Polishing pad

JP1771741SActive Publication Date: 2025-06-05FUJIBO HLDG
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Patent Information

Application Number
JP2023027339D
Authority / Receiving Office
JP · JP
Patent Type
Designs
Current Assignee / Owner
Filing Date
2023-12-28
Publication Date
2025-06-05
Estimated Expiration
2048-12-28

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Abstract

This article is a polishing pad formed by laminating a polishing layer and a cushion layer. The subject of the partial design is a configuration in which a plate-shaped window portion made of a transparent material is fitted into a recess formed in the polishing layer, and light such as laser light is transmitted through the window portion for use.
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