Device and method for processing a workpiece with an ion beam

DE102025101792A1Undetermined Publication Date: 2026-07-23CARL ZEISS SMT GMBH
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Patent Information

Application Number
DE102025101792
Authority / Receiving Office
DE · DE
Patent Type
Applications
Current Assignee / Owner
Filing Date
2025-01-20
Publication Date
2026-07-23

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Abstract

A device for processing a workpiece (14) with an ion beam (34) comprises a holder (12) for receiving the workpiece (14), an ion source (24) for generating ions, and an extraction grid (28) for accelerating the ions so that a directed ion beam (34) emerges from the extraction grid (28). Behind the extraction grid (28) is an aperture (36; 36a, 36b) that limits the cross-section of the ion beam (34) and is adjustable such that the angular distribution of the ion beam (34) changes when the aperture (36) is adjusted.
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Citation Information

Patent Citations

  • LOAD CARRIER PRODUCTION SOURCE

    DE102021115731B3

  • System and method for deflecting and focusing a broad ion beam

    US4381453A

  • Confined ion beam sputtering device and method

    US4747922A