MPCVD APPLIANCE REACTOR

Abstract

REACTOR FOR MPCVD DEVICE The invention relates to a reactor for an MPCVD device, comprising a housing (10) and a stage (30). The housing (10) comprises an inner lower surface (21), an inner upper surface (22), and an inner annular wall surface (23) which together form a reaction cavity (20). The inner upper surface (22) and the inner lower surface (21) are spaced apart and face each other. The inner upper surface (22) projects towards the inner lower surface (21). Two ends of the inner annular wall surface (23) are connected respectively to the inner upper (22) and inner lower (21) surfaces. The stage (30) is disposed in the reaction cavity (20) and has a support surface (31) which is oriented towards the inner upper surface (22). The reactor prevents the generated plasma from being unstable in order to reduce the consequences on the MPCVD reaction.Figure to be published with the abbreviation: Figure 2.

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