Focus ring

JP1827040SActive Publication Date: 2026-05-19TOKYO ELECTRON LTD
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Designs
Current Assignee / Owner
TOKYO ELECTRON LTD
Filing Date
2025-04-22
Publication Date
2026-05-19

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Abstract

This item is a focus ring used by being installed inside a chamber. This item is used to improve the uniformity of the plasma on the semiconductor wafer surface by spreading the distribution of the plasma generated inside the chamber from the semiconductor wafer surface to the item itself.
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