Metrology method and associated metrology device
Patent Information
- Application Number
- IL330713
- Authority / Receiving Office
- IL · IL
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-02-27
- Filing Date
- 2025-01-29
- Publication Date
- 2026-08-01
AI Technical Summary
Existing metrology methods struggle to accurately measure the full electric field, including phase information, in a computationally efficient manner, particularly in lithographic processes, due to the need for coherent illumination and strict alignment requirements.
A metrology apparatus and method using dipole or quadrupole illumination configurations with mutually coherent monopoles, allowing non-iterative reconstruction of the scattered radiation field by blocking or attenuating zeroth-order reflections, enabling phase retrieval without iterative algorithms.
Enables accurate and efficient measurement of structure parameters using partial coherent illumination, expanding the usable wavelength-over-pitch range and reducing computational demands while maintaining measurement accuracy.