Device and method for physical deposition by short-range sublimation

Abstract

The invention relates to a short-range physical deposition device by sublimation, comprising: a vacuum chamber (3) including a body (30) and a lid (40) hermetically mounted on the body; at least two deposition stations (1, 2), each comprising: a compartment (10, 20) arranged in the body of the chamber (3) and including a crucible (11, 21) adapted to be filled with a target material (12, 22), and a heating element (13, 23) adapted to heat the crucible (11, 21) to a sublimation temperature of the target material, each compartment (10) being thermally decoupled from another compartment (20); a carousel (4) adapted to support at least one substrate (S1, S2), the carousel being mounted to rotate within the chamber (3) to alternately position said substrate (S1, S2) opposite each crucible (11, 21) to allow deposition of a layer of the respective target material on the substrate,and temperature control means (5) for said at least one substrate to cool each substrate to a temperature below the sublimation temperature of each target material. Figure for the abstract: Fig. 1,