Polyimide film
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- SUMITOMO CHEM CO LTD
- Filing Date
- 2024-05-09
- Publication Date
- 2026-07-01
AI Technical Summary
Polyimide films used in flexible printed circuit boards face challenges in achieving high puncture strength while maintaining appropriate dielectric properties, particularly for high-speed communication applications like 5G.
A laminated film structure with specific relationships between the thickness and transmittance of polyimide resin-containing layers, utilizing a combination of polyimide resins with controlled structural units and layer configurations to enhance puncture strength and reduce dielectric loss.
The laminated film achieves high puncture strength and low dielectric loss, suitable for high-speed communication applications by optimizing the interaction and orientation of polyimide resin molecules, thereby improving mechanical and dielectric properties.
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