Shower plate

JP1829276SActive Publication Date: 2026-06-16NIPPON SEIMITSU DENSHI
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Designs
Current Assignee / Owner
NIPPON SEIMITSU DENSHI
Filing Date
2026-01-06
Publication Date
2026-06-16

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Abstract

This article is used in a plasma reactor used for the manufacture of semiconductors and the like, to inject a plasma excitation gas into the processing chamber of the plasma reactor. The shower plate of this article is positioned with its front view side facing the processing chamber. The part for which design registration is sought is the nozzle portion of the shower plate that injects the gas.
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