Method for processing a substrate for an electrochemical cell by means of a processing device
Patent Information
- Application Number
- EP2024799168
- Authority / Receiving Office
- EP · EP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2023-11-02
- Filing Date
- 2024-10-29
- Publication Date
- 2026-09-09
AI Technical Summary
Existing procedures for processing substrates for electrochemical cells using machining devices, such as laser drilling units, often lead to thermal energy accumulation, resulting in inefficiencies and potential damage to the substrate.
The proposed procedure involves dividing the substrate into multiple sub-areas and processing them sequentially, using a processing device equipped with a machining unit like a laser drill. This approach allows for targeted processing of each sub-area, reducing thermal energy accumulation and optimizing the processing area.
This method reduces thermal defaults and enhances cost efficiency by limiting the processing area, while also improving processing and process optimization by allowing for non-adjacent and staggered processing of sub-areas.
Smart Images
Figure EP2024080514_08052025_PF_FP_ABST
Abstract
Description
[0001] Description
[0002] Method for processing a substrate for an electrochemical cell by means of a processing device
[0003] State of the art
[0004] A method for processing a substrate for an electrochemical cell by means of a processing device which comprises a processing unit, in particular a laser drilling unit, wherein in at least one processing step at least one recess is made in the substrate for an electrochemical cell by means of the processing unit, wherein in the at least one processing step the substrate is processed by means of the processing unit, has already been proposed.
[0005] Disclosure of the invention
[0006] The invention is based on a method for processing a substrate for an electrochemical cell by means of a processing device which comprises a processing unit, in particular a laser drilling unit, wherein in at least one processing step at least one recess is made in the substrate for an electrochemical cell by means of the processing unit, wherein in the at least one processing step the substrate is processed by means of the processing unit
[0007] It is proposed that in at least one preparation step the substrate is divided into a plurality of partial areas, wherein in the at least one processing step the sequential processing takes place based on the partial areas. In this context, a “processing device” is to be understood in particular as a device which is set up to process a substrate. In particular, the processing device is set up to process a substrate for an electrochemical cell. The processing device is preferably designed in several parts. Preferably, a non-cutting machining method is carried out with the processing device. Furthermore, the processing device preferably has a holder for the substrate for an electrochemical cell. Preferably, direct processing of the substrate is carried out in one processing step.Alternatively, indirect processing of the substrate by the processing device is also conceivable. Particularly preferably, the processing device is configured to perform all necessary steps, for example, a process gas supply and / or a processing step. The fact that an object is configured for a specific function is to be understood in particular as meaning that the object fulfills and / or executes this specific function in at least one application and / or operating state.
[0008] In this context, a “substrate for an electrochemical cell” should preferably be understood to mean a substrate intended for use in a fuel cell. Preferably, the substrate for an electrochemical cell is designed as a sheet metal. Preferably, the substrate is intended for use in an electrolytic cell. Particularly preferably, the substrate for an electrochemical cell is used in a solid oxide fuel cell. Alternatively, the substrate is intended for use in a battery. Preferably, the substrate consists at least partially, in particular completely, of a metallic material. Alternatively, another, non-shrinking material is also conceivable. Furthermore, a substrate made of a pre-sintered ceramic is conceivable. Furthermore, other materials that appear appropriate to a person skilled in the art are also conceivable.In this context, a non-shrinking material is understood to mean materials that do not shrink further during a shrinking process, for example a sintering process, and / or that have already been shrunk beforehand, for example by a sintering process. A "processing unit" in this context is understood to mean, in particular, a unit that is designed to process a substrate. Preferably, the processing unit is provided for producing recesses, in particular through-holes, in the substrate. Preferably, a plurality of through-holes are produced in a substrate for an electrochemical cell by the processing unit. In particular, the substrate for an electrochemical cell absorbs the thermal energy introduced by the processing unit.In particular, by creating a plurality of through-holes, an accumulation of thermal energy builds up in the substrate for an electrochemical cell. The processing unit preferably has, in particular, at least one non-cutting tool for creating recesses. The processing unit is preferably designed in several parts. The processing unit is preferably configured to generate a laser pulse. The processing unit is preferably configured to generate a single laser pulse and / or a plurality of consecutive laser pulses. The processing unit is particularly preferably designed as a laser drill. In particular, the processing unit is configured to process at least one surface of the substrate for an electrochemical cell. Energy is preferably introduced locally by the laser pulse generated by the processing unit.Particularly preferably, the energy is locally so high that the surface of the substrate is at least substantially partially, preferably largely, particularly preferably completely melted and / or evaporated. Alternatively, melting, in particular complete melting, with evaporation, in particular at least substantially partial, is also conceivable. Preferably, by machining the surface of the substrate for an electrochemical cell, at least one recess is produced in the substrate for an electrochemical cell. Particularly preferably, by machining the surface of the substrate for an electrochemical cell, a through-hole is formed in the substrate for an electrochemical cell. Preferably, the through-hole is arranged perpendicular to a main extension plane of the substrate for an electrochemical cell.A “main extension plane” of a structural unit is to be understood in particular as a plane which is parallel to a largest side surface of a smallest imaginary cuboid which just completely encloses the structural unit and in particular runs through the center of the cuboid. Preferably, the processing unit focuses the laser pulse.
[0009] In this context, “sequential processing” should be understood to mean, in particular, the successive processing of a plurality of partial areas of the substrate for an electrochemical cell. Preferably, the processing unit is designed to process a maximum of one partial area of the substrate for an electrochemical cell simultaneously. Preferably, the partial area is limited to an area of less than 50%, preferably less than 40%, and particularly preferably less than 30% of the total area of the substrate for an electrochemical cell. Preferably, the substrate for an electrochemical cell is divided into a plurality of imaginary partial areas by a computing unit. Preferably, targeted processing is limited to a partial area of the substrate for an electrochemical cell, with at least 85%, preferably at least 90%, and particularly preferably 95% of the power of the processing unit being limited to the partial area.Preferably, in one operating step, the processing is shifted from a first partial area to a further partial area. Preferably, in one operating step, the processing of a first partial area is completely completed before the processing is shifted from a first partial area to a further partial area.
[0010] Preferably, in at least one processing step, the substrate for an electrochemical cell is divided into a plurality of partial surfaces. Preferably, in one processing step, the substrate for an electrochemical cell is divided into a plurality of regular surfaces. In this context, a “regular surface” is to be understood as a regular surface according to a mathematical understanding, wherein all sides of the surface are of equal length and / or all interior angles of the surface are of equal size. Alternatively, a plurality of irregular surfaces is also conceivable. In this context, a “partial surface” is to be understood as meaning, in particular, a surface which represents a part of a general surface of the substrate. In particular, all partial surfaces together make up the surface area of the substrate for an electrochemical cell.In this context, a “surface of the substrate” should be understood to mean, in particular, a surface parallel to the main extension plane of the substrate, which is configured for processing. Furthermore, partial surfaces are arranged at least partially superimposed. As a result, the sum of the surface areas of the partial surfaces is greater than the surface area of the substrate for an electrochemical cell. In particular, the substrate for an electrochemical cell is divided into several partial surfaces. Preferably, the substrate for an electrochemical cell is divided into at least three partial surfaces. Preferably, all partial surfaces have the same dimensions. Alternatively, all partial surfaces have different dimensions. Preferably, processing is carried out in one processing step using these partial surfaces. Alternatively, the partial surfaces are, in total, smaller than the surface area of the substrate for an electrochemical cell.
[0011] In this context, a "processing step" is understood to mean, in particular, a method step in which processing is carried out by means of the processing unit. Preferably, thermal energy is introduced into the substrate for an electrochemical cell in the processing step. Particularly preferably, a recess is introduced into the substrate for an electrochemical cell in the at least one processing step. Particularly preferably, a through-hole is introduced into the substrate for an electrochemical cell in the at least one processing step.
[0012] The inventive design of the method for processing a substrate for an electrochemical cell using a processing device allows for advantageous properties with regard to warpage reduction. In particular, the accumulation of thermal energy can be advantageously reduced. In particular, the low accumulation of thermal energy advantageously reduces thermal warpage. In particular, a processing space limited to a partial area can be provided. This allows advantageous properties with regard to cost efficiency to be achieved, particularly due to the limited processing space.
[0013] Furthermore, it is proposed that in the at least one processing step, several partial areas are processed one after the other, wherein after processing of one partial area, a further partial area is processed which is not directly adjacent to the partial area processed immediately beforehand. Preferably, in a processing step, processing by means of the processing unit changes from a first partial area to a second partial area when processing of the first partial area is completed. Preferably, processing of several partial areas takes place according to a system. Preferably, in one processing step, an adjacent partial area of the processed partial area is skipped. Particularly preferably, in a processing step, an adjacent partial area is processed in a next processing step.Preferably, an unmachined partial area is arranged between two machined partial areas, wherein the unmachined partial area is machined in a later course of the machining step. In particular, it is conceivable for the unmachined partial area to be machined as soon as the two adjacent machined partial areas have no thermal input and / or a low thermal input. In particular, it is conceivable for several partial areas to be skipped and, for example, systematic machining of different partial areas with a distance of two or more partial areas to be carried out. This can provide advantageous properties with regard to machining and process optimization. In particular, an accumulation of thermal energy can be advantageously reduced. In particular, advantageous properties with regard to reducing distortion can be achieved.
[0014] It is further proposed that in at least one processing step at least some of the partial areas are formed as strips. In one processing step, processing by means of the processing unit is preferably limited to one strip. In one processing step, the processing unit preferably changes from a first strip to a second strip as soon as processing by means of the processing unit of the first strip is completed. In this context, “strips” should be understood in particular to mean partial areas which are formed as elongated partial areas, in particular as rectangles arranged vertically in a row in a main direction of extent. The partial areas are preferably arranged on a side that is at least substantially parallel to a main direction of extent, in contact with another partial area. In particular, the partial area is formed, for example, as a strip.The "main extension direction" of an object is understood to mean, in particular, a direction that runs parallel to the longest edge of the smallest geometric cuboid that just completely encloses the object. Alternatively, an arrangement of the rectangles spaced vertically in the main extension direction is also conceivable. Advantageously, all rectangles are congruent. Alternatively, different widths of the individual rectangles are also conceivable. This can, in particular, provide an advantageous division of the substrate for an electrochemical cell into partial areas. Advantageous properties with regard to processing and process optimization can be provided.
[0015] According to a further exemplary embodiment, it is proposed that in at least one processing step at least some of the partial surfaces are designed as quadrants. Preferably, in one processing step, processing by means of the processing unit is limited to one quadrant. Preferably, in one processing step, the processing unit changes from a first quadrant to a second quadrant as soon as processing of the first quadrant by means of the processing unit is completed. Preferably, the partial surface designed as a quadrant is arranged so as to contact at least two and / or more sides of a further partial surface. Alternatively, a partial surface is arranged at a distance from a further partial surface on at least one side. Preferably, the partial surfaces designed as quadrants are polygonal. Particularly preferably, the partial surfaces designed as quadrants are rectangular.Alternatively, other quadrant shapes that a specialist may deem appropriate are also conceivable. It is advantageous for all quadrants to be congruent. Alternatively, different sizes and / or shapes of the individual quadrants are also conceivable.
[0016] This makes it possible, in particular, to advantageously divide the substrate for an electrochemical cell into sub-areas. This can provide advantageous processing properties and process optimization.
[0017] According to a further exemplary embodiment, it is proposed that in at least one processing step the at least one partial area, in particular a partial area designed as a quadrant, is divided into sub-areas, in particular into strips, as a result of which sequential processing based on the sub-areas takes place in at least one processing step within the partial area. Preferably, in one processing step, processing by means of the processing unit is limited to one quadrant. Preferably, in one processing step, the processing unit changes from a first quadrant to a second quadrant as soon as processing of the first quadrant by means of the processing unit is completed. Preferably, the partial area designed as a quadrant is arranged so as to contact at least two and / or more sides of a further partial area.Alternatively, a partial area is arranged at a distance from another partial area on at least one side. Preferably, the partial areas designed as quadrants are polygonal. Particularly preferably, the partial areas designed as quadrants are rectangular. Alternatively, other shapes of the quadrants that appear appropriate to a person skilled in the art are also conceivable. Advantageously, all quadrants are congruent. Alternatively, different sizes and / or shapes of the individual quadrants are also conceivable. Preferably, the individual quadrants are divided into sub-areas. Preferably, the sub-areas are designed as strips. In this context, “strips” should be understood to mean, in particular, sub-areas that are designed as elongated sub-areas, in particular as rectangles arranged in a row and perpendicular to a main direction of extent.Preferably, the sub-surfaces are arranged on a side that is at least substantially parallel to a main direction of extension, in contact with another sub-surface. Alternatively, an arrangement of the rectangles that is vertically spaced apart in the main direction of extension is also conceivable. Advantageously, all rectangles are congruent. Alternatively, different widths of the individual rectangles are also conceivable. Preferably, individual quadrants are processed one after the other. Preferably, individual strips of a quadrant are processed subsequently. Preferably, in a processing step, processing by means of the processing unit is limited to one strip of a quadrant. Preferably, in a processing step, the processing unit changes from a first strip to a second strip of a quadrant as soon as processing of the first strip by means of the processing unit is completed.Preferably, in a processing step, the processing unit is switched from a first quadrant to a second quadrant as soon as the processing of all strips of the first quadrant by the processing unit is completed. This can, in particular, provide an advantageous division of the substrate for an electrochemical cell into partial areas. Advantageous processing properties and process optimization can be provided.
[0018] According to a further exemplary embodiment, it is proposed that in at least one processing step, the processing direction of the processing unit within the partial area is carried out in successive strips opposite to the main extension direction of the strips. Preferably, processing of the partial area takes place at least substantially parallel to a main extension direction of the partial area. Preferably, in one processing step, the processing direction of different partial areas is carried out divergently. Preferably, in one processing step, the processing direction of the processing unit within the partial area is carried out in opposite directions in successive strips. In particular, it is conceivable that in one processing step, the processing direction of the processing unit within the partial area is carried out at least substantially oppositely in adjacent partial areas.In this context, “at least substantially” should be understood to mean, in particular, that a deviation from a predetermined direction deviates from the predetermined value by, in particular, less than 20°, preferably less than 10°, and particularly preferably less than 5°. In particular, it is conceivable for the machining direction of a machining unit to be carried out identically in two successive partial areas in one machining step, with a partial area being skipped between the partial areas and, in a later machining step, this partial area being machined with a divergent machining direction compared to the first two partial areas. The subsequent machining is preferably carried out in an opposite machining direction. This makes it possible to provide advantageous machining properties as well as process optimization.In particular, the accumulation of thermal energy can be advantageously reduced. Particularly advantageous properties with regard to warpage reduction can be achieved. According to a further exemplary embodiment, it is proposed that, in at least one processing step, the processing direction of the processing unit is carried out divergently within the partial area in successive quadrants. Preferably, in at least one processing step, the processing direction of the processing unit is carried out systematically within the partial area in successive quadrants.Preferably, in one processing step, the processing direction of the processing unit within the partial area is carried out at least substantially divergently in adjacent partial areas. In particular, it is conceivable that in one processing step, the processing direction of the processing unit within adjacent partial areas is carried out at least substantially oppositely. Preferably, in at least one processing step, the processing direction of the processing unit within the partial area is carried out at least substantially identically in every second processed quadrant. Preferably, in at least one processing step, the processing direction of the processing unit within the partial area is carried out at least substantially identically in every quadrant adjacent to a corner.Alternatively, it is conceivable that in at least one processing step, the processing direction of the processing unit is carried out divergently in each quadrant. This can provide advantageous processing properties and process optimization. In particular, the accumulation of thermal energy can be advantageously reduced. In particular, advantageous distortion-reducing properties can be achieved.
[0019] It is further proposed that in at least one processing step, the processing direction of the sequential processing in successive quadrants is rotated by 90°. Preferably, in at least one processing step, the processing direction of the sequential processing in successive quadrants is rotated at least substantially perpendicular to a processing direction of the first quadrant. In particular, in at least one processing step, the processing direction of the sequential processing in adjacent quadrants is rotated by 90°. In this context, “at least substantially” should be understood to mean, in particular, that a deviation from a predetermined direction deviates from the predetermined value by, in particular, less than 10°, preferably less than 5°, and particularly preferably less than 3°.In this context, "adjacent" is to be understood as an arrangement in which a first quadrant is arranged in contact with another quadrant. It is also conceivable for the quadrants to be spaced apart from one another. Preferably, in at least one processing step, the processing direction of the sequential processing is carried out identically for every second processing step. Furthermore, it is conceivable for at least one processing step, the processing direction of the sequential processing in successive quadrants is always rotated by 90°. Preferably, in at least one processing step, several sub-surfaces within a quadrant are processed. Particularly preferably, the sub-surfaces are formed as strips.Preferably, in at least one processing step, the processing direction of the processing unit within the partial surface is carried out in successive strips opposite to the main extension direction of the strips. This can provide advantageous processing properties and process optimization. In particular, the accumulation of thermal energy can be advantageously reduced. In particular, advantageous properties with regard to warpage reduction can be achieved.
[0020] Furthermore, it is proposed that, in at least one processing step, particles are extracted at least substantially in the partial area processed by the processing unit by means of a suction element of the processing device. The suction element is preferably configured to specifically clean a partial area. Targeted extraction is preferably limited to a partial area of the substrate for an electrochemical cell, with at least 85%, preferably at least 90%, and particularly preferably 95% of the power of the suction element being limited to the partial area. Particularly preferably, extraction by means of the suction element takes place in a vicinity of the through-hole created by the processing unit.In particular, it is conceivable for suction within the partial area to be limited to a sub-area, wherein the suction element is moved with the processing unit from one through-hole to a further through-hole within a partial area. Preferably, in one operating step, the suction by means of the suction element is shifted from a first to a further partial area. Preferably, the suction element is designed to clean several successive partial areas. Preferably, suction by means of the suction element takes place simultaneously with processing of the partial area in a processing step. Alternatively, it is conceivable for suction by means of the suction element to be carried out subsequently after a processing step and / or with a time delay.This makes it possible to achieve, in particular, advantageous properties with regard to the removal of particles and / or melt splashes generated during processing by the processing unit. Advantageous properties with regard to the cleanliness of the component surface, the optical components, and the machine interior can be achieved. Advantageous properties with regard to cost reduction can be achieved.
[0021] The invention further proposes a processing device for performing sequential processing, comprising at least one suction element configured to extract particles, wherein the suction element is configured to extract only a partial surface. In this context, a "suction element" is understood to mean, in particular, an element configured to clean a surface of the substrate for an electrochemical cell of particles and / or melt and / or other contaminants. The suction element is preferably formed in several parts. The suction element is preferably movably mounted.The term "movably mounted" is intended here in particular to define a mounting of an element, wherein the element, in particular decoupled from an elastic deformation of the element, has the possibility of movement along at least a distance greater than the substrate of an electrochemical cell in the main direction of extent and greater than the substrate of an electrochemical cell perpendicular to the main direction of extent. A "main direction of extent" of an object is to be understood in particular as a direction that runs parallel to a longest edge of a smallest geometric cuboid that just completely encloses the object. Preferably, the suction element is freely movable and spaced from a surface of the substrate for an electrochemical cell. In particular, it is conceivable for the suction element to be designed to be movable simultaneously with a processing unit.It is further conceivable for the suction element to be formed on the processing unit and / or coupled to the processing unit. Preferably, in a processing step, the suction element moves simultaneously with a processing unit. Preferably, the particles and / or the melt and / or the thermal energy are completely extracted by the suction element. Particularly preferably, extraction by means of the suction element takes place in a processing area on the side facing the processing unit. Preferably, the suction element is arranged in a processing area on the side facing the processing unit. Preferably, components of the suction element are arranged outside the processing area. Preferably, the suction element is arranged at a distance from a surface of the substrate for an electrochemical cell.This makes it possible to achieve, in particular, advantageous properties with regard to the removal of particles and / or melt splashes generated during processing by the processing unit. Advantageous properties with regard to the cleanliness of the component surface, the optical components, and the machine interior can be achieved. Advantageous properties with regard to cost reduction can be achieved.
[0022] Furthermore, a solid fuel cell with a substrate for an electrochemical cell, produced by means of a method according to the invention and / or a device according to the invention, is proposed. The solid fuel cell preferably has an anode and a cathode. In particular, an electrolyte is arranged between the anode and the cathode. The substrate for an electrochemical cell is preferably designed to provide a base for the electrolyte. The solid fuel cell is preferably designed to convert chemical reaction energy of a continuously supplied fuel and an oxidizing agent into electrical energy. For example, hydrogen is used as the fuel and oxygen as the oxidizing agent. Alternatively, other fuels deemed appropriate by a person skilled in the art, such as methanol, butane, and / or natural gas, are also conceivable.Preferably, in one process step in the solid-state fuel cell, electrical energy is generated between the anode and the cathode. Preferably, the anode splits off the electrons from the fuel. Preferably, the electrons are conducted to the cathode via a connecting element. In particular, the electrical energy is generated by this movement of electrons from anode to cathode. Preferably, the electrons are transferred to the oxidant in the cathode and split off the oxidant. The negatively charged oxidant is attracted to the positively charged protons of the fuel, particularly by the substrate for an electrochemical cell. Preferably, the end products of the chemical reaction are, in particular, water and exhaust air. This makes it possible to provide, in particular, an advantageous solid-state fuel cell.
[0023] The processing device according to the invention is not intended to be limited to the application and embodiment described above. In particular, the processing device according to the invention may have a number of individual elements, components, units, and method steps that differs from the number stated herein to fulfill a function described herein. Furthermore, in the value ranges specified in this disclosure, values within the stated limits are also to be considered disclosed and can be used arbitrarily.
[0024] drawing
[0025] Further advantages will become apparent from the following description of the drawings. The drawings illustrate five exemplary embodiments of the invention. The drawings, the description, and the claims contain numerous features in combination. Those skilled in the art will also expediently consider the features individually and combine them into useful further combinations.
[0026] They show:
[0027] Fig. 1 shows a solid fuel cell with a substrate for an electrochemical cell, produced by a method according to the invention and / or a device according to the invention, in a schematic representation, Fig. 2 shows a processing device in a schematic representation
[0028] Fig. 3 is a schematic flow diagram of a method for operating a processing device according to the invention,
[0029] Fig. 4 shows an alternative embodiment of the division of the substrate for an electrochemical cell into partial areas,
[0030] Fig. 5 shows an alternative embodiment of the division of the substrate for an electrochemical cell into partial areas,
[0031] Fig. 6 shows an alternative embodiment of the division of the substrate for an electrochemical cell into partial areas and
[0032] Fig. 7 shows an alternative embodiment of the division of the substrate for an electrochemical cell into partial areas.
[0033] Description of the embodiments
[0034] Fig. 1 shows a solid fuel cell 26a with a substrate for an electrochemical cell 16a, produced by means of a method according to the invention and / or a processing device 10a according to the invention. The solid fuel cell 26a has an anode 28a and a cathode 30a. An electrolyte 56a is arranged between the anode 28a and the cathode 30a. Preferably, the substrate for an electrochemical cell 16a is configured to provide a base for the electrolyte 56a. The substrate for an electrochemical cell 16a is arranged between the anode 28a and the cathode 30a. The solid fuel cell 26a is configured to convert chemical reaction energy of a continuously supplied fuel 32a and an oxidant 34a into electrical energy. Hydrogen is used as the fuel 32a and oxygen as the oxidant 34a.Alternatively, other fuels 32a that would be considered appropriate by a person skilled in the art, such as methanol, butane, and / or natural gas, are also conceivable. In one process step of the solid fuel cell 26a, electrical energy is generated between the anode 28a and the cathode 30a. The anode 28a splits off an electron 36a from the fuel 32a. The electrons 36a are conducted to the cathode 30a via a connecting element 38a. This movement of the electrons 36a from the anode 28a to the cathode 30a generates the electrical energy. The electrons 36a in the cathode 30a are transferred to the oxidant 34a and split the oxidant 34a. The negatively charged oxidant 34a is attracted to the positively charged protons 40a of the fuel 32a through the substrate for an electrochemical cell 16a. The end products of the chemical reaction are, for example, water 42a and exhaust air 44a.
[0035] Fig. 2 shows a processing device 10a for carrying out a method according to the invention. The processing device 10a is configured to process a substrate for an electrochemical cell 16a. The processing device 10a is formed in several parts. A non-cutting machining process is carried out with the processing device 10a. Furthermore, the processing device 10a has a holder for the substrate for an electrochemical cell 16a. In a processing step 46a, the substrate 16a is processed directly. Alternatively, indirect processing of the substrate 16a by the processing device 10a is also conceivable. The processing device 10a is configured to carry out all necessary steps, for example, a preparation step 48a and / or a processing step 46a.
[0036] The processing device 10a has a processing unit 12a, which transfers thermal energy into the substrate for an electrochemical cell 16a during processing. The processing unit 12a has a non-cutting tool. The processing unit 12a is designed in several parts. The processing unit 12a is configured to generate a laser pulse 20a. The processing unit 12a is configured to generate a single laser pulse 20a and / or multiple consecutive laser pulses 20a. The processing unit 12a is designed as a laser drill. The processing unit 12a is configured to process at least one surface 54a of the substrate for an electrochemical cell 16a. The processing unit 12a is configured to create a through-hole 14a in a substrate for an electrochemical cell 16a.The laser pulse 20a generated by the processing unit 12a locally introduces energy into the substrate for an electrochemical cell 16a. The processing unit 12a forms a through-hole 14a in the surface 54 of the substrate for an electrochemical cell 16a. The through-hole 14a is arranged perpendicular to a main extension plane of the substrate for an electrochemical cell 16a. The processing unit 12a focuses the laser pulse 20a.
[0037] The substrate for an electrochemical cell 16a is used for an electrochemical cell in the solid oxide fuel cell 26a. Alternatively, the substrate 16a is intended for use in an electrolytic cell. Furthermore, the substrate 16a is intended for use in a battery. The substrate 16a forms the electrolyte of a solid fuel cell 26a for an electrochemical cell. The substrate for an electrochemical cell 16a is designed to conduct oxygen ions. The substrate for an electrochemical cell 16a has an insulating effect against electrons 36a. The substrate 16a is formed from a metallic material. Alternatively, another, non-shrinking material is also conceivable. Furthermore, a substrate 16a made of a pre-sintered ceramic is conceivable.
[0038] The processing device 10a is designed to carry out sequential processing. The processing device has a suction element 50a, which is designed to suction particles. The suction element 50a is designed to suction only a partial surface 18a. The spacer element 50a is designed in several parts. The suction element 50a is movably mounted. The suction element 50a is arranged so as to be freely movable and spaced from the surface 54a of the substrate for an electrochemical cell 16a. In particular, it is conceivable that the suction element 40a is designed to be movable simultaneously with the processing unit 12a. Furthermore, it is conceivable that the suction element 50a is designed on the processing unit 12a and / or coupled to the processing unit 12a. In a processing step 46a, the suction element 50a is moved simultaneously with a processing unit 12a.Complete extraction of the particles and / or the melt and / or the thermal energy is achieved by the extraction element 50a. Extraction is achieved by means of the extraction element 50a in a processing area 52a on the side facing the processing unit 12a. The extraction element 50a is arranged in the processing area 52a on the side facing the processing unit 12a. Components of the extraction element 50a are arranged outside the processing area 52a. The extraction element 50a is arranged at a distance from the surface 54a of the substrate for an electrochemical cell 16a.
[0039] Fig.3 shows a method for processing a substrate for an electrochemical cell 16a by means of a processing device 10a, which comprises a processing unit 12a, in particular a laser drilling unit. In at least one processing step 46a, at least one recess, in particular a through-recess 14a, is introduced into the substrate for an electrochemical cell 16a by means of the processing unit 12a. In the at least one processing step 46a, a substrate 16a is processed by means of the processing unit 12a. In at least one preparation step 48a, the substrate 16a is divided into a plurality of partial surfaces 18a, wherein in the at least one processing step 46a the sequential processing takes place based on the partial surfaces 18a. The processing unit 12a is designed in a processing step 46a to process a maximum of one partial surface 18a of the substrate for an electrochemical cell 16a simultaneously. In at leastIn a processing step 46a, the substrate for an electrochemical cell 16a is divided into a plurality of partial surfaces 18a. In a processing step 46a, the substrate for an electrochemical cell 16a is divided into a plurality of regular surfaces. Alternatively, a plurality of irregular surfaces is also conceivable. All partial surfaces 18a together make up the area of the substrate for an electrochemical cell 16a. Furthermore, partial surfaces 16a are arranged at least partially superimposed. As a result, the sum of the area of the partial surfaces 18a is larger than the area of the substrate for an electrochemical cell 16a. The substrate for an electrochemical cell 16a is divided into several partial surfaces 18a. The substrate for an electrochemical cell 16a is divided into at least three partial surfaces 18a. All partial surfaces 18a have the same dimensions. Alternatively, all partial surfaces 18a have different dimensions. The processing in a processing step 46ais carried out using these partial areas 18a. Alternatively, the partial areas 18a are smaller in total than the area of the substrate for an electrochemical cell 16a. In the processing step 46a, thermal energy is introduced into the substrate for an electrochemical cell 16a. In the at least one processing step 46a, a recess is introduced into the substrate for an electrochemical cell 16a. In the at least one processing step 46a, a through-hole 14a is introduced into the substrate for an electrochemical cell 16a.
[0040] In the at least one processing step 46a, a plurality of partial surfaces 18a are processed one after the other, wherein after processing a partial surface 18a, a further partial surface 18a is processed which is not directly adjacent to the previously processed partial surface 18a. In a processing step 46a, processing by means of the processing unit 12a changes from a first partial surface 18a to a second partial surface 18a when processing of the first partial surface 18a is completed. Processing of a plurality of partial surfaces 18a occurs according to a system. In a processing step 46a, an adjacent partial surface 18a of the processed partial surface 18a is skipped. In a processing step 46a, an adjacent partial surface 18a is processed in a next processing step 46a.An unmachined partial surface 18a is arranged between two machined partial surfaces 18a, wherein the unmachined partial surface 18a is machined in a later stage of the machining step 46a. In particular, it is conceivable for the unmachined partial surface 18a to be machined as soon as the two adjacent machined partial surfaces 18a have no thermal input and / or a low thermal input. In particular, it is also conceivable for several partial surfaces 18a to be skipped and, for example, for systematic machining of different partial surfaces 18a to be carried out at a distance of two or more partial surfaces 18.
[0041] In at least one processing step 46a, at least some of the partial surfaces 18a are formed as strips. In one processing step 46a, processing by means of the processing unit 12a is limited to one strip. In one processing step 46a, the processing unit 12a changes from a first strip to a second strip as soon as the processing of the first strip by means of the processing unit 12a is completed. The strip is formed as a rectangle. The partial surfaces 18a are arranged, at least substantially on their side parallel to a main extension direction, in contact with another partial surface 18a. Alternatively, an arrangement of the rectangles spaced vertically in the main extension direction is also conceivable. All rectangles are congruent. Alternatively, different widths of the individual rectangles are also conceivable.
[0042] In at least one processing step 46a, particles are sucked off by means of a suction element 50a of the processing device 10a, at least substantially in the partial surface 18a processed by the processing unit 12a.
[0043] The suction element 50a is configured to specifically clean a partial surface 18a. Targeted suction is limited to a partial surface of the substrate for an electrochemical cell 16a, with at least 85%, preferably at least 90%, and particularly preferably 95% of the power of the suction element 50a being limited to the partial surface. Suction by means of the suction element 50a takes place in a close region of the through-hole 14a created by the processing unit 12a. In particular, it is conceivable that suction within the partial surface 18a is limited to a sub-surface, with the suction element 50a being moved with the processing unit 12a from one through-hole 14a to another through-hole 14a within a partial surface 18a. In one operating step, the suction is shifted from a first partial area 18a to a further partial area 18a by means of the suction element 50a.The suction element 50a is configured to subsequently clean a plurality of partial surfaces 18a. Suctioning by means of the suction element 50a occurs simultaneously with processing of the partial surface in a processing step 46a. Alternatively, it is conceivable that suctioning by means of the suction element 50a is performed subsequently after a processing step 46a and / or with a time delay.
[0044] Further exemplary embodiments of the invention are shown in Figures 4, 5, 6 and 7. The following descriptions and the drawings are essentially limited to the differences between the exemplary embodiments, whereby with regard to components with the same designation, in particular with regard to components with the same reference symbols, reference can in principle also be made to the drawings and / or the description of the other exemplary embodiments, in particular Figures 1 to 3. To distinguish the exemplary embodiments, the letter a is placed after the reference symbols of the exemplary embodiment in Figures 1 to 3. In the exemplary embodiments in Figures 4 to 7, the letter a is replaced by the letters b to e.
[0045] Fig. 4 shows an alternative embodiment of the division of the substrate for an electrochemical cell 16b into partial areas. In at least one processing step 46b, at least some of the partial areas 18b are formed as quadrants. In a processing step 46b, processing by means of the processing unit 12b is limited to one quadrant. In a processing step 46b, the processing unit 12b changes from a first quadrant to a second quadrant as soon as the processing of the first quadrant by means of the processing unit 12b is completed. The partial area 18b formed as a quadrant is arranged in contact with at least two and / or more sides of a further partial area 18b. Alternatively, a partial area 18b is arranged at a distance from a further partial area 18b on at least one side. The partial areas 18b formed as quadrants are polygonal.The partial surfaces 18b formed as quadrants are rectangular. Alternatively, other quadrant shapes deemed appropriate by a person skilled in the art are also conceivable. All quadrants are congruent. Alternatively, different sizes and / or shapes of the individual quadrants are also conceivable.
[0046] Fig. 5 shows an alternative embodiment of the division of the substrate for an electrochemical cell 16c into partial areas. In at least one processing step 46c, the at least one partial area 18c, in particular a partial area 18c formed as a quadrant, is divided into sub-areas 22c, in particular into strips, whereby in at least one processing step 46c, sequential processing takes place within the partial area 18c based on the sub-areas 22c. In a processing step 46c, processing by means of the processing unit 12c is limited to one quadrant. In a processing step 46c, the processing unit 1c changes from a first quadrant to a second quadrant as soon as the processing of the first quadrant by means of the processing unit 12c is completed. The partial area 18c formed as a quadrant is arranged in contact with at least two and / or more sides of a further partial area 18c.Alternatively, a partial surface 18c is arranged on at least one side at a distance from another partial surface 18c. The partial surfaces 18c designed as quadrants are polygonal. The partial surfaces 18c designed as quadrants are rectangular. Alternatively, other shapes of the quadrants that appear appropriate to a person skilled in the art are also conceivable. All quadrants are congruent. Alternatively, different sizes and / or shapes of the individual quadrants are also conceivable. Preferably, the individual quadrants are divided into sub-surfaces 22c. The sub-surfaces 22c are designed as strips. The strips are designed as rectangles. The sub-surfaces 22c are arranged on a side that is at least substantially parallel to a main extension direction, in contact with another sub-surface 22c. Alternatively, an arrangement of the rectangles spaced vertically in the main extension direction is also conceivable.All rectangles are congruent. Alternatively, different widths of the individual rectangles are also conceivable. Subsequent processing of individual quadrants takes place. Subsequent processing of individual strips of a quadrant takes place. In a processing step 46c, processing by means of the processing unit 12c is limited to one strip of a quadrant. In a processing step 46c, the processing unit 12c changes from a first strip to a second strip of a quadrant as soon as the processing of the first strip by means of the processing unit 12c is completed. In a processing step 46c, the processing unit 12c changes from a first quadrant to a second quadrant as soon as the processing of all strips of the first quadrant by means of the processing unit 12a is completed.
[0047] Fig. 6 shows an alternative embodiment of the division of the substrate for an electrochemical cell 16d into partial areas. In at least one processing step 46d, the processing direction 24d of the processing unit 12d is carried out within the partial area 18d in successive strips opposite to the main extension direction of the strips. Processing of the partial area 18d is carried out at least substantially parallel to a main extension direction of the partial area 18d. In a processing step 46d, the processing direction 24d of different partial areas 18d is carried out divergently. In a processing step 46d, the processing direction 24d of the processing unit 12d is carried out oppositely within the partial area 18d in successive strips.In particular, it is conceivable that in a processing step 46d, the processing direction 24d of the processing unit 12d is carried out at least substantially oppositely within adjacent partial areas 18d. In particular, it is conceivable that the processing direction 24d of a processing unit 12d is carried out identically in two consecutive partial areas 18d in a processing step 46d, wherein a partial area 18d is skipped between the partial areas 18d and, in a later processing step 46d, this partial area 18d is processed with a divergent processing direction 24d compared to the first two partial areas 18d. The subsequent processing is carried out in an opposite processing direction 24d.
[0048] Fig. 7 shows an alternative embodiment of the division of the substrate for an electrochemical cell 16e into partial areas 18e. In at least one processing step 46e, the processing direction 24e of the processing unit 12e is carried out divergently within the partial area 18e in successive quadrants. In at least one processing step 46e, the processing direction 24e of the processing unit 12e is carried out systematically within the partial area 18e in successive quadrants. In one processing step 46e, the processing direction 24e of the processing unit 12e is carried out at least substantially divergently within the partial area 18e in adjacent partial areas 18e. In particular, it is conceivable that in one processing step 46e, the processing direction 24e of the processing unit 12e is carried out at least substantially oppositely within adjacent partial areas 18e.In at least one processing step 46e, the processing direction 24e of the processing unit 12e within the partial area 18e is carried out at least substantially identically in every second processed quadrant. In at least one processing step 46e, the processing direction 24e of the processing unit 12e within the partial area 18e is carried out at least substantially identically in each quadrant adjacent to a corner. Alternatively, it is conceivable that in at least one processing step 46e, the processing direction 24e of the processing unit 12e is carried out divergently in each quadrant.
[0049] In at least one processing step 46e, the direction of the sequential processing is rotated by 90° in successive quadrants. In at least one processing step 46e, the processing direction 24e of the sequential processing is rotated at least substantially perpendicular to a processing direction 24e of the first quadrant in successive quadrants. In at least one processing step 46e, the processing direction of the sequential processing is rotated by 90° in adjacent quadrants. It is also conceivable for the quadrants to be spaced apart from one another. In at least one processing step 46e, the processing direction 24e of the sequential processing is carried out identically in every second processing step.Furthermore, it is conceivable that in at least one processing step 46e, the processing direction 24e of the sequential processing is always rotated by 90° in successive quadrants. In at least one processing step 46e, several sub-surfaces 22e are machined within a quadrant. The sub-surfaces 22e are formed in strips. In at least one processing step 46e, the processing direction 24e of the processing unit 12e is carried out within the sub-surface 18e in successive strips opposite to the main extension direction of the strips.
Claims
Claims 1 . Method for processing a substrate for an electrochemical cell (16a) by means of a processing device (10a) which comprises a processing unit (12a), in particular a laser drilling unit, wherein in at least one processing step (46a) at least one recess, in particular a through-recess (14a), is introduced into the substrate for an electrochemical cell (16a) by means of the processing unit (12a), wherein in the at least one processing step (46a) processing of the substrate (16a) takes place by means of the processing unit (12a), characterized in that in at least one preparation step (48a) the substrate (16a) is divided into a plurality of partial surfaces (18a), wherein in the at least one processing step (46a) sequential processing takes place based on the partial surfaces (18a).
2. Method according to claim 1, characterized in that in the at least one processing step (46a) several partial surfaces (18a) are processed one after the other, wherein after processing of a partial surface (18a) a further partial surface (18a) is processed which does not directly border on the partial surface (18a) processed directly before 3. Method according to claim 1 or 2, characterized in that in the at least one processing step (46a) at least a part of the partial surfaces (18a) is formed as a strip.
4. Method according to claim 1, characterized in that in at least one processing step (46b) at least a part of the partial surfaces (18b) is formed as quadrants.
5. Method according to one of the preceding claims, characterized in that in at least one processing step (46c) the at least one partial area (18c), in particular a partial area (18c) designed as a quadrant, is divided into sub-areas (22c), in particular into strips, whereby in the at least one processing step (46c) within the partial area (18c) a sequential processing based on the sub-areas (22c) takes place.
6. Method according to claim 3 or 5, characterized in that in at least one processing step (46d) a processing direction (24d) of the processing unit (12d) within the partial area (18d) is carried out in successive strips opposite to the main extension direction of the strips.
7. Method according to claim 4, 5 or 6, characterized in that in at least one processing step (46e) the processing direction (24e) of the processing unit (12e) is carried out divergently within the partial area (18e) in successive quadrants.
8. The method according to claim 7, characterized in that in the at least one processing step (46e) the direction of the sequential processing in successive quadrants is rotated by 90°.
9. Method according to one of the preceding claims, characterized in that in at least one processing step (46a) by means of a suction element (50a) of the processing device (10a) particles are sucked off at least substantially in the partial area (18a) processed by the processing unit (12a).
10. Processing device (10a) for carrying out a method according to one of the preceding claims, with at least one suction element (50a) which is designed to suck out particles, wherein the suction element (50a) is designed to suck out only a partial surface (18a).
11. A solid fuel cell (26a) comprising a substrate for an electrochemical cell (16a) produced by a method according to any one of claims 1 to 9 and a processing device according to claim 10.