Transistor MOSFET
Patent Information
- Application Number
- FR2024000490
- Authority / Receiving Office
- FR · FR
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2024-01-18
- Publication Date
- 2025-07-25
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Abstract
Claims
direction (X), for example the grid region is centered relative to the first channel region.
11. Transistor (200) according to any one of claims 1 to 3, 8 to 10, wherein a non-zero distance (Ov) separates a side wall (132A) of the gate region (132) and the second portion (231B) of gate insulator, for example the distance (Ov) is between 70 and 100 nm, or between 80 and 90 nm.
12. A transistor (200) according to claim 11 as dependent on claim 3, wherein the distance (Ov) is greater than an overlap length (Xj) of the lightly doped drain region (125) under the gate region (132).
13. A transistor (200) according to any one of claims 1 to 3, 8 to 12, wherein the first epitaxial channel region (234A) is made of silicon or a silicon-germanium alloy.
14. A transistor (200) according to any one of claims 1 to 3, 8 to 13, wherein the gate insulator (231) is made of a silicon oxide, for example silicon dioxide, and / or the semiconductor layer (120) is made of silicon.
15. Electronic device comprising at least one transistor according to any one of claims 1 to 3, 8 to 14.
16. Radio frequency switch comprising at least one transistor according to any one of claims 1 to 3, 8 to 14. FIG. 1 [Fig. 2A] FIG. 2A [Fig. 2B] 120 FIG. 2B [Fig. 3A] Z FIG. 3A [Fig. 3B] 304 Z FIG. 3B [Fig. 3C] 224A 231A' 224B Z FIG. 3C [Fig. 3D] 231B 224A FIG. 3D [Fig. 3E] FIG. 3E
Citation Information
Patent Citations
MOS field effect transistor and its manufacturing method
US5923985A