Mask inspection device for photomasks of EUV lithography and carrier element for use in a mask inspection device

Abstract

Mask inspection device (1) for photomasks (2) of EUV lithography, comprising: - a receiving device (3) for a photomask (2), - a light source (4) for illuminating the photomask with an illumination beam (5), - a detection unit (6) for receiving at least a portion of the photomask (2), - at least one beam shaping element (7) for adapting the illumination beam (5) and - at least one aperture (8) in the light path between the photomask (2) and the detection unit (6), wherein the at least one beam shaping element (7) and the at least one aperture (8) are arranged in a fixed spatial relationship to each other on a common support element (9,9'), characterized in that the common support element (9,9') is designed as a lithographically processed plate.

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