ARRANGEMENT FOR PLASMA-ASSISTED GAS PHASE SEPARATION COMPREHENSIVELY INTEGRATED MICROWAVE WAVE GUIDE

DE112024004433T5Undetermined Publication Date: 2026-08-06LEYDENJAR TECH BV
2 Cites 0 Cited by

Patent Information

Authority / Receiving Office
DE · DE
Patent Type
Applications
Current Assignee / Owner
LEYDENJAR TECH BV
Filing Date
2024-10-24
Publication Date
2026-08-06
Patent Text Reader

Abstract

The present invention relates to an arrangement for chemical plasma deposition under low-pressure conditions, in particular plasma-assisted chemical vapor deposition, comprising a support component which integrates both a waveguide and a support component in one piece, wherein the waveguide is installed within the support component.
Need to check novelty before this filing date? Find Prior Art

Citation Information

Patent Citations

  • Vacuum processing chamber for very large area substrates

    CN101728206B

  • Device for generating linearly extended ECR plasmas

    DE19812558B4