspended during the drive period to dissipate noise through the wiring and can reduce noise in the touch sensing signal detected by the touch sensing line SL.

[0093] Since, in the present embodiment, the touch detection line SL is spaced apart from the data line DL, the noise is reduced by the other wiring. Accordingly, the dummy line is not required, and the process for forming the third conductive layer can be omitted. As a result, the manufacturing process for the display device 1 of the present embodiment can be simplified, the number of masks required for the process can be reduced, and the production costs can be lowered.

[0094] The pixel electrode 310 is formed on the first passivation layer 150. The pixel electrode 310 can be wide within the opening area OA. If the opening area OA is configured such that a length in the row direction X is longer than a length in the column direction Y, the pixel electrode 310 can have a generally rectangular shape along the shape of the opening area OA, where a length in the row direction X is longer than a length in the column direction Y. Furthermore, the pixel electrode 310 can be arranged to overlap the touch detection line SL, which passes through the opening area OA, in at least one region.

[0095] The pixel electrode 310 can be covered by a second passivation layer 160. The first and second passivation layers 150 and 160 can be a silicon oxide film (SiOx), a silicon nitride film (SiNx), or several layers thereof, such as insulating layers to protect the covered elements.

[0096] The common electrode 320 can be formed on the second passivation layer 160. The common electrode 320 is generally formed in the opening region OA and can be arranged to extend from the opening region to the non-opening region NOA. The common electrode 320 is electrically connected to the touch detection line SL via a contact hole.

[0097] In one embodiment, the common electrode 320 can comprise the branching sections 321, which are arranged side by side at equal intervals, and the main section 322, which connects the branching sections 321 to one another. The branching sections 321 can extend substantially in the row direction X within the opening area OA, and the main sections 322 can extend in the column direction Y, connecting the branching sections 321 to one another at both ends. Here, the length of one branching section 321 can be such that it is longer than the length of one main section 322.

[0098] A cover substrate 400 can be arranged on substrate 100. A color filter 410 can be formed on the cover substrate 400. The color filter 410 can be arranged so that it overlaps the aperture area OA. The color filter 410 is a wavelength-selective optical filter that selectively transmits only a partial wavelength band of the incident light, allowing light in one specific wavelength band to pass through while blocking light in another specific wavelength band. It can be made of photosensitive resin containing a colorant such as a pigment or dye. Light passing through the color filter 410 in the aperture area OA can be any of the red, green, and blue colors. If pixel PX displays a white color, the color filter 410 for pixel PX can be omitted.

[0099] A black matrix 420 can be arranged between the color filters 410 of each color. The black matrix 420 is arranged around the color filter 410 between adjacent color filters 410 and can prevent light from escaping and color mixing between the pixels PX of each color.

[0100] In one embodiment, the black matrix 420 is arranged such that it overlaps the touch detection line SL in at least one area. Such a black matrix 420 has a pattern in which at least one area intersects the opening area OA and extends along the column direction Y.

[0101] In one embodiment, a bump pattern can be formed on the common electrode 320. The bump pattern is arranged such that it overlaps the black matrix, thus preventing color mixing between adjacent pixels PX. In the present embodiment, the sensing line SL is arranged such that it overlaps the black matrix 420, allowing the black matrix 420 to be implemented essentially as double layers. The structure itself, in the present embodiment, reduces the aperture fraction of pixel PX, prevents or at least reduces color mixing, and prevents an increase in the thickness of the black matrix.

[0102] A light emission control device, such as a liquid crystal layer, can be located between substrate 100 and the upper substrate 400.

[0103] The following describes in detail a manufacturing process for the display device 1 with the above structure.

[0104] Fig. 6 to Fig. Figure 21 are cross-sectional views illustrating a manufacturing process of a display device of an embodiment of the present disclosure.

[0105] With reference to Fig. 6 and Fig. As shown in Figure 7, the light-blocking layer 110 can be formed on the substrate 100. The light-blocking layer 110 can be produced by forming a conductive film on the substrate 100 by a printing process, a sputtering process, a chemical vapor deposition process, a pulsed laser deposition (PLD) process, a vacuum deposition process, an atomic layer deposition process, or the like; and by performing a patterning process by etching using a mask. A first mask can be used here.

[0106] With reference to Fig. 8 and Fig. 9. The buffer layer 120 can then be formed on the light-blocking layer 110. The buffer layer 120 can be formed by a chemical vapor deposition process, a spin coating process, a plasma-assisted chemical vapor deposition process, a sputtering process, a vacuum deposition process, a plasma-chemical high-density vapor deposition process, a pressure process, or the like.

[0107] The active layer 210 can be formed on the buffer layer 120. For example, an amorphous silicon layer can be formed on the buffer layer 120, and this amorphous silicon layer can be crystallized to form a polysilicon layer. The polysilicon layer is then subjected to structuring by photolithography or a similar process, thereby forming the active layer 210. A second mask can be used for the photolithography process. Impurities are injected into the polysilicon layer forming the active layer 210, allowing the source region, drain region, and channel CH to be formed.

[0108] With reference to Fig. 10 and Fig. 11. The gate insulating layer 130 can be formed on the active layer 210. The gate insulating layer 130 can be formed by a chemical vapor deposition process, a spin coating process, a plasma-assisted chemical vapor deposition process, a sputtering process, a vacuum deposition process, a plasma-chemical high-density vapor deposition process, a printing process, or the like.

[0109] The first conductive layer can be formed on the gate insulating layer 130. For example, the gate electrode 220 and the associated gate trace GL can be formed on the gate insulating layer 130. The gate electrode 220 can be formed in a pattern that is integrally formed with the gate trace GL. In one embodiment, the gate trace GL can be formed in a shape that extends substantially along the row direction X.

[0110] The first conductive layer is formed by creating a conductive film on the gate insulating layer 130 using a printing process, a sputtering process, a chemical vapor deposition process, a pulsed laser deposition process, a sub-deposition process, an atomic layer deposition process, or the like, and by performing a patterning process using an etching process with a mask. A third mask can be used here.

[0111] With reference to Fig. 12 and Fig. 13 The intermediate insulating layer 140 can be formed to cover the first conductive layer. First contact holes H1 for contacting the second conductive layer and the layer below can be formed in the intermediate insulating layer 140. In particular, the intermediate insulating layer 140 is formed over the entire surface of the substrate 100, and a masking process is carried out to expose an area of ​​the active layer 210 corresponding to the area of ​​the first contact hole H1. A fourth mask can be used in the process for forming the first contact hole H1.

[0112] With reference to Fig. 14 and Fig. 15 The second conductive layer can be formed on the intermediate insulating layer 140. For example, the source electrode 230 and the drain electrode 240, and the data line DL connected to at least one of them, can be formed on the intermediate insulating layer 140. In one embodiment, the source electrode 230 can be formed in a pattern that is integrally formed with the data line DL. In another embodiment, the data line DL can be formed such that it extends substantially along the gap direction Y.

[0113] In one embodiment, the touch detection line SL can also be formed on the intermediate insulating layer 140. The touch detection line SL can be configured such that it is spaced apart from the data line DL and extends substantially along the gap direction Y.

[0114] The second conductive layer is formed by creating a conductive film on the intermediate insulating layer 140 using a printing process, a sputtering process, a chemical vapor deposition process, a pulsed laser deposition process, a vacuum deposition process, an atomic layer deposition process, or the like, and by performing a patterning process using an etching process with a mask. A fifth mask can be used here.

[0115] With reference to Fig. 16 and Fig. 17. The first passivation layer 150 can be formed on the second conductive layer. Furthermore, the pixel electrode 310 can be formed on the first passivation layer 150. The pixel electrode 310 is structured by an etching process using a mask to form it corresponding to the opening region OA. A sixth mask can be used here.

[0116] With reference to Fig. 18 and Fig. 19. The second passivation layer 160 can be formed on the pixel electrode 310. Then, contact holes H2 and H3 can be formed to connect the pixel electrode 310 and the underlying layer, for example, the drain electrode 240. For example, the second contact hole H2 is formed to penetrate the second passivation layer 160 and can connect the pixel electrode 310 and an island pattern of the common electrode 320 to be formed later, and the third contact hole H3 is formed to penetrate the second passivation layer 160 and the first passivation layer 150 and can connect the drain electrode 240 and the island pattern 324 of the common electrode 320.

[0117] Furthermore, a contact hole H4 can be formed to connect the touch detection line SL and the common electrode 320. For example, the fourth contact hole H4 is designed to penetrate the first and second passivation layers 150 and 160, and can thus connect the common electrode 320 and the touch detection line SL ( Fig. 5) Connect. These contact holes H2, H3 and H4 can be formed by a masking process, and a seventh mask can be used here.

[0118] With reference to Fig. 20 and Fig. In step 21, the common electrode 320 is formed on the second passivation layer 160. The common electrode 320 is formed to include the branching sections 321, which are arranged side by side at equal intervals, and the stem section 322, which connects the branching sections 321. The branching sections 321 extend substantially in the row direction X within the opening region OA, and the stem sections 322 are formed to extend in the column direction Y, connecting the branching sections 321 at both ends. The common electrode 320 can be formed by performing a masking process to have a corresponding shape. In this case, an eighth mask can be used.

[0119] A section of the common electrode 320 can be configured as an island pattern 324 that overlaps the second and third contact holes H2 and H3. The island pattern 324 can have various shapes, such as a circle, an ellipse, or a polygon. The island pattern can be connected to the pixel electrode 310 and the drain electrode 240 through the second and third contact holes H2 and H3, thus electrically connecting them.

[0120] In the display device 1 of the present embodiment, the stacked structure of the lower substrate 100 is produced by the eight masking processes as described above. In a further embodiment, the number of required masking processes is increased if the touch detection line SL is formed on a separate upper conductive layer or if the dummy line is required. If the bump pattern is additionally formed, the number of required masking processes can increase to up to eleven.

[0121] However, since in the present embodiment the lower substrate 100 can be produced by eight mask processes, the manufacturing process can be simplified and the manufacturing costs reduced.

[0122] Fig. Figure 22 is an enlarged top view of an area of ​​a display device of an execution device. In particular, it shows Fig. 22 four adjacent touch blocks TB1 to TB4.

[0123] The respective touch blocks TB1 to TB4 can correspond to multiple pixels. The common electrodes 320 of pixels contained in each of the touch blocks TB1 to TB4 can be interconnected and serve as a touch sensing electrode TE (see Fig. 2) At the boundary between the different contact blocks TB1 to TB4, the common electrodes 320 are not connected to each other and are separated.

[0124] As stated with reference to Fig. 3 and Fig.As described in Figure 5, these touch sensing electrodes TE can be connected to the touch sensing line SL via a contact hole to transmit a touch sensing signal. However, as shown, the touch sensing line SL is not located at the boundary between the touch blocks TB1 to TB4, and no contact area for connecting the touch sensing line SL is provided.

[0125] The display device and the manufacturing process for it according to embodiments can ensure a light transmission required for a display board and improve its viewing angle.

[0126] Furthermore, according to embodiments, the display device and the manufacturing process for it can reduce the number of masks during a manufacturing process and reduce manufacturing costs by omitting the components.

[0127] Experts in the field to which this disclosure relates will recognize that the present disclosure can be implemented in other specific forms without altering its technical principle or essential features. Therefore, it is understood that the embodiments described above are in every respect illustrative and not limiting. The scope of this disclosure is determined more by the scope of the claims described below than by a precise description, and it is understood that all modified or adapted forms derived from the meaning and scope of the claims and their equivalent concepts are included within the scope of this disclosure. QUOTES INCLUDED IN THE DESCRIPTION

[0000] This list of documents cited by the applicant was automatically generated and is included solely for the reader's convenience. The list is not part of the German patent or utility model application. The DPMA accepts no liability for any errors or omissions. Cited patent literature

[0000] KR 1020210193659

[0001]

Claims

[1] Display device comprising the following: a pixel electrode (310) in an aperture area (OA); a common electrode (320) with at least one area that overlaps the pixel electrode (310) in the opening area (OA); a gate line (GL) extending along a line direction (X) in a non-opening region (NOA), wherein the non-opening region (NOA) surrounds the opening region (OA); a data line (DL) extending along the non-opening area (NOA) in a column direction (Y) perpendicular to the row direction (X); and a touch detection line (SL) extending in the column direction (Y) across the opening area (OA), where the opening area (OA) has a length in the row direction that is greater than a length in the column direction. [2] Display device according to claim 1, wherein the common electrode (320) comprises: several branching sections (321) extending in the row direction (X) in the opening area (OA), wherein the several branching sections (321) are arranged in the column direction (Y) at equal intervals, such that the distance between each pair of adjacent branching sections (321) is the same among the several branching sections (321); and a stem section (322) that connects the several branching sections (321) together, the stem section (322) extending in the column direction (Y). [3] Display device comprising: multiple pixels (PX) comprising a pixel with an opening area (OA) for displaying an image and a non-opening area (NOA) in which the image is not displayed, wherein the opening area (OA) has a length in a first direction (X) that is longer than a length in a second direction (Y) that differs from the first direction (X); multiple gate lines (GL) connected to the multiple pixels (PX), wherein the multiple gate lines (GL) include a gate line (GL) extending in the first direction (X) into the non-opening area (NOA) of the pixel (PX); multiple data lines (DL) connected to the multiple pixels (PX), wherein the multiple data lines (DL) include a data line (DL) extending in the second direction (Y) into the non-opening area (NOA) of the pixel (PX); multiple touch detection lines (SL), including a touch detection line (SL) that extends in the second direction (Y) across the opening area (OA) of the pixel (PX); wherein the pixel (PX) comprises a pixel electrode (310) in the aperture area (OA) of the pixel (PX) and a common electrode (320) with a section overlapping the pixel electrode (310) in the aperture area (OA), wherein the section of the common electrode (320) has a length in the first direction (X) that is longer than a length of the section of the common electrode (320) in the second direction (Y). [4] Display device according to claim 3, wherein the section of the common electrode (320) in the opening region (OA) has several projections (321) extending in the first direction (X) in the opening region (OA), wherein the several projections (321) are arranged at equal intervals in the second direction (Y) such that the distance between each pair of adjacent projections (321) is the same among the several projections (321), and / or the common electrode (320) further comprises a connecting section (322) extending in the second direction (Y) in the non-opening region (NOA), wherein the connecting section (322) connects the several projections (321) to each other. [5] Display device according to one of the preceding claims, wherein the pixel electrode (PX) has a rectangular shape, wherein a length of the pixel electrode (PX) in the first direction (X) is longer than a length of the pixel electrode (PX) in the second direction (Y). [6] Display device according to any one of the preceding claims, further comprising: a substrate (100); a first conductive layer arranged on the substrate (100), wherein the first conductive layer comprises the gate line (GL); a second conductive layer arranged on top of the first conductive layer, the second conductive layer comprising the data line (DL) and the touch sensing line (SL); and a passivation layer (150) on the second conductive layer, wherein the pixel electrode (310) is arranged on the passivation layer (150) and the common electrode (320) is arranged on the pixel electrode. [7] Display device according to one of the preceding claims, wherein the touch detection line (SL) is on the same layer as the data line (DL) and does not overlap with the data line (DL). [8] Display device according to any one of the preceding claims, further comprising: a color filter (410) in the aperture range (OA); and a black matrix (420) around the color filter (410) that overlaps the touch detection line (SL). [9] Manufacturing process of a display device, the manufacturing process comprising: Forming a light-blocking layer (110) on a substrate (100) using a first mask, wherein the substrate (100) has an opening area (OA) and a non-opening area (NOA) surrounding the opening area (OA); Forming an active layer (210) on the light-blocking layer (110) using a second mask; Forming a gate line (GL) extending in a line direction (X) in the non-opening region (NOA) using a third mask; Forming an intermediate insulating layer (140) covering the gate line (GL); Forming a first contact hole (H1) that exposes an area of ​​the active layer (210) using a fourth mask; Forming a data line (DL) extending in a column direction (Y) perpendicular to the row direction (X) within the non-opening area (NOA), and a touch sensing line (SL) extending in the column direction (Y) across the opening area (OA), using a fifth mask; and Forming a pixel electrode (310) in the opening area (OA) using a sixth mask, where the opening area (OA) has a length in the row direction (X) that is longer than a length in the column direction (Y). [10] Manufacturing method of the display device according to claim 9, wherein forming the gate line (GL) comprises forming a gate electrode (220) of a transistor (200) which overlaps a channel region (CH1, CH2) of the active layer (210), and wherein forming the data line (DL) and the touch sensing line (SL) comprises forming a drain electrode (240) and a source electrode (230) of the transistor which overlap the first contact hole (H1). [11] Manufacturing method of the display device according to claim 10, further comprising: Forming a passivation layer (150) that covers the pixel electrode (310); Forming a second contact hole (H2) that exposes an area of ​​the drain electrode (240) using a seventh mask; and Forming a common electrode (320) with at least one area overlapping the pixel electrode (310) using an eighth mask, wherein the common electrode (320) is connected to the drain electrode (240) through the second contact hole. [12] Manufacturing method of the display device according to any one of the preceding claims 9-11, wherein the data line (DL) and the touch detection line (SL) are formed on the same layer and do not overlap each other. [13] Manufacturing method of the display device according to any one of the preceding claims 9-12, wherein the pixel electrode (310) has a rectangular shape, wherein a length of the pixel electrode (310) in the row direction (X) is longer than a length of the pixel electrode (310) in the column direction (Y). [14] Manufacturing method of the display device according to any one of the preceding claims 9-13, wherein the common electrode (320) is formed by structuring such that it comprises: several branching sections (321) extending in the row direction (X) in the opening area (OA), wherein the several branching sections (321) are arranged at equal intervals in the column direction (Y) such that the distance between a pair of adjacent branching sections (321) is the same among the several branching sections (321); and a stem section (322) that connects the several branching sections (321) together, the stem section (322) extending in the column direction (Y). [15] Manufacturing method of the display device according to any one of the preceding claims 9-14, further comprising: Forming a color filter (410) in the aperture area (OA); and Forming a black matrix (420) around the color filter (410) that overlaps the touch detection line (SL).

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