Gas inlet structure and semiconductor process device

Abstract

The invention discloses an air inlet structure and semiconductor process equipment, the air inlet structure comprises a plurality of flow guide parts and an air inlet channel extending along a first direction, and the plurality of flow guide parts are arranged in the air inlet channel at intervals along a second direction and divide the air inlet channel into a plurality of sub-channels distributed at intervals along the second direction; the second direction intersects with the first direction; at least one of the multiple flow guide pieces is detachably arranged in the air inlet channel, and the detachable flow guide pieces are provided with multiple installation positions in the air inlet channel; the detachable flow guide part is detachably mounted on one of the corresponding mounting positions; the plurality of mounting positions comprise a first mounting position and a second mounting position; when the detachable flow guide part is mounted at the first mounting position, the extension direction of the detachable flow guide part is parallel to the first direction; when the detachable flow guide part is installed on the second installation position, the extending direction of the detachable flow guide part intersects with the first direction and is not perpendicular to the first direction.

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