Method for registering structures in an image of a photolithography mask with corresponding structures in a reference image
DE102025102252A1Undetermined Publication Date: 2026-08-06CARL ZEISS SMT GMBH
Patent Information
- Authority / Receiving Office
- DE · DE
- Patent Type
- Applications
- Current Assignee / Owner
- CARL ZEISS SMT GMBH
- Filing Date
- 2025-01-22
- Publication Date
- 2026-08-06
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Abstract
The invention relates to a method (26) for registering structures in an image (22) of a photolithography mask (14), comprising: providing an image (22) of a photolithography mask (14) that is captured by an optical system (10, 10'), wherein the noise distribution of the image (22) varies depending on at least one property of the image (22), the photolithography mask (14) or the optical system (10, 10'); and registering structures in a transformation of the image (22) with corresponding structures in a reference image (64) of the photolithography mask (14), wherein the variation of the noise distribution in the transformed image (28) is reduced.
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Citation Information
Patent Citations
Computer-implemented method, computer-readable medium, computer program product, and corresponding systems for simulating electromagnetic near fields or aerial images of photolithography masks
DE102022135019A1
Method for registering structures in at least one image of a photolithography mask, obtained by an optical system with a resolution limit, with corresponding structures in a reference image
DE102025102245A1
Computer implemented method, computer-readable medium, computer program product and corresponding systems for generating aerial images of photolithography masks
WO2024141484A1
DE102024139922A1