High-pressure cleaning device and method for operating a high-pressure cleaning device
The high-pressure cleaning device adjusts liquid and additive flow rates using a control signal, simplifying design and reducing costs while maintaining consistent additive concentration, addressing the complexity and expense of existing systems.
Patent Information
- Authority / Receiving Office
- EP · EP
- Patent Type
- Applications
- Current Assignee / Owner
- ANDREAS STIHL AG & CO KG
- Filing Date
- 2025-12-17
- Publication Date
- 2026-06-24
AI Technical Summary
Existing high-pressure cleaning devices require complex and expensive pressure gauges to adjust the additive flow rate to the liquid flow rate, making it difficult to maintain a constant additive concentration with varying liquid flow rates.
A high-pressure cleaning device that adjusts both the liquid and additive flow rates using a control signal, eliminating the need for pressure gauges by interdependently controlling these flows based on the control element's actuation, allowing for quasi-continuous adjustment of fluid flow rates and maintaining constant additive concentration.
Simplifies the design, reduces costs, and ensures a constant additive concentration regardless of liquid flow rate variations, without the need for complex pump output control or expensive components.
Smart Images
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