Monitoring device, monitoring procedure and program

DE112024003255T5Undetermined Publication Date: 2026-07-23MITSUBISHI HEAVY INDUSTIES COMPRESSOR CORP
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Patent Information

Authority / Receiving Office
DE · DE
Patent Type
Applications
Current Assignee / Owner
MITSUBISHI HEAVY INDUSTIES COMPRESSOR CORP
Filing Date
2024-05-07
Publication Date
2026-07-23
Patent Text Reader

Abstract

The purpose of the present invention is to provide a monitoring device capable of preventing excessive anomaly detection by increasing monitoring accuracy using a MD value. The monitoring device includes: computational means configured to calculate an MD value based on a process value of a rotating machine; computational means configured to calculate a gap value, which represents the ratio of a difference between a measured value of the process value and the estimated value of the process value, with respect to a difference between a threshold for detecting an anomaly of the process value and an estimated value of the process value; and detection means configured to determine an operating state of the rotating machine based on the MD value and the gap value.
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