Wafer inspection images

JP1820757SActive Publication Date: 2026-03-05HAMAMATSU PHOTONICS KK
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Patent Information

Application Number
JP2025003737D
Authority / Receiving Office
JP · JP
Patent Type
Designs
Current Assignee / Owner
Filing Date
2025-02-27
Publication Date
2026-03-05
Estimated Expiration
2049-07-11

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Abstract

The image of the present design is used to read and inspect a wafer to be analyzed, and is an image for setting the analysis range of the wafer. In this image, as shown in "Image Diagram," the analysis range display section is displayed on the wafer display section to be analyzed, and as shown in "Image Diagram 1 of Changed State," the analysis range display section can be enlarged and set to the desired size. Furthermore, as shown in "Image Diagram 2 of Changed State," the analysis range display section can be changed to match the shape of a notch or other part formed on the wafer, allowing for the setting of a range to be excluded from the analysis range. The area excluding the range to be excluded from the analysis range display section is the analysis range of the wafer.
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