Process gas valve, especially for atomic layer deposition, as well as evaporator module and reaction chamber with the same

Abstract

Process gas valve, particularly for ALD and CVD applications, characterized in that a sealing element arranged axially movable in a media-contacting area of ​​a valve body has a permanent magnet aligned in the direction of movement and can be actuated by a permanent actuating magnet that can be approached and removed coaxially outside the valve body, wherein the sealing element seals a valve seat by means of a valve spring and a sealing surface arranged away from the actuating magnet and opens the valve seat by magnetic attraction when the actuating magnet, which is aligned with the opposite pole, is approached.

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