Adsorption control method and film deposition apparatus
JP2025008479A5Pending Publication Date: 2025-12-16TOKYO ELECTRON LTD
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Patent Information
- Application Number
- JP2023110691
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2023-07-05
- Publication Date
- 2025-12-16
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Abstract
To control the adsorption of the raw material of a second layer to a first layer.SOLUTION: A method for controlling the adsorption of the raw material of a second layer on a first layer comprises: preparing a substrate including the first layer on a stage in a chamber; supplying the raw material of the second layer into the chamber to expose the raw material to the surface of the first layer; and controlling the adsorption of the raw material on the surface of the first layer by controlling electric charges provided to defects on the surface of the first layer.SELECTED DRAWING: Figure 7
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