Compositions for silicon and boron containing films and methods of using same - Patents.com
JP2024508907A5Active Publication Date: 2025-12-23VERSUM MATERIALS US LLC +1
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Patent Information
- Application Number
- JP2023553500
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2021-03-02
- Filing Date
- 2022-03-01
- Publication Date
- 2025-12-23
- Estimated Expiration
- 2042-03-01
Abstract
The present invention relates to compositions and methods of using the compositions for depositing films comprising silicon and boron in the manufacture of electronic devices, particularly films having low dielectric constants (less than 6.0) and high oxygen ashing resistance. The films comprise silicon and boron and may be, but are not limited to, silicon borocarboxylide, silicon borocarbonitride, silicon boroxide, or silicon borocarboxynitride.
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