Method and system for providing hydrogen gas - Patents.com

JP2024514685A5Active Publication Date: 2024-12-16HYDROGENIOUS TECH GMBH
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Patent Information

Application Number
JP2023564183
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2021-04-19
Filing Date
2022-04-14
Publication Date
2024-12-16
Estimated Expiration
2042-04-14

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Abstract

A method for providing hydrogen gas comprises releasing hydrogen gas (H2) by catalytic dehydrogenation of an at least partially loaded hydrogen carrier medium (Hx-LOHC) in a dehydrogenation reactor (2) to form an at least partially released hydrogen carrier medium (H0-LOHC), catalytically oxidizing the at least partially released hydrogen carrier medium (H0-LOHC) by an oxidant in an oxidation reactor (5) to form an at least partially oxidized hydrogen carrier medium (Ox-LOHC), reducing the at least partially oxidized hydrogen carrier medium (Ox-LOHC) in a hydrogenation reactor (21) to form the at least partially loaded hydrogen carrier medium (Hx-LOHC) by catalytic hydrogenation, and removing at least one oxygen-containing impurity from the at least partially loaded hydrogen carrier medium (Hx-LOHC) and / or from the at least partially oxidized hydrogen carrier medium (Ox-LOHC).
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