MICROSCOPIC SYSTEM FOR INSPECTING STRUCTURES AND DEFECTS ON EUV LITHOGRAPH PHOTOMASKS

DE502020010168D1Active Publication Date: 2025-01-23RI RES INSTR
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Patent Information

Application Number
DE502020010168
Authority / Receiving Office
DE · DE
Patent Type
Patents
Current Assignee / Owner
Priority Date
2019-09-17
Filing Date
2020-09-15
Publication Date
2025-01-23
Estimated Expiration
2040-09-15
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