Optical devices and methods for their manufacture

DE102025155016A1Undetermined Publication Date: 2026-07-23TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
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Patent Information

Authority / Receiving Office
DE · DE
Patent Type
Applications
Current Assignee / Owner
TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
Filing Date
2025-12-23
Publication Date
2026-07-23
Patent Text Reader

Abstract

A method comprises fabricating a photonic integrated circuit comprising: a first waveguide; a second waveguide above the first waveguide, wherein the second waveguide is optically coupled to the first waveguide; a first external coupler optically coupled to the second waveguide; and a first interconnect structure. The method further comprises: attaching an electronic die to a first side of the photonic integrated circuit; direct bonding a first photonic die to a second side of the photonic integrated circuit, wherein, after direct bonding, the first photonic die is optically coupled to the first waveguide; and fabricating a second interconnect structure above the first photonic die and the photonic integrated circuit.
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