Makeup composition comprising a polyphenol, a polyoxyalkylenated or polyglycerolated compound, phytic acid and / or acetic acid, and method using it
A stable cosmetic composition using polyphenols, hydrogen-bonding compounds, and C2-C8 alcohols with phytic or acetic acid addresses instability issues, ensuring long-lasting benefits without skin irritation.
Patent Information
- Application Number
- FR2022005847
- Authority / Receiving Office
- FR · FR
- Patent Type
- Patents
- Current Assignee / Owner
- Filing Date
- 2022-06-15
- Publication Date
- 2025-10-10
- Estimated Expiration
- 2042-06-15
AI Technical Summary
Cosmetic compositions containing polyphenols are unstable over time, particularly when combined with short alcohols, leading to the formation of sensitizing compounds like gallic acid and its esters, which can cause skin irritation.
A makeup and/or skin care composition comprising polyphenols, compounds capable of forming hydrogen bonds with polyphenols, C2-C8 alcohols, and phytic or acetic acid, which stabilizes the polyphenols and prevents the formation of sensitizing compounds by maintaining their interaction in a latent state until applied.
The composition ensures stability over time, provides a homogeneous deposit, and maintains pleasant sensory properties without causing skin irritation, while ensuring the polyphenols' beneficial effects.