Method and apparatus for cleaning the surfaces of a component; lithography system
DE102025133240A1Undetermined Publication Date: 2026-08-06CARL ZEISS SMT GMBH
Patent Information
- Authority / Receiving Office
- DE · DE
- Patent Type
- Applications
- Current Assignee / Owner
- CARL ZEISS SMT GMBH
- Filing Date
- 2025-08-20
- Publication Date
- 2026-08-06
Smart Images
Figure 00000000_0000_ABST
Abstract
The invention relates to a method for cleaning surfaces (1) of a component (2), in particular for removing contaminants (3), further especially filmic and / or organic contaminants, from surfaces of mechanical assemblies of a lithography system, comprising at least the following steps in the specified order: (a) cleaning the surface (1) using a CO2 snow jet; (b) optically inspecting the surface (1) to locate any contaminants (3) that may still be remaining after step (a), in particular fluorescent ones; and (c) cleaning the surface (1) by removing the contaminants (3) located in step (b) using a laser beam and / or ozone.
Need to check novelty before this filing date? Find Prior Art
Citation Information
Patent Citations
Facet mirror e.g. field facet mirror, for use as bundle-guiding optical component in illumination optics of projection exposure apparatus, has single mirror tiltable by actuators, where object field sections are smaller than object field
DE102008009600A1
Methods for cleaning and purity control
DE102021113926A1
Method and apparatus for removing impurities from a component for semiconductor manufacturing
DE102021207365A1
Method and apparatus for removing impurities from a component for semiconductor manufacturing
DE102021207365B4
Optical element for a lighting system
EP1614008B1