Apparatus and method for photochemical vapor deposition
IL60501A0Inactive Publication Date: 1980-09-16HUGHES AIRCRAFT CO
Patent Information
- Authority / Receiving Office
- IL · IL
- Patent Type
- Applications
- Current Assignee / Owner
- HUGHES AIRCRAFT CO
- Filing Date
- 1980-07-04
- Publication Date
- 1980-09-16
- Estimated Expiration
- Not applicable · inactive patent
AI Technical Summary
Technical Problem
Existing photochemical vapor deposition processes face issues with quartz window transparency degradation due to material deposition, leading to reduced radiation transmission and impaired deposition efficiency.
Method used
A photochemical vapor deposition apparatus with a movable transparent film across the quartz window, which prevents unwanted deposits on the window and maintains its transparency by continuously removing deposited material, allowing for enhanced radiation transmission and increased deposition rate.
Benefits of technology
The apparatus maintains window transparency, significantly increasing the deposition rate and efficiency by ensuring consistent radiation transmission, resulting in high-quality, uniform material deposition on substrates.
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