An apparatus

Abstract

The invention relates to an apparatus for processing a surface of a substrate (2), the apparatus comprises a transfer robot (15) and at least one reaction chamber (20, 30, 40), the transfer robot (15) comprises a robot arm (3) and an end effector (1) connected to the robot arm (3), the transfer robot (15) is arranged to load the substrate (2) into and out of the at least one reaction chamber (20, 30, 40). The end effector (1) having an support surface (1a) arranged to support the substrate (2) during loading into and out of the reaction chamber (20, 30, 40), and a heat transfer element (4) arranged to heat the substrate (2) through the support surface (1a) of the end effector (1) during the loading.