In-feed assemblies and methods for chemical vapor processing reactors

Abstract

In-feed part (101) for a chemical vapor processing reactor, chemical vapor processor having such an in-feed part (101) and methods of operating the same. The in-feed part (101) defining an expansion space (105) which is configured to lead reactants as a top to bottom flow from a plasma source through a reaction chamber (150), the in-feed part (101) having: a body (110) comprising an opening (121) at a bottom end configured to be placed proximate a reaction bowl of the reaction chamber (150), the side of the body (110) comprising at least one gas inlet (131) for receiving at least one of a: a carrier gas and a precursor; a mixing channel (135) arranged within or adjacent to the body (110) such that the at least one gas inlet (131) is in fluid connection with the mixing channel (135), the side of the mixing channel (135) comprising a nozzle (133) fluidly connecting the mixing channel (135) with the expansion space (105).