Apparatus and method for purifying process gas containing at least one pollutant gas

Abstract

To provide a device and a method with which pollutant gas can be rendered harmless in an efficient manner.SOLUTION: An apparatus for purifying process gas (22) containing at least one pollutant gas has a reactor vessel formed as a centrifugal separator. The reactor vessel has a cylindrical region (5) and a tapering region (9). Oxygen or oxygen-containing gas can be introduced as reaction gas (21) into the reactor vessel through at least one gas inlet (1, 2, 3) arranged on the cylindrical region (5) and can be discharged through at least one gas outlet (10, 11) arranged on the tapering region (9). The at least one gas inlet (1, 2, 3) is arranged and formed to introduce the reaction gas (21) into the reactor vessel tangentially to a circumferential surface of the cylindrical region (5). The apparatus further comprises a pollutant gas inlet (8) arranged on the cylindrical region (5).SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to an apparatus and method for scrubbing a process gas containing at least one contaminant gas. [Background technology]

[0002] Pyrophoric and / or toxic gases, which among other things contribute to global warming, are generated in various chemical processes and, due to their harmful properties, often have to be treated, at great expense, and rendered as harmless as possible. Various solutions are known from the prior art.

[0003] DE202005021057U1 discloses a gas pollutant decomposition system as a burner-scrubber system for reacting gases, where the temperature required to (de)react the gases is generated in a combustion chamber. The disadvantage of this is the high acquisition costs and the equally high maintenance costs of such a system due to the energy-intensive process.

[0004] From EP1070532A1 a flow separation system with a mixing chamber is known, which has an elaborately designed mixing chamber with internal pipes, inlets and channels, which is complex, expensive to manufacture and applicable to only a relatively limited number of applications. EP1129763A1 discloses another system in which water is introduced into the gas stream or the gas stream is mixed with preheated air. This system also has a complex structure, which means that the procedures carried out in such a system are also complex and require expensive controls. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] DE202005021057U1 [Patent Document 2] EP1070532A1 [Patent Document 3] EP1129763A1 Summary of the Invention [Problem to be solved by the invention]

[0006] The present invention is therefore based on the object of proposing a device and a method which avoid the aforementioned drawbacks, i.e. by means of which pollutant gases can be efficiently rendered harmless. [Means for solving the problem]

[0007] This object is solved according to the invention by an arrangement and a method as set forth in the independent claims. Advantageous embodiments and further developments are set forth in the dependent claims.

[0008] The device for cleaning or detoxifying a process gas containing at least one pollutant gas (wherein the process gas itself may also be a pollutant gas) comprises a reactor vessel designed as a centrifuge having a cylindrical or hollow cylindrical section and a tapered section. Oxygen or an oxygen-containing gas can be introduced as a reaction gas into the reactor vessel through at least one gas inlet arranged in the cylindrical region and can be discharged from the reactor vessel through at least one gas outlet arranged in the tapered region. The at least one gas inlet is arranged and configured to introduce a volumetric flow rate of the reaction gas into the reactor vessel tangentially to the circumferential surface of the cylindrical region. A pollutant gas inlet is also arranged in the cylindrical region and is designed to introduce a volumetric flow rate of the process gas containing at least one pollutant gas into the reactor vessel, whereby the at least one pollutant gas and the reaction gas mix with each other in the direction of the gas outlet and chemically react with each other on their way through the reactor vessel. The gas outlet is arranged and configured to discharge the process gas that has not reacted in the chemical reaction and the reaction products of the chemical reaction from the reactor vessel.

[0009] The device allows the reactor to be set up in a simple manner, whereby a given introduction of various gases allows reproducible and detectable chemical reactions. The design as a centrifuge (also called cyclone, cyclone separator, vortex separator) not only allows reliable suction and transfer of the gases accompanying the chemical reaction towards the gas outlet, but also ensures a flow-optimized design due to the arrangement of the gas inlets, in which case an immediate or complete mixing of the gases is achieved, rather than a simple dilution of the pollutant gas as is usually the case. In short, the device or the process carried out with it, as well as its use, are optimized and controlled to allow a safe reaction or oxidation, which protects the environment and surroundings and reduces the costs of this process compared to the prior art. At the same time, an improved product is achieved, i.e. instead of dilution, a real reaction of the pollutant gas takes place, thus achieving a reduction in the emissions of the pollutant gas. This allows the reaction products to be selected with respect to their purity and reused.

[0010] To set a predetermined volumetric flow rate, the apparatus has a device for setting a volumetric flow rate, by means of which a predetermined volumetric flow rate of the process gas and / or a predetermined volumetric flow rate of the reaction gas containing at least one pollutant gas can be set before being introduced into the reactor vessel. Typically, this volumetric flow rate is 300 m 3 / 2600m from time 3 / h, preferably 600m 3 / 1300m from time 3 Alternatively or additionally, the apparatus may include a compressor for introducing process gases and / or reactant gases into the interior of the reactor vessel.

[0011] A temperature sensor may be provided at or in the gas outlet to sense the temperature of the chemical reaction, which is usually exothermic, in the reactor vessel. The determined temperature can be transferred to a device for setting the volume flow rate in order to readjust the predetermined volume flow rate accordingly, so that the reaction can be controlled or, if necessary, adjusted. Usually, this temperature sensor is located in the center of the gas outlet.

[0012] Alternatively or additionally, a flow rate sensor may be arranged in or at the gas inlet and / or in or at the pollutant gas inlet. The determined flow rate of each gas may also be transmitted to a device for setting the volumetric flow rate and used as a control parameter or control parameters.

[0013] To carry out the cleaning oxidation, in addition to oxygen, in particular ambient air mixtures can also be used as oxygen-containing reactive gas, which makes the overall process easier to carry out.

[0014] To support the chemical reaction, a heating device may be arranged in or on the reactor vessel, which is preferably designed as an electrical resistance heater and which, if necessary, can also be controlled or regulated by a device for setting the volumetric flow rate.

[0015] The reactor vessel itself is typically constructed from stainless steel and typically uses standardized standard pipes and ISO flanges for the gas inlet, gas outlet, and contaminant gas outlet, respectively, to keep the design simple and cost effective. The reactor vessel is typically designed to be closed, i.e. gas-tight or fluid-tight, with respect to the gas inlet, gas outlet, or contaminant gas outlet.

[0016] The contaminant gas inlet may be located on an end face, i.e. on the circular surface of the cylinder, to ensure direct mixing with the tangentially entering reactant gas.

[0017] The tapered region is usually designed as a conically tapered region, although in principle the taper can also be described by a polynomial function and the resulting solid of revolution.

[0018] The gas outlet is usually curved to provide a predetermined geometry for the pure discharge of the gas mixture in the reactor vessel. Preferably, the gas outlet is curved by 90°.

[0019] The contaminant gas inlet is typically located opposite the gas outlet and is preferably configured such that the contaminant gas is introduced into the reactor vessel rotationally symmetrically with respect to the longitudinal axis of the gas outlet, typically with respect to the central axis of the gas outlet.

[0020] To safely collect and remove the reaction products, the filter element may be removably attachable to the gas outlet, i.e., removable and / or attachable to a filter element, scrubber and / or collection container for the reaction products.

[0021] In a particularly advantageous manner, silane and / or diborane can be treated as pollutant gases using the described device.

[0022] Typical residence times for the contaminant gases in the reactor vessel are between 0.3 and 5.0 seconds, with a preferred residence time of 0.7 to 2.0 seconds. Typical process temperatures can range from 20°C to 300°C, preferably 40°C to 200°C.

[0023] In a process for purifying a process gas containing at least one pollutant gas, a volumetric flow rate of oxygen or an oxygen-containing gas is introduced as a reactant gas tangentially to the circumferential surface of a cylindrical region through at least one gas inlet located in the cylindrical region into a reactor vessel formed as a centrifuge having a cylindrical region and a tapered region, a volumetric flow rate of a process gas containing a pollutant gas is introduced into the reactor vessel through the pollutant gas inlet located in the cylindrical region, the pollutant gas and the process gas are mixed with each other and react chemically with each other on their way through the reactor vessel, and the process gas that did not react during the chemical reaction and the reaction products of the chemical reaction are discharged from the reactor vessel through a gas outlet.

[0024] The described methods can be performed using the described apparatus, i.e. the described apparatus is configured to carry out the described methods.

[0025] Examples of embodiments of the invention are illustrated in the drawings and will be described below with reference to FIGS. [Brief description of the drawings]

[0026] [Figure 1] 1 is a schematic side view of an apparatus for purifying a process gas containing at least one contaminant gas. [Diagram 2] FIG. 2 is a view of the device rotated by 90° compared to FIG. 1. [Diagram 3] FIG. 3 is a schematic diagram of the flow path through the device described in FIGS. 1 and 2. [Figure 4] FIG. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0027] FIG. 1 shows a schematic side view of an embodiment of a device for cleaning process gases containing at least one contaminant gas. Air as a reactant gas can enter via one or more intake or inlet ports 1. From the inlet port 1, the reactant gas flows through a corner valve 2, through one or more inlet tubes 3, through a metering port, through an elbow, and into an ambient mixed gas port 12. The inlet port 1, the corner valve 2, and the inlet tube 3, together with the ambient mixed gas connection 12, form a gas inlet into the reactor vessel, which has a hollow cylindrical region 5 and a conically tapered region 9. Metering ports for various measuring devices can also be arranged on the inlet tube 3.

[0028] The ambient mixed gas connection 12 is arranged tangentially to the here linear, i.e. cylindrical, region 5 of the reactor vessel, designed as a cyclone or centrifuge. Above the cylindrical region 5 of the reactor vessel, the reactor vessel is hermetically sealed by a reactor plate 6 or reactor lid, on which a number of pollutant gas inlets 8 are arranged. In the embodiment shown in FIG. 1, three of these pollutant gas inlets 8 are visible. In this figure, the fourth pollutant gas inlet 8 is hidden by the one located in the center. Behind the centrally located pollutant gas inlet 8, an inspection opening with a cover 7 is visible, i.e. the pollutant gas inlets 8 are arranged concentrically around the cover 7 on a flow-optimized circle. The pollutant gas inlets 8 are thereby rotationally symmetrical around the longitudinal or central axis of the transition from the tapered region 9 to the 90° elbow 10. In a further embodiment example, a measuring instrument or scraper, or scraper referred to as "scraper", can also be introduced into the interior of the reactor vessel for cleaning through the opening closed by the lid 7, or the opening can be used for inspection purposes. The conical tapered area 9 of the reactor vessel adjoins the cylindrical area 5 at the bottom. This cone of the cyclone is followed by a 90-degree elbow 10, which forms the transition to the exhaust 11 and thus the connection to the gas outlet. The ambient mixed gas port 12 is arranged tangentially at a distance from the reactor plate 6. After a short straight tube, these connections in the illustrated example continue downwards in a 90-degree elbow at right angles to the substrate and end in a spring-returned angle valve 2, the outlet of which runs again parallel to the substrate. At this outlet, a straight circular tube cut obliquely is arranged, which serves as an intake or inlet port 1 and enlarges the inlet cross section. This facilitates the inflow to the gas inlet. Through-hole screws can be placed in the vertical pipe to accommodate, for example, measurement devices such as pitot tubes or other volume or speed sensors. The size of these threads is usually selected according to the plant, but is standardized to screw in gas-tight with a blind cover.

[0029] In the embodiment shown in FIG. 1, the device is arranged in an upright position, i.e. the reactor vessel is oriented with its vertical axis perpendicular to the substrate. The reactor vessel itself has a cylindrical section 5 at its upper end, which is considered to be further away from the substrate, which joins to a frustoconical tapered area 9 in the direction of the substrate. The device itself ends in an exhaust 11 in an external frame structure (not shown for clarity) that supports the device. In the illustrated embodiment, the contaminant gas inlets 8 are arranged vertically on the reactor plate 6, but in further embodiments they can open into the reactor plate 6 at other angles or have an arcuate design. As a rule, the contaminant gas inlets 8 are designed as KF flanges in order to make it possible to easily close them for transport and to provide a standardized connection.

[0030] The device shown in Figure 1 allows for cost-effective and stable cleaning or reaction of pollutant gases. Compounds such as silane and diborane are highly reactive on their own, but they need to be properly supported to decompose from their gaseous state into dust and particles that are deposited or ingested downstream. The presented device and its optimized flows, described in more detail below, allow the control of this process as well as its monitoring to be achieved, which ultimately leads to improved purification results compared to the prior art.

[0031] The device for oxidizing pollutant gases in a reactor that can be sealed off from the environment allows an optimized inflow of the ambient mixed gas (usually air). Due to the inflow in the cylindrical area 5 tangential to the shell surface and with the help of the cyclone principle, a relatively long residence time in the reactor vessel and therefore a complete reaction without complex structures is possible. For this purpose, the reaction gas flows in a kind of vortex of a given volume from the inner wall of the reactor vessel via a continuous gas flow in the direction of the gas outlet or exhaust 11. The reactor vessel itself is conically tapered in the direction of flow towards the exhaust 11. Due to the fact that the pollutant gas inlet 8 faces the front side so that the vertical or longitudinal axis of the entire device is perpendicular to the ground and thus parallel to the acting gravity, the treatment gas 22 containing the pollutant gas also flows into the reactor vessel in the direction of gravity, is sucked into the cyclone vortex and, as a result, flows in a kind of helical or spiral motion in the direction of the gas outlet. The process gas is in constant contact with the ambient gas mixture and reacts with it without losing heat through the reactor walls in an exothermic reaction or dropping below the required minimum concentration due to excessive dilution. Ideally, the pollutant gas reacts completely in the reactor vessel until just before the exhaust 11. This exothermic reaction is ideally controlled by regulating and adjusting the volumetric flow rate, which can be done by a device (not shown for the sake of overview) for adjusting the volumetric flow rate, for example by a computerized valve control of the valves of the gas inlet and the pollutant gas inlet 8. For this purpose, a temperature sensor 13 can be placed in the middle of the exhaust flow, which continuously measures the temperature and transmits it as a control or regulation parameter to said device for setting the volumetric flow rate. In addition, in the embodiment shown in FIG. 1, it is also possible that the flow rate or volumetric flow rate in at least one inlet tube is measured and transmitted to said device as a control or regulation parameter. Preferably, this measurement is performed in the flow direction via a Pitot tube or a Pitot tube.

[0032] In the embodiment shown in Figure 1, the inlet of the ambient mixed gas is designed as a standardized pipe, preferably a reactor vessel or a reaction vessel, all connections are made of stainless steel and can be connected to the pipe system via, but not limited to, KF flanges (small flanges) or ISO flanges (International Organization for Standardization). In yet another embodiment, the device allowing the selective admission of the ambient mixed gas or the process gas may also include a compressor.

[0033] In another embodiment, the reactor plate 6 has at least two ports, one of which is a pollutant gas inlet 8 and the other for introducing a heating element with a surface reaction of the pollutant gas with a reaction temperature above ambient temperature, in particular above room temperature 20° C. This initiates a presetting or control of the exothermic reaction on this surface, and if the temperature inside the reactor vessel, i.e. the centrifuge or cyclone, is high enough, the heating element can be deactivated and the reaction monitored via a temperature sensor 13 in the exhaust 11 and / or a further temperature detector arranged inside the reactor vessel. The gas outlet is arranged on the opposite side of the reactor plate 6, also called the reactor lid, at the taper area 9 where the diameter is smallest.

[0034] Thus, in a process corresponding to the oxidation of a pollutant gas, such as silane, SiH4, or diborane, B2H6, the reactant gas first enters the reactor vessel via a corresponding inlet, in which a cyclonic screw motion is formed, which extends from the inlet of the reactor vessel to the inside and further to the gas outlet. This cyclonic screw motion is accelerated in the direction of the gas outlet 11, in particular also by a tapered section 9. Ambient air is drawn in as process gas through the gas inlet, for example by a fan. Preferably, the pollutant gas enters, for example via a pollutant gas inlet 8, which is located inside the cyclic screw motion, by entrainment or suction by this screw motion. Inside, the pollutant gas also performs a screw motion equivalent to the reactant gas, so that a contact zone is formed in the reactor vessel, where the pollutant gas and the reactant gas 21 react as reactants before a mixing occurs below a minimum concentration, in the case of silane, for example a volume percentage of the mixed gas below 2 volume percent (in which case a minimum concentration of the pollutant gas is maintained).

[0035] Upon mixing of the reaction partners, a (chain) reaction begins, which over the distance of the cyclone screw movement causes the pollutant gas to react completely, after the reaction the two reaction partners are in a gas stream consisting of charged reactant gas, preferably powdery or dusty substances. Here, the mixed gas is accelerated, in particular after entering the cone. This gas stream can be collected, separated, filtered or washed, for which purpose collection containers and / or corresponding filter elements or scrubbers can be attached to and / or in the exhaust 11. For example, the reacted reaction products can be filtered as suspended matter or washed out by passing them through a scrubber. Preferably, the ultra-pure substances are filtered and blown into a collection vessel for recycling and further processing. If the cyclone movement formed is stable, which can be achieved for example by using time constants and / or by evaluating measurement variables such as differential pressure, volumetric flow rate, flow velocity, etc., the inflow is made possible by drawing in the treatment gas via the pollutant gas inlet 8. The process gas, together with the contaminant gas, such as silane, as a residual charge from the gas cylinder, can also be limited by a mass flow controller if necessary. However, when entering the contact zone, the impurity gas must usually have a minimum concentration that corresponds to the critical mass of an independent chain reaction, depending on the impurity gas. During the reaction, heat is usually released, which supports the progress of the reaction and promotes a complete reaction. This is made possible by the minimum concentration and residence time in the reactor vessel, but also by the lack of dilution of the reactants, which are only mixed in the contact zone inside the reactor vessel. After the reaction, the two reactants become a gas stream consisting of air containing silica, which can be separated in a filter unit if necessary. The filter unit can then blow this gas into a connected collection vessel, as a result of which clean material is collected and the filter of the filter unit can be loaded several times and the air can be released to the environment without contaminants.

[0036] A heating element or heat source can be used to start the described (chain) reaction when the reactants are mixed and when the reaction has stabilized (this can be, for example, when the heating element is switched off after a pre-determined time or by detecting process parameters such as the temperature of the gas stream and evaluating these process parameters). For this purpose, the heating element may be located in the contact zone or in the immediate vicinity of the pollutant gas inlet, i.e. close to the pollutant gas inlet 8 (usually no more than a diameter of each pollutant gas inlet 8 from the end of the pollutant gas inlet 8) or at the pollutant gas inlet 8 itself. In the case of diborane, this additional heating device is usually used to start the reaction, since diborane itself does not react independently with oxygen. Once the reaction has started, the heating device can also be switched off. Although silane and diborane are given as examples, the device and the process can of course also be used for other pollutant gases.

[0037] FIG. 2 shows a schematic side view, but rotated by 90° from the view shown in FIG. 1, of the device from the rear without the support structure. Recurring features are marked in this and the following figures with identical reference symbols. In particular, the temperature sensor 13, located in the middle of the exhaust stream, is more clearly visible. Thus, as before, the device comprises a cyclone or centrifuge with at least two inlets, each for one reactant, which reacts during its residence time in the reactor with less harmful or reusable substances and thus no longer endangers the environment. Furthermore, in the event of an accident, the process can be isolated from the environment by a safety device, reproducible, controllable and monitorable. At least one spring-returned valve, a safety valve, a limit switch or, in general, a valve that is closed when not actuated can be provided as safety device, or usually several of the above safety devices are used, whereby different types can also be used in combination with each other.

[0038] Figure 3 shows a schematic diagram of the flow path (left part of the diagram in the view corresponding to Figure 1 and right part of the diagram in the view corresponding to Figure 2). Reactant gas 21, for example an ambient gas mixture, enters the reactor vessel via an intake or inlet port 1. Inflow 23 is directed in an inlet tube 3 to an inlet 24 in the reactor vessel where a cyclonic screw motion 25 is created, drawing in pollutant gas via pollutant gas inlet 8. The gas stream flows over a 90 degree elbow 10 into exhaust 11 as exhaust stream 26.

[0039] As shown in the schematic perspective view of Figure 4, the reactant gas 21 enters the reactor vessel tangentially through the ambient mixed gas port 12. A cyclonic screw motion 25 is then formed inside and flows downward in a spiral or constant rotation as exhaust gas flow 26 until it reaches the outlet, 90 degree elbow 10 and exhaust 11. The cyclonic screw motion 25 or cyclonic flow draws in the pollutant gas or process gas 22 through the pollutant gas inlet 8 and forms a contact zone 27 between the two. In Figure 4, the darker lines decrease in the direction of the exhaust gas flow, indicating the minimum concentration drop, i.e., reaction cessation.

[0040] Although only features of various embodiments have been disclosed, the examples may be combined in the embodiments and claimed separately. [Explanation of symbols]

[0041] 1 Inlet Port 2 Corner valves, angle valves 3 Inlet pipe 5 Cylindrical Region 6 Reactor Plate 7 Cover, Lid 8 Contaminant gas inlet 9 Conical tapered area 10 90 degree elbow 11 Exhaust section, gas outlet 12 Ambient mixed gas port, ambient mixed gas connection 13 Temperature Sensor 21 Reactive gas 22 Pollutant gas or treated gas 23 Inflow 24 Entrance 25 Cyclone screw motion 26 Exhaust flow 27 Contact Zone

Claims

1. 1. An apparatus for purifying a process gas (22) containing at least one contaminant gas, comprising: A reactor vessel designed as a centrifuge, having a cylindrical region (5) and a tapered region (9), in which oxygen or an oxygen-containing gas as a reaction gas (21) can be introduced into at least one gas inlet (1, 2, 3, 12) arranged on said cylindrical region (5) and can be discharged through at least one gas outlet (10, 11) arranged on said tapered region (9), wherein a reactor vessel, the at least one gas inlet (1, 2, 3, 12) being arranged and configured to introduce a volumetric flow rate of the reaction gas (21) into the reactor vessel in a tangential direction relative to the circumferential surface of the cylindrical region (5); a pollutant gas inlet (8) arranged on the cylindrical region (5) and designed to introduce a volumetric flow rate of the treatment gas (22) containing at least one pollutant gas into the reactor vessel, whereby the at least one pollutant gas and the reaction gas (21) are mixed with each other in the direction of the gas outlets (10, 11) and chemically react with each other on their way through the reactor vessel; The gas outlets (10, 11) are positioned and designed to exhaust process gases that have not reacted in the chemical reaction and reaction products of the chemical reaction from the reactor vessel.

2. 2. The apparatus according to claim 1, characterized in that the predetermined volumetric flow rate of the treatment gas (22) containing at least one pollutant gas and / or the predetermined volumetric flow rate of the reaction gas (21) can be set by means of a device for setting the volumetric flow rates before introducing it into the reactor vessel.

3. 3. The device according to claim 1 or 2, characterized in that a temperature sensor (13) is arranged on or in the gas outlet (10, 11) and / or a flow rate sensor is arranged in or on the at least one gas inlet (1, 2, 3, 12) or the pollutant gas inlet (8).

4. 3. The apparatus of claim 1 or 2, characterized in that a heating device is disposed in or on the reactor vessel for supporting the chemical reaction.

5. 3. Apparatus according to claim 1 or 2, characterized in that the pollutant gas inlet (8) is arranged at an end face (6) of the cylindrical region (5) of the reactor vessel.

6. 3. Apparatus according to claim 1 or 2, characterized in that the tapered region (9) of the reactor vessel is formed as a conically tapered region.

7. 3. Apparatus according to claim 1 or 2, characterized in that the gas outlets (10, 11) are arcuately curved, preferably by 90°.

8. 3. The apparatus according to claim 1 or 2, characterized in that the pollutant gas inlet (8) is arranged opposite the gas outlets (10, 11) and is configured for introducing the pollutant gas (22) into the reactor vessel rotationally symmetrically with respect to the longitudinal axis of the gas outlets (10, 11).

9. 3. Apparatus according to claim 1 or 2, characterized in that a filter element, a scrubber and / or a collection container for reaction products are removably attachable to the gas outlet (10, 11).

10. 1. A method for purifying a process gas containing at least one contaminant gas, comprising: A volumetric flow rate of oxygen or an oxygen-containing gas as a reaction gas (21) is introduced into a reactor vessel tangential to the circumferential surface of a cylindrical region (5) via at least one gas inlet (1, 2, 3, 12) arranged on said cylindrical region (5), said reactor vessel being designed as a centrifuge and having said cylindrical region (5) and a tapered region (9), A volumetric flow rate of a process gas (22) containing the contaminant gas is introduced into the reactor vessel via a contaminant gas inlet (8) located in the cylindrical region (5); The method, wherein the pollutant gas (22) and the reactant gas (21) are mixed with each other and chemically react with each other on their way through the reactor vessel, and unreacted process gas and reaction products of the chemical reaction are exhausted from the reactor vessel through gas outlets (10, 11).

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