Compound, (CO)polymer, composition, pattern-forming method, and production method of compound

JP2024123024A5Pending Publication Date: 2025-03-18MITSUBISHI GAS CHEM CO INC
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Patent Information

Application Number
JP2024090131
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2019-08-06
Filing Date
2024-06-03
Publication Date
2025-03-18

AI Technical Summary

Technical Problem

Conventional resist compositions face issues such as film defects, insufficient sensitivity, and poor etching resistance, particularly in the formation of fine patterns required for semiconductor and liquid crystal display elements using extreme ultraviolet lithography.

Method used

Development of iodine-containing (meth)acrylate compounds and (co)polymers with specific structures that enhance solubility in safe solvents, enabling the formation of films with high resolution and sensitivity, suitable for resist patterns and insulating films.

Benefits of technology

The iodine-containing (meth)acrylate compounds and (co)polymers provide films with high resolution and sensitivity, addressing the limitations of conventional resist materials by improving film quality and pattern formation in semiconductor and liquid crystal display elements.

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Abstract

To provide a composition and the like capable of forming a film having high resolution and high sensitivity.SOLUTION: The purpose can be attained by the following compound. The compound is an iodine-containing (meth)acrylate compound represented by general formula (1).SELECTED DRAWING: None
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