METHOD FOR MANUFACTURING OPTOELECTRONIC SEMICONDUCTOR COMPONENTS AND OPTOELECTRONIC SEMICONDUCTOR COMPONENT

Abstract

Method for the fabrication of optoelectronic semiconductor devices (1) comprising the following steps in the specified order: - Providing a light-emitting diode chip (2) and a phosphor body (3), - Applying a sacrificial layer (4) exclusively to one top surface (30) of the phosphor body (3), - Applying the phosphor body (3) to the light-emitting diode chip (2), - Forming an encapsulation body (5) directly around the light-emitting diode chip (2) and the phosphor body (3) by means of film-supported molding, wherein at least in places a surface (40) of the sacrificial layer (4) facing away from the phosphor body (3) remains unsealed with a molding film (61), and - Removal of the sacrificial layer (4) so ​​that the top surface (30) of the phosphor body (3) is free of the sacrificial layer (4), wherein the sacrificial layer (4) is removed exclusively by wet blasting with at least one liquid, comprising deionized water, using a water jet (9) at a temperature between and including 60 °C and inclusive 95 °C, wherein the removal of the sacrificial layer (4) results in a tear-off edge (55b) at the edges of the encapsulation body (5) and the encapsulation body (5) has a reduced thickness at the tear-off edge (55b) on the phosphor body (3).

Description

[0001] A method for producing optoelectronic semiconductor components is specified.

[0002] The document DE 10 2018 104 381 A1 relates to an optoelectronic component comprising a carrier, an optoelectronic arrangement, and a potting material. The optoelectronic arrangement comprises an optoelectronic semiconductor chip. The optoelectronic arrangement is arranged above a top side of the carrier. The potting material is arranged above the top side of the carrier such that the optoelectronic arrangement is embedded in the potting material. A radiation emission surface of the optoelectronic arrangement is not covered by the potting material. A surface of the potting material is formed above the radiation emission surface with respect to the top side of the carrier.

[0003] The document DE 10 2013 202 906 A1 is directed to a method for producing an optoelectronic component. The method comprises steps of providing an optoelectronic semiconductor chip having a front side and a back side, applying a sacrificial layer to the back side, forming a molded body, wherein the optoelectronic semiconductor chip is at least partially embedded in the molded body, and removing the sacrificial layer.

[0004] The document US 2018 / 0 182 934 A1 shows an optoelectronic semiconductor component with a phosphor body and a manufacturing method therefor in which foil-assisted transfer molding is used.

[0005] One problem to be solved is to provide a method for manufacturing optoelectronic semiconductor components in which negative effects of mold burrs can be avoided.

[0006] This object is achieved by a method having the features of claim 1. Preferred developments are the subject of the dependent patent claims.

[0007] In the method according to the invention, a reflective encapsulation body is produced by foil-supported molding. To prevent a mold burr of the encapsulation body on a radiation exit side, an LED chip or a phosphor body is provided with a sacrificial layer. A possible mold burr on the component can be removed simultaneously by removing the sacrificial layer or is prevented by the sacrificial layer.

[0008] The process is used to manufacture optoelectronic semiconductor components. In particular, these optoelectronic semiconductor components are light-emitting diodes (LEDs). This means that the optoelectronic semiconductor components can be configured to generate light, particularly visible light such as white light.

[0009] The method comprises providing a light-emitting diode chip and / or a phosphor body as a method step. The light-emitting diode chip, or LED chip for short, preferably has a semiconductor layer sequence for generating radiation. A wavelength of the radiation to be generated lies in particular in the near ultraviolet spectral range, the visible range, and / or the near infrared spectral range. For example, the light-emitting diode chip is configured to generate blue light.

[0010] According to at least one embodiment, the semiconductor layer sequence is based on a III-V compound semiconductor material. The semiconductor material is, for example, a nitride compound semiconductor material such as Al n In 1-n-m Ga m N or a phosphide compound semiconductor material such as Al n In 1-n-m Ga m P or an arsenide compound semiconductor material such as Al n In 1-n-m Ga m As, where 0 ≤ n ≤ 1, 0 ≤ m ≤ 1, and n + m ≤ 1 apply. The semiconductor layer sequence may contain dopants and additional components. For the sake of simplicity, however, only the essential components of the crystal lattice of the semiconductor layer sequence are specified, i.e., Al, As, Ga, In, N, or P, even though these can be partially replaced and / or supplemented by small amounts of other substances. The semiconductor layer sequence is particularly preferably based on the AlInGaN material system.

[0011] The phosphor body serves to partially or completely convert the wavelength of the light emitted by the LED chip. This means that at least a portion of the radiation emitted by the LED chip is absorbed by at least one phosphor and converted into radiation with, in particular, a longer wavelength. For example, the phosphor body contains a phosphor to generate yellow light from blue light, so that the optoelectronic semiconductor component can emit white light. The phosphor body can comprise a mixture of different phosphors, for example, to generate yellow light and also to generate red light, for example, to increase a color rendering index, particularly in the red spectral range.

[0012] The phosphor body may comprise a phosphor or a phosphor mixture comprising at least one of the following materials: Eu 2+-doped nitrides such as (Ca,Sr)AlSiN3:Eu 2+ , Sr(Ca,Sr)Si2Al2N6:Eu 2+ , (Sr,Ca)AlSiN3*Si2N2O:E u 2+ , (C a ,Ba,Sr)2Si5N8:Eu 2+ , (Sr,Ca) [LiAl3N4]:Eu 2+ Garnets from the general system (Gd,Lu,Tb,Y)3(Al,Ga,D)5(O,X) 12 :RE with X = halide, N or a divalent element, D = a tri- or tetravalent element and RE = rare earth metals such as Lu3 (Al 1-x Ga x )5O 12 :Ce 3+ , Y3(Al 1-x Ga x )5O 12 :Ce 3+ ; Eu 2+ -doped sulfides such as (Ca,Sr,Ba)S:Eu 2+ ; Eu 2+ -doped SiONs such as (Ba,Sr,Ca)Si2O2N2:Eu 2+ ; SiAlONs, for example, from the Li system x M y Ln z Si 12 - (m+n) Al (m+n) O n N 16-n ; beta-SiAlONs from the Si system 6-x Al z O y N 8-y :RE z ; Nitrido orthosilicates such as AE 2-x-a REX Eu a SiO 4-x N x , AE 2-x-a RE x Eu a Si 1-y O 4-x-2y N x with RE = rare earth metal and AE = alkaline earth metal; orthosilicates such as (Ba,Sr,Ca,Mg)2SiO4:Eu 2+ ; Chlorosilicates such as CaeMg(SiO4)4Cl2:Eu 2+ ; Chlorophosphates such as (Sr,Ba,Ca,Mg) 10 (PO4)6Cl2:Eu 2+ ; BAM luminescent materials from the BaO-MgO-Al2O3 system such as BaMgAl 10 O 17 :Eu 2+ ; halophosphates such as M5(PO4)3(Cl,F):(Eu 2+ ,Sb 3+ ,Mn 2+ ); SCAP luminescent materials such as (Sr,Ba,Ca)5(PO4)3Cl:Eu 2+ ; KSF luminescent materials such as K2SiF6:Mn 4+Quantum dots can also be used as luminescent materials. Quantum dots in the form of nanocrystalline materials containing a group II-VI compound and / or a group III-V compound and / or a group IV-VI compound and / or metal nanocrystals are preferred.

[0013] The method comprises applying a sacrificial layer exclusively to a top side of the phosphor body or exclusively to a top side of the LED chip as a process step. This means that the respective top side, and only the respective top side, is covered by the sacrificial layer. Other components or other regions of the optoelectronic semiconductor component to be manufactured are thus preferably free of the sacrificial layer.

[0014] The method comprises applying the phosphor body to the LED chip as a process step. This is done, for example, using a pick-and-place process. The phosphor body can be applied to the light-emitting semiconductor chip using an adhesive. An adhesive can therefore be located between the phosphor body and the LED chip, preferably a thin adhesive with a thickness of, for example, at most 10 µm, 5 µm, or 2 µm.

[0015] Alternatively, the phosphor body can be applied to the LED chip by lamination or by printing, for example, screen printing. However, the phosphor body preferably has a defined geometry before being applied to the LED chip.

[0016] The method includes forming an encapsulation body directly around the LED chip and / or the phosphor body as a process step. The molding is a foil-supported molding process.

[0017] A surface of the sacrificial layer facing away from the phosphor body and / or the LED chip with a molding film used in the molding step remains unsealed. This applies in particular to at least one or a portion of the LED chips and / or phosphor bodies provided with the encapsulation body. This means that most of the phosphor bodies and / or LED chips are sealed or completely sealed with the molding film as intended. Coincidentally, however, the seal is not perfect for all phosphor bodies and / or LED chips.

[0018] The process includes removing the sacrificial layer as a step. This removes the sacrificial layer from the top surface of the phosphor body and / or the LED chip.

[0019] Thus, the process is used to manufacture optoelectronic semiconductor components and comprises the following steps, in the given order: - Providing a light-emitting diode chip and optionally a phosphor body, - applying a sacrificial layer exclusively on an upper side of the phosphor body or exclusively on an upper side of the light-emitting diode chip, - optional application of the phosphor body to the LED chip, - forming an encapsulation body directly around the LED chip and optionally directly around the phosphor body by means of foil-assisted molding, wherein a surface of the sacrificial layer facing away from the LED chip remains partially unsealed with a molding foil, and - Removing the sacrificial layer so that the top side of the phosphor body or the LED chip is free of the sacrificial layer.

[0020] Typically, when stacks of phosphor elements and LED chips are applied to a carrier, the stacks are not all exactly the same height. For example, with a total height of the LED chips including the phosphor elements of approximately 250 µm, this results in a height deviation of approximately + / - 15 µm. In a film-based molding process, or FAM for short, this height variance cannot be fully compensated for by a forming film. For example, some of the LED chips or phosphor elements are not completely sealed with the forming film. Therefore, a forming flash can occur on the upper side of the respective LED chip or phosphor element during film-based molding.

[0021] If such a flash occurs on the phosphor body or on the LED chip, the respective stack cannot be used or such a flash must be removed, for example, by wet blasting. Wet blasting typically uses water with an abrasive material to remove the flash. However, such wet blasting carries the risk of damaging the phosphor body or the encapsulation layer surrounding the phosphor body.

[0022] The process described here makes it possible to achieve high yields while eliminating additional steps such as a conventional wet blasting process for removing the mold flash. The sacrificial layer can be reliably removed under defined conditions, while the mold flash can be removed along with the sacrificial layer.

[0023] Due to the unsealed surface, the encapsulation body extends partially or completely onto the surface of the sacrificial layer during molding, and thus onto the top surface of the phosphor body. This means that a molding burr is formed on the top surface because the top surface is not completely and tightly covered by the molding film.

[0024] According to at least one embodiment, the upper side of the phosphor body is completely freed from the encapsulation body by removing the sacrificial layer. Thus, after removal of the sacrificial layer, no or no significant portion of the upper side is covered with the encapsulation body or a material of the encapsulation body. A "significant portion" means, for example, a portion of at most 2%, 1%, or 0.5%. This means that a very small portion of material of the encapsulation body may remain on the upper side, wherein this very small portion does not impair, or does not significantly impair, the emission properties of the finished optoelectronic semiconductor component.

[0025] According to at least one embodiment, the thickness of the encapsulation body on the sacrificial layer prior to removal of the sacrificial layer is comparatively small. This thickness of the encapsulation body is, for example, at least 0.3 µm, 0.5 µm, or 2 µm and / or at most 20 µm, 15 µm, or 10 µm.

[0026] According to at least one embodiment, the area fraction of the surface of the sacrificial layer covered by the encapsulation body is at least 0.5%, 1%, 3%, or 5%. Alternatively or additionally, this area fraction is at most 40%, 25%, or 15%. Thus, the mold burr can cover the surface of the sacrificial layer to a comparatively large extent.

[0027] According to at least one embodiment, the sacrificial layer has anti-wetting properties with respect to a material of the encapsulation body during the foil-supported process. Using such a material, it is possible to prevent the encapsulation body from covering the sacrificial layer and / or to significantly reduce the extent of the surface of the sacrificial layer covered by the mold flash.

[0028] According to at least one embodiment, the sacrificial layer comprises a fluorine-containing polymer, in particular a fluorinated or perfluorinated polymer. Such polymers can be similar to polytetrafluoroethylene, also known as Teflon. Such polymers can preferably be applied to the phosphor body and / or the LED chip with a very thin layer thickness of, for example, a maximum of 1 µm.

[0029] According to at least one embodiment, the sacrificial layer consists of a thermoplastic polymer. This allows the sacrificial layer to be efficiently applied to the LED chip and / or the phosphor body.

[0030] In particular, fluorinated thermoplastic polymers are used.

[0031] The sacrificial layer comprises or consists of a water-soluble polymer. Water-soluble polymers are described, for example, in the publications US 2002 / 0035222 A1 or EP 0 400 808 A2 or US 2009 / 0004373 A1.

[0032] The sacrificial layer is removed by wet blasting. Wet blasting is performed exclusively with one or more liquids. This means that, in addition to the liquid or liquids, no additional abrasive materials such as particles are used in wet blasting.

[0033] The sacrificial layer is removed by wet blasting with deionized water. This wet blasting process takes place at a water temperature of at least 60°C or 75°C and at a water temperature of at most 95°C, 90°C, or 85°C. This allows hot water to be used to remove the sacrificial layer. During wet blasting, the sacrificial layer is destroyed and no longer remains as an intact, coherent layer.

[0034] Pure water can be used. Alternatively, water containing an additive, i.e., a liquid additive, can also be used for wet blasting. Such additives can increase the solubility of the polymer. Preferably, such additives have a concentration of no more than 5% or 2% by volume.

[0035] According to at least one embodiment, the sacrificial layer is applied to the phosphor body before the phosphor body is applied to the LED chip. For example, the sacrificial layer is applied to a phosphor layer formed as a film. The film, which comprises the luminescent material and the sacrificial layer, can then be separated into the phosphor bodies. These phosphor bodies are subsequently applied to the respective LED chips. This prevents the LED chips themselves from coming into contact with a material for the sacrificial layer. Thus, contamination of the LED chips with a material for the sacrificial layers can be avoided.

[0036] Alternatively, the sacrificial layer can be applied to the phosphor bodies when the phosphor bodies are already placed on the respective LED chips. However, the sacrificial layer is preferably applied to the phosphor bodies before the phosphor bodies are applied to the LED chips.

[0037] According to at least one embodiment, the sacrificial layer is comparatively thin. In particular, the thickness of the sacrificial layer on the phosphor body or on the light-emitting diode chip is at most 50 µm, 10 µm, 5 µm, or 2 µm. Alternatively or additionally, the thickness of the sacrificial layer is at least 0.1 µm, 0.2 µm, or 0.5 µm.

[0038] According to at least one embodiment, the phosphor body is a ceramic body or a polymer-containing body, in particular a silicone-containing body. If the phosphor body is a ceramic body, this can mean that the phosphor body consists of phosphor particles sintered onto the ceramic body. Alternatively, the phosphor particles are embedded in a ceramic matrix material. When using polymers such as silicones for the phosphor body, the phosphor is preferably in the form of particles embedded in a polymer matrix material.

[0039] According to at least one embodiment, the light-emitting diode chip is attached to a first leadframe part and electrically connected to a second leadframe part by means of a bonding wire. As an alternative to a leadframe comprising the leadframe parts, a carrier can also be used which has electrical contact surfaces and / or conductor tracks and / or electrical vias. For example, a circuit board such as a printed circuit board or a metal core board or a ceramic board can be used as the carrier. It is also possible to omit bonding wires, so that the light-emitting diode chip can be a flip-chip whose electrical contact surfaces preferably face the carrier or the leadframe parts. Otherwise, electrical contact surfaces of the flip-chip can be located on a side facing away from the carrier or the leadframe parts.

[0040] According to at least one embodiment in which the LED chip is electrically connected to at least one bonding wire, the at least one bonding wire is completely encapsulated in the encapsulation body. Thus, the bonding wire can be protected from mechanical damage by the encapsulation body.

[0041] According to at least one embodiment, a plurality of LED chips and a plurality of the respective luminous elements are provided simultaneously with the encapsulation body. In this way, a type of artificial wafer can be created that comprises the encapsulation body, the LED chips, and the luminous elements. Immediately after forming the encapsulation body, all of these LED chips and all of these luminous elements are mechanically coupled to one another by means of the encapsulation body.

[0042] According to at least one embodiment, the thickness of the LED chips together with the respective associated phosphor bodies has a deviation around a mean value of at least 2 µm, 3 µm, or 6 µm and / or of at most 30 µm, 20 µm, or 15 µm. This means that there is a comparatively large variance in the thicknesses of the LED chips together with the associated phosphor bodies.

[0043] According to at least one embodiment, the sacrificial layer is removed from the corresponding phosphor body and / or LED chip prior to a singulation step of the encapsulation body. The optoelectronic semiconductor components are formed by means of the singulation step. Thus, the sacrificial layer can be removed while the LED chips and the corresponding phosphor bodies are still mechanically coupled to one another. This makes it possible for side surfaces of the encapsulation layer to remain unaffected by the removal of the sacrificial layer.

[0044] The optoelectronic semiconductor component produced by the method comprises one or more of the light-emitting diode chips. At least one phosphor body of the optoelectronic semiconductor component is freely accessible at the respective top side of the phosphor body. The encapsulation body directly borders the light-emitting diode chip and the phosphor body and surrounds them all around in a top view of the top side. The encapsulation body protrudes beyond the top side of the phosphor body. This means that a height or thickness of the encapsulation body can exceed a height or thickness of the phosphor body together with the associated light-emitting diode chip.

[0045] The encapsulation body has at least one tear-off edge near the top of the phosphor body. The encapsulation body has a smaller thickness at the tear-off edge compared to other regions of the encapsulation body.

[0046] A method and an optoelectronic semiconductor component described herein are explained in more detail below using exemplary embodiments with reference to the drawings. Elements that are identical in the individual figures are identified by the same reference numerals. However, the relationships between the elements are not shown to scale; rather, individual elements may be exaggerated for clarity.

[0047] They show: Fig. 1 to 3 schematic sectional views of process steps of a modified process; Fig. 4 is a plan view of a modified semiconductor device manufactured using a modified process; Fig. 5 to 7 show sectional views of process steps of a process described here for producing optoelectronic semiconductor components described here; Fig. 8 and Fig. 9 perspective views of process steps of a process described here for producing optoelectronic semiconductor components described here; Fig. 10 is a sectional view of an embodiment of an optoelectronic semiconductor device described herein; Fig. 11 and Fig. 12 sectional views of process steps of a process described here for producing optoelectronic semiconductor components described here; and Fig. 13 and Fig. 14 Block diagrams of a modification of a method and an embodiment of a method described here.

[0048] The Fig. 1 to 3 show process steps of a modification of a process. According to Fig. 1, light-emitting diode chips 2 are applied to a carrier 8. The carrier 8 is provided with electrical contact surfaces 81. Phosphor bodies 3 are located on the light-emitting diode chips 2.

[0049] There are manufacturing-related height differences D between the individual stacks of light-emitting diode chips 2 and the associated phosphor bodies 3.

[0050] When processing these stacks of LED chips 2 and phosphor bodies 3 in a foil-supported process, compare Fig. 2, some of the stacks are pressed into a forming film 61 and others are flush with the forming film 61. However, in some of the stacks, a gap V may be present at the respective phosphor body, so that the forming film 61 does not tightly seal the respective phosphor body 3 at an upper side 30.

[0051] When forming an encapsulation body 5 using the foil-assisted molding method, it is therefore possible that a mold ridge M covers some of the stacks of the LED chips 2 and the phosphor bodies 3. Other stacks can be flush with an upper side 50 of the encapsulation body 5 or can protrude with their upper sides 30 beyond the upper side 50 of the encapsulation body 5. This is shown in Fig. 3 shown.

[0052] In the top view in Fig. 4 shows that in the finished component, such a ridge M can partially cover the upper side 30 of the respective phosphor body 3. This reduces the light emission of the respective component. As shown in Fig. 4, the mold ridge M does not necessarily have to cover the entire top surface 30, but may cover a substantial part of the top surface 30 to reduce the light emission.

[0053] In order to prevent such a burr on the upper side of a phosphor body 3 or also on the upper side of a light-emitting diode chip 2, Fig. 5 to 9 show a first embodiment of the method described here.

[0054] According to Fig. 5, the optional phosphor bodies 3 are provided. The upper sides 30 of the phosphor bodies 3 are completely covered with a sacrificial layer 4. A surface 40 of the sacrificial layer 4 faces away from the illustrated phosphor bodies 3.

[0055] Deviating from the representation in Fig. 5, the sacrificial layer 4 is preferably applied simultaneously to a plurality of phosphor bodies 3, which may be present in a phosphor plate. Subsequently, the sacrificial layer 4 and the plate are separated into individual phosphor bodies for the LED chips 2, which is not shown.

[0056] In the process step of Fig. 6, the phosphor bodies 3 with the sacrificial layers 4 are applied to light-emitting diode chips 2. An adhesive 82 may be located between the light-emitting diode chips 2 and the respective phosphor bodies 3. The adhesive 82 is, for example, a silicone adhesive.

[0057] The LED chips 2 can, for example, be mounted on a carrier 8, which can be formed with first leadframe parts 71 and second leadframe parts 72. The LED chips 2 are applied to the first leadframe parts 71. An electrical connection for the second leadframe parts 72 is realized by bonding wires 73. The LED chips 2 can be glued to the first leadframe parts 71 and thus to the carrier 8 using a solder 83.

[0058] In the proceedings of the Fig. Figure 7 shows the film-supported forming step schematically. A large number of the Fig. The units shown in Figure 6 are placed into a mold 6. To seal the upper sides 30 of the phosphor bodies 3, the forming film 61 is pulled through the mold 6. The mold 6 is sealed with the aid of the forming film 61. A material for the encapsulation body is pressed into the mold 6.

[0059] In Fig. Figure 8 shows the resulting artificial wafer after the forming step. The encapsulation body 5 mechanically integrates a plurality of LED chips 2 with the sacrificial layer 4 on the upper sides 30 of the respective phosphor bodies 3. The surface 40 of the individual sacrificial layers 4 is approximately flush with the upper side 50 of the encapsulation body 5. The sacrificial layers 4 are completely surrounded by the material of the encapsulation body 5.

[0060] In this non-inventive embodiment, the sacrificial layer 4 is preferably a fluorinated polymer that can be removed by elevated temperature T. For example, the fluoropolymer Novec™ 1700 Electronic Grade Coating from 3M™ is used. The sacrificial layer is removed, for example, by heating to 250°C. Any mold flash present on the sacrificial layer 4 is removed together with the sacrificial layer 4.

[0061] The resulting arrangement is in Fig. 9. The upper sides 30 of the phosphor bodies 3 are exposed. Due to the small thickness of the sacrificial layer 4, the upper sides 30 are approximately flush with the upper side 50 of the encapsulation body 5.

[0062] This can reduce yield losses due to flash in the foil-assisted forming process. This also reduces the need for comparatively tight thickness tolerances for the components used in this process. This can significantly reduce material costs. Furthermore, no physical damage or notches occur on the LED components, as flash removal processes such as wet blasting with abrasive materials are not required.

[0063] An embodiment of the finished optoelectronic semiconductor component 1 is shown in Fig. 10 shown. Fig. 10 shows the component 1 after an optional process for separating the composite, as shown in Fig. 9 is shown.

[0064] As in Fig. As shown in Figure 10, the encapsulation body 5 can extend beyond the top side 30 of the phosphor body 3. Tear-off edges 55a, 55b can be present at edges of the encapsulation body 5 near the top side 30. At the tear-off edge 55a, the encapsulation body 5 covers the top side 30 to a small extent. At the tear-off edge 55b, however, the encapsulation body 5 is removed to a small extent, so that the encapsulation body 5 has a reduced thickness near the phosphor body 3.

[0065] Both types of tear-off edges 55a, 55b can be present in a single component, or only one type of tear-off edge 55a, 55b can be present. Corresponding tear-off edges 55a, 55b can also be present in all other embodiments.

[0066] The encapsulation body 5 is made, for example, of a silicone in which reflective particles are embedded. Such reflective particles consist, for example, of a metal oxide such as titanium dioxide or zirconium dioxide. Such particles can have diameters in the nanometer range or even in the micrometer range. Due to the large difference in the refractive index between such particles and the silicone matrix material, the encapsulation body appears white to an observer and has a high reflectivity. Such an encapsulation body 5 can also be used in all other embodiments.

[0067] In the Fig. 11 and Fig. 12 shows a second embodiment of the method. According to Fig. 11, the plurality of LED chips with the phosphor bodies 3 and the sacrificial layers 4 are applied. The respective stacks are applied to a carrier 8. These stacks, which comprise the LED chips 2, have a thickness variation of, for example, approximately 10 µm.

[0068] The subsequent step of forming the encapsulation body 5 is carried out analogously to Fig. 7 carried out.

[0069] However, in this embodiment of the method, the sacrificial layer 4 is formed from a water-soluble polymer. Therefore, the sacrificial layer 4 is removed by wet blasting with a water jet 9, see Fig. 12. Wet blasting is preferably carried out exclusively with deionized water, for example, at a water temperature of approximately 80 °C. Since no additional abrasive materials such as particles are required, the risk of damage to the phosphor bodies 3 and the encapsulation body 5 is minimized.

[0070] In this embodiment, the sacrificial layer 4 consists, for example, of Aquabond 85 from Aquabond Technologies.

[0071] Thus, the high-performance, water-soluble thermoplastic adhesive layer 4 can be easily washed away by normal water during the wet blasting process. Therefore, the process does not require highly abrasive chemicals or solid-like particles; instead, non-abrasive chemical materials and normal water are sufficient for wet blasting. Along with the sacrificial layer 4, mold flash or unwanted material residues are also washed away during the wet blasting process when the sacrificial layer 4 dissolves in the water applied by the water jet 9.

[0072] By using a sacrificial layer 4 made of a water-soluble polymer, mild parameters can be used in a wet water blasting process without abrasive materials. This reduces the risk of damaging the layer surface or diluting the phosphor bodies, thus preventing color shifts or brightness drops. Furthermore, damage to the encapsulation layer, which could affect the optical illumination performance, can be avoided. Since no abrasive material is required, the wet blasting process could be more cost-effective. Simplified handling of the wastewater from the wet blasting process is also possible.

[0073] Subsequently, a separation can be carried out, as in connection with the Fig. 9 and Fig. 10 explained.

[0074] In Fig. Figure 13 shows a modification of the process as a block diagram. In process step R1, foil-supported molding is performed, whereby a mold ridge can be formed directly on the top side of the phosphor bodies since no sacrificial layer is present.

[0075] In process step R2, a wet blasting process is carried out using an abrasive material, in particular abrasive particles.

[0076] Subsequently, a separation is carried out (compare process step R3).

[0077] The procedure of Fig. 11 and Fig. 12 is shown schematically in the block diagram of the Fig. 14. In process step S1, the sacrificial layer 4 is applied to the phosphor bodies 3. The sacrificial layer 4 preferably consists of a water-soluble adhesive layer or a fluorinated polymer.

[0078] In process step S2, the foil-supported forming process is carried out, whereby any forming flash is enclosed on the sacrificial layer.

[0079] According to process step S3, the mold burr is removed together with the sacrificial layer 4, whereby no abrasive material is required. Removal is preferably carried out using a water jet or elevated temperature.

[0080] In process step S4, a separation into the optoelectronic semiconductor components 1 is optionally carried out.

[0081] Unless otherwise stated, the components depicted in the figures preferably follow one another directly in the order shown. Layers that are not in contact in the figures are preferably spaced apart from one another. Where lines are drawn parallel to one another, the corresponding surfaces are preferably aligned parallel to one another. Likewise, unless otherwise stated, the relative positions of the drawn components are correctly depicted in the figures. List of reference symbols 1 optoelectronic semiconductor component 2 LED chips 3 fluorescent bodies 30 Top of the fluorescent body 4 sacrificial layer 5 encapsulation bodies 50 upper side of the encapsulation body 55 tear-off edge 6 Shape 61 Forming film 71 first ladder frame part 72 second ladder frame part 73 Bonding wire 8 carriers 81 electrical contact surfaces 82 Adhesive 83 lots 9 Water jet D Differences in altitude M Form ridge R1-3 Process steps of a modified process S1-4 Process steps of a process according to the invention T Temperature V space

Claims

[1] A method for producing optoelectronic semiconductor components (1), comprising the following steps in the specified order: - providing a light-emitting diode chip (2) and a phosphor body (3), - applying a sacrificial layer (4) exclusively on an upper side (30) of the phosphor body (3), - Applying the phosphor body (3) to the light-emitting diode chip (2), - forming an encapsulation body (5) directly around the light-emitting diode chip (2) and the phosphor body (3) by means of foil-supported molding, wherein at least in places a surface (40) of the sacrificial layer (4) facing away from the phosphor body (3) remains unsealed with a molding foil (61), and - removing the sacrificial layer (4) so ​​that the upper side (30) of the phosphor body (3) is free of the sacrificial layer (4), wherein the sacrificial layer (4) is removed exclusively by wet blasting with at least one liquid, comprising deionized water, with a water jet (9) at a temperature between 60 °C and 95 °C inclusive, wherein a tear-off edge (55b) is formed at edges of the encapsulation body (5) during removal of the sacrificial layer (4) and the encapsulation body (5) has a reduced thickness at the tear-off edge (55b) on the phosphor body (3). [2] Method according to the preceding claim, wherein the encapsulation body (5) extends partially onto the surface (40) of the sacrificial layer (4) and thus onto the upper side (30) of the phosphor body (3) due to the unsealed surface (40) during molding, wherein the upper side (30) of the phosphor body (3) is completely freed from the encapsulation body (5) by removing the sacrificial layer (4). [3] Method according to the preceding claim, wherein a thickness of the encapsulation body (5) on the sacrificial layer (4) before removal of the sacrificial layer (4) is between 0.5 µm and 15 µm inclusive, wherein an area proportion of the surface (40) of the sacrificial layer (4) covered with the encapsulation body (5) is between 1% and 25% inclusive. [4] Method according to one of the preceding claims, wherein the sacrificial layer (4) has anti-wetting properties with respect to a material of the encapsulation body (5). [5] Method according to the preceding claim, wherein the sacrificial layer (4) comprises a fluorinated polymer. [6] Method according to one of the preceding claims, wherein the sacrificial layer (4) is applied to the phosphor body (3) before the phosphor body (3) is applied to the light-emitting diode chip (2). [7] Method according to one of the preceding claims, wherein a thickness of the sacrificial layer (4) is between 0.2 µm and 10 µm inclusive. [8] Method according to one of the preceding claims, wherein the phosphor body (3) is a ceramic body or a silicone-containing body. [9] Method according to one of the preceding claims, wherein the light-emitting diode chip (2) is attached to a first lead frame part (71) and electrically connected to a second lead frame part (72) by means of a bonding wire (73), wherein the bonding wire (73) is completely encapsulated in the encapsulation body (5). [10] Method according to one of the preceding claims, wherein a plurality of the light-emitting diode chips (2) and a plurality of the phosphor bodies (3) are provided simultaneously with the encapsulation body (5), immediately after the molding all of these light-emitting diode chips (2) are mechanically connected to one another by means of the encapsulation body (5), wherein thicknesses of the light-emitting diode chips (2) together with the associated phosphor bodies (3) have a deviation of between 3 µm and 20 µm inclusive. [11] Method according to the preceding claim, wherein the sacrificial layer (4) is removed before a singulation step of the encapsulation body (5), wherein the optoelectronic semiconductor components (1) are formed by means of the singulation step.

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