Processor

JP2025005570APending Publication Date: 2025-01-17USHIO INC
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Patent Information

Application Number
JP2023105787
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2023-06-28
Publication Date
2025-01-17

AI Technical Summary

Technical Problem

Conventional processing devices face low throughput due to the need to adjust the entire processing chamber atmosphere for workpieces of varying thicknesses, leading to prolonged processing times, especially when using ultraviolet light or plasma processing.

Method used

The processing apparatus is designed with a support stand and units that allow the workpiece to be moved within a closed space, substantially separating the processing space from a non-processing space, enabling quick adjustment of the atmosphere around the workpiece by introducing gas only to the processing space.

Benefits of technology

This configuration allows for rapid atmosphere adjustment and improved throughput by reducing the time required to prepare the processing environment, thus enhancing processing efficiency.

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  • Figure 2025005570000001_ABST
    Figure 2025005570000001_ABST
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Abstract

To provide a processor capable of controlling atmosphere around a workpiece at an early stage and having a large throughput.SOLUTION: A processor includes: a support table on which a workpiece is placed; a first unit in which the support table is accommodated; a second unit which is arranged opposite to the first unit, and in which a discharge unit consisting of a discharge lamp or a plasma generator is accommodated; and an air inlet which introduces gas into the first unit, wherein the first unit and the second unit form a closed space, the second unit supplies ultraviolet light or plasma-containing gas generated by the discharge unit to the support table, and the support table is configured so that the workpiece can be moved with respect to a first direction in which the first unit and the second unit are opposite, and an internal space of the first unit is substantially separated with respect to the first direction.SELECTED DRAWING: Figure 1
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Citation Information

Patent Citations

  • Normal pressure plasma treatment device

    JP2002320845A

  • Treatment apparatus using dielectric barrier discharge lamp and treatment method

    JP2003144913A