HAIR CONDITIONING COMPOSITION FOR IMPROVED DEPOSITION

Abstract

A conditioning composition producing superior deposition on hair comprising: (i) 0.01 to 10% by weight of a linear cationic conditioning primary surfactant; selected from structure 1 and mixtures: wherein: R1 includes a linear alkyl chain from C16 to C24; R2 includes a proton or a linear alkyl chain from C1 to C4, or a benzyl group; and X is an organic or inorganic anion; (ii) 0.1 to 10% by weight of a linear fatty ingredient; (iii) a particulate beneficial agent selected from the conditioning active agent and mixtures; (iv) 0.01 to 5% by weight of a linear di-alkyl cationic co-surfactant, selected from structure 2 and mixtures wherein: R2 includes a proton or a linear alkyl chain from C1 to C4, or a benzyl group; R3 includes a linear alkyl chain from C3 to but not including C16; R4 includes a linear alkyl chain from C3 to C24; and X is an organic or inorganic anion;wherein the carbon-carbon chain length of R1 in structure 1 differs from that of R3 in structure 2 by at least 3 carbon atoms, such that the carbon-carbon chain length of R1 in structure 1 is longer than that of R3 in structure 2; and wherein the molar ratio of (iv) to (i) is in the range from 1:20 to 1:1.;