X-ray source and method for generating X-rays and resurfacing a target material
FR3165544A1Pending Publication Date: 2026-02-13ALPHANOV
Patent Information
- Application Number
- FR2024010010
- Authority / Receiving Office
- FR · FR
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-08-12
- Filing Date
- 2024-09-19
- Publication Date
- 2026-02-13
Smart Images
Figure 00000000_0000_ABST
Abstract
The invention relates to an X-ray source (100) by interaction between a focused laser pulse beam (40) and a target material. According to the invention, the X-ray source (100) comprises a resurfacing device (20), a first laser source (30) capable of emitting said laser pulse beam along a first optical axis, the target material (10) being movable along at least one degree of freedom, the surface of the target material being adapted to receive the focused laser pulse beam and to generate X-rays, the focused laser pulse beam locally inducing an ablation crater (45) in an area of the surface of the target material, the resurfacing device being configured to resurface the area of the surface of the target material ablated by the laser pulse beam. Figure for the abstract: Fig. 1
Need to check novelty before this filing date? Find Prior Art
Citation Information
Patent Citations
SOURCE AND METHOD OF X-RAY GENERATION BY LASER INTERACTION WITH A TARGET
FR3088514A1
Laser plasma x-ray generating device
JP2001357998A
Target supply device in EUV light generator
JP2008294393A
Source-collector module with GIC mirror and LPP EUV light source
US20110168925A1
FR1872703S