COMPOSITIONS AND PROCESSES FOR CLEANING KERATINOUS MATERIALS

Abstract

COMPOSITIONS AND PROCESSES FOR CLEANSING KERATINOUS MATERIALS. The disclosure relates to compositions having (a) a surfactant system comprising (i) at least one first anionic surfactant, (ii) optionally at least one second anionic surfactant different from the first anionic surfactant, and (iii) optionally at least one amphoteric surfactant, (b) at least one scalp-beneficial agent, and (c) water, in which the compositions are free or substantially free of sulfate-based surfactants, and to processes for using the compositions. The compositions are cleansing compositions that can be used in processes for cleaning keratinous materials, such as hair. Figure for the abstract: none