HAIR CONDITIONING COMPOSITION FOR DEPOSITION REPAIR

ID202301224AUndetermined Publication Date: 2023-02-08UNILEVER IP HLDG BV
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Patent Information

Application Number
IDP00202212090
Authority / Receiving Office
ID · ID
Patent Type
Applications
Current Assignee / Owner
Priority Date
2020-06-19
Filing Date
2021-06-15
Publication Date
2023-02-08
Patent Text Reader

Abstract

A conditioning composition providing superior deposition of beneficial substances on hair, said composition comprising: 0.01-10% by weight of a linear cationic conditioning primary surfactant; selected from structure 1 and mixtures thereof: structure 1 wherein: R1 includes a linear alkyl chain from C16-C24; R2 includes a proton or a linear alkyl chain from C1-C4, or a benzyl group; and X is an organic or inorganic anion; 0.1-10% by weight of a linear fatty material; a particulate beneficial substance selected from conditioning active substances and mixtures thereof; 0.01-5% by weight, of a linear cationic co-surfactant, selected from structure 2 and mixtures thereof structure 2 wherein: R2 includes a proton or a linear alkyl chain from C1-C4, or a benzyl group; R3 includes a linear alkyl chain from C3 to but not including C16; and X is an organic or inorganic anion;wherein the length of the carbon chain R1 in structure 1 differs from the length of the carbon chain R3 in structure 2 by at least 3 carbon atoms, such that the length of the carbon chain R1 is structure 1 longer than the length of the carbon chain R3 in structure 2; and wherein the molar ratio of (iv) to (i) is in the range from 1:20 to 1:1.;
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