Wafer inspection images
JP1820757SActive Publication Date: 2026-03-05HAMAMATSU PHOTONICS KK
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Patent Information
- Application Number
- JP2025003737D
- Authority / Receiving Office
- JP · JP
- Patent Type
- Designs
- Current Assignee / Owner
- Filing Date
- 2025-02-27
- Publication Date
- 2026-03-05
- Estimated Expiration
- 2049-07-11
Smart Images

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Abstract
The image of the present design is used to read and inspect a wafer to be analyzed, and is an image for setting the analysis range of the wafer. In this image, as shown in "Image Diagram," the analysis range display section is displayed on the wafer display section to be analyzed, and as shown in "Image Diagram 1 of Changed State," the analysis range display section can be enlarged and set to the desired size. Furthermore, as shown in "Image Diagram 2 of Changed State," the analysis range display section can be changed to match the shape of a notch or other part formed on the wafer, allowing for the setting of a range to be excluded from the analysis range. The area excluding the range to be excluded from the analysis range display section is the analysis range of the wafer.
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