DISPLAY PANEL, MANUFACTURING METHOD FOR THE DISPLAY PANEL AND DISPLAY DEVICE
DE102025152608A1Undetermined Publication Date: 2026-07-30GUANGZHOU CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
View PDF 0 Cites 0 Cited by
Patent Information
- Authority / Receiving Office
- DE · DE
- Patent Type
- Applications
- Current Assignee / Owner
- GUANGZHOU CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
- Filing Date
- 2025-12-12
- Publication Date
- 2026-07-30
Smart Images

Figure 00000000_0000_ABST
Abstract
The present application discloses a display panel, a manufacturing process for the display panel, and a display device. The display panel comprises a substrate, a buffer layer, an active layer, a gate isolation layer, and a gate layer. By forming at least one of the buffer layer and the gate isolation layer with a stacked layer structure consisting of two layers of the same material in a stacked arrangement, in which the layer facing the active layer has a lower hydrogen content than the layer facing away from the active layer, the uniformity of the thin-film transistors in the display area can be improved. Furthermore, the active layer is provided as a stacked layer structure formed by a first partial active layer and a second partial active layer, wherein the mobility of the first partial active layer is greater than the mobility of the second partial active layer.This allows the subthreshold slope of the thin-film transistors to be increased without affecting the initial threshold voltage of the thin-film transistors, thus improving the uniformity of the thin-film transistors in the display area and simultaneously increasing the power handling capacity of the thin-film transistors in the non-visible area.
Need to check novelty before this filing date? Find Prior Art