Wafer inspection images

JP1796065SActive Publication Date: 2026-04-21HAMAMATSU PHOTONICS KK
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Designs
Current Assignee / Owner
HAMAMATSU PHOTONICS KK
Filing Date
2024-07-11
Publication Date
2026-04-21

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Abstract

The image relating to this design application is used to read and inspect a wafer to be analyzed, and is an image for setting the analysis range of the wafer. In this image, as shown in "Image Diagram," an analysis range display area is shown on the wafer display area to be analyzed, and as shown in "Image Diagram 1 of the changed state," the analysis range display area can be enlarged and set to a desired size. Furthermore, as shown in "Image Diagram 2 of the changed state" and "Image Diagram 3 of the changed state," exclusion range setting lines that can be moved horizontally or vertically, respectively, can be added to set areas to be excluded from the analysis range. The part of the wafer excluding the excluded area from the analysis range display area is the analysis range of the wafer.
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