SEMICONDUCTOR STORAGE DEVICES

DE602019071169T2Active Publication Date: 2025-06-18SAMSUNG ELECTRONICS CO LTD
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Patent Information

Application Number
DE602019071169
Authority / Receiving Office
DE · DE
Patent Type
Patents
Current Assignee / Owner
Priority Date
2018-05-23
Filing Date
2019-02-01
Publication Date
2025-06-18
Estimated Expiration
2039-02-01

AI Technical Summary

Technical Problem

Existing two-dimensional semiconductor devices face limitations in integration density due to the need for expensive patterning technologies to form fine patterns, and three-dimensional semiconductor memory devices are proposed to overcome these limitations.

Method used

A three-dimensional semiconductor memory device is designed with a high integration density, featuring vertically stacked sub-cell arrays, conductive lines, and data storing elements, where semiconductor patterns and insulating layers are alternately stacked to increase density without the need for expensive patterning technologies.

Benefits of technology

The proposed three-dimensional semiconductor memory device achieves a high integration density, enhancing performance and reducing costs by eliminating the need for expensive patterning technologies, while maintaining efficient connectivity through interlayered conductive lines.

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