Capacitor cell regions, semiconductor device comprising these, and method for their manufacture
DE102026105559A1Undetermined Publication Date: 2026-10-08TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
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Patent Information
- Application Number
- DE102026105559
- Authority / Receiving Office
- DE · DE
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-07-30
- Filing Date
- 2026-02-11
- Publication Date
- 2026-10-08
Abstract
A semiconductor device comprises: in a first metallization layer (M_1st layer), M_1st segments having a first center-to-center spacing and essentially a first width with a uniform first gap between them; and capacitor cell regions (capacitor cells) arranged in an array, comprising first capacitor cells and second capacitor cells; each capacitor cell having a first number and substantially uniform physical arrangement of the M_1st segments; the electrical arrangements of the M_1st segments for the second capacitor cells being different from those for the first capacitor cells; and, for each of the capacitor cells, couplings between the M_1st segments and, accordingly, a first voltage or a second voltage being configured such that each of the first capacitor cells essentially provides a first capacitance.and each of the second capacitor cells essentially provides a non-zero second capacitance that is smaller than the first capacitance.
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Citation Information
Patent Citations
US63783040B1