Photolithographic methods
GB2703873APending Publication Date: 2026-08-12PRAGMATIC SEMICON LTD
Patent Information
- Authority / Receiving Office
- GB · GB
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2024-12-18
- Publication Date
- 2026-08-12
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Abstract
A photolithographic method of forming a tapered via channel 202 in an integrated circuit, IC, 100 (Figure 1) the tapered via channel extending through an insulator layer 204 sandwiched between a first
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Citation Information
Patent Citations
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