Mirror and system of semiconductor technology

Abstract

The invention relates to a mirror (1) comprising: a substrate (2) with a mirror surface (2a) onto which a coating (3) for reflecting radiation, in particular for reflecting EUV radiation, is applied, and at least one hollow structure (5) formed in the substrate (2). The hollow structure (5) has at least one preferably straight channel section (7) extending from a side surface (8) of the substrate at an angle (θ) other than 0°. The invention also relates to a semiconductor technology system, in particular an EUV lithography system, comprising at least one such mirror (1).

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