Exposure apparatus, exposure method, and article manufacturing method

Abstract

To provide an exposure apparatus and an exposure method which are useful for preventing a pellicle frame of a reticle assembly from colliding a support member material of a conveyance destination.SOLUTION: An exposure apparatus exposes a substrate by using a reticle assembly having a reticle, a pellicle frame and a pellicle. The exposure apparatus comprises: a measuring instrument which measures a relative position of the pellicle frame with respect to the reticle; a conveyance robot which conveys the reticle assembly in the state where the pellicle frame is positioned under the reticle; a controller which corrects a conveyance target position of the reticle assembly by the conveyance robot on the basis of the relative position measured by the measuring instrument; and a reticle support mechanism which receives the reticle assembly conveyed to the conveyance target position, where the reticle support mechanism includes two reticle support parts separate from each other, and supports a bottom surface of the reticle by the two reticle support parts such that the pellicle frame is positioned between the two reticle support parts.SELECTED DRAWING: Figure 4

Description

[Technical field]

[0001] The present invention relates to an exposure apparatus, an exposure method, and an article manufacturing method. [Background technology]

[0002] Patent Document 1 describes that when a reticle is transferred to a reticle stage by a robot, a mark on the reticle is detected, and the position of the reticle relative to the reticle stage is adjusted based on the result of the detection. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Patent No. 6401872 Summary of the Invention [Problem to be solved by the invention]

[0004] A pellicle frame and a pellicle may be attached to the reticle. In this specification, a structure in which the pellicle frame and the pellicle are attached to the reticle is called a reticle assembly. In the device described in Patent Document 1, even if the reticle is aligned with respect to the reticle stage using a mark provided on the reticle, if the relative position of the pellicle frame with respect to the reticle is not appropriate, the pellicle frame may collide with the reticle stage.

[0005] An object of the present invention is to provide an exposure apparatus and an exposure method that are useful for preventing a pellicle frame of a reticle assembly from colliding with a support member at the destination. [Means for solving the problem]

[0006] One aspect of the present invention relates to an exposure apparatus that exposes a substrate using a reticle assembly having a reticle, a pellicle frame and a pellicle, the exposure apparatus comprising a measuring instrument that measures the relative position of the pellicle frame to the reticle, a transport robot that transports the reticle assembly with the pellicle frame positioned under the reticle, a controller that corrects a target transport position of the reticle assembly by the transport robot based on the relative position measured by the measuring instrument, and a reticle support mechanism that receives the reticle assembly transported to the target transport position, the reticle support mechanism including two reticle support parts spaced apart from each other, and supporting the underside of the reticle by the two reticle support parts so that the pellicle frame is positioned between the two reticle support parts. Effect of the Invention

[0007] According to the present invention, there is provided an exposure apparatus and an exposure method which are useful for preventing the pellicle frame of the reticle assembly from colliding with a support member at the destination. [Brief description of the drawings]

[0008] [Figure 1] FIG. 2 is a diagram showing a schematic configuration of a reticle assembly. [Diagram 2] FIG. 1 is a diagram showing a schematic configuration of an exposure apparatus according to an embodiment. [Diagram 3] FIG. 2 is a diagram showing a schematic configuration example of a measuring instrument. [Figure 4] 5A and 5B are diagrams illustrating examples of information relating to relative positions measured by a measuring instrument. [Diagram 5] 13 is a diagram showing an example of registering relative position information according to a relative position measured by a measuring instrument in association with an identifier of a reticle assembly. FIG. [Figure 6] FIG. 13 is a diagram illustrating another example of the configuration of a measuring instrument. [Figure 7] 1A to 1C are diagrams showing an exposure method according to an embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0009] Hereinafter, the embodiments will be described in detail with reference to the attached drawings. Note that the following embodiments do not limit the invention according to the claims. Although the embodiments describe a number of features, not all of these features are essential to the invention, and the features may be combined in any manner. Furthermore, in the attached drawings, the same reference numbers are used for the same or similar configurations, and duplicated descriptions are omitted.

[0010] In this specification and in the drawings, directions are described according to an XYZ coordinate system, whose Z axis is parallel to the vertical direction and whose XY plane is parallel to the horizontal plane.

[0011] Fig. 1(a) shows a schematic configuration of a reticle assembly RA. The reticle assembly RA has a reticle 1, a pellicle frame 2, and a pellicle 3. In one example, the pellicle frame 2 may be fixed to the reticle 1 by an adhesive or the like, and the pellicle 3 may be fixed to the pellicle frame 2 by an adhesive or the like. Fig. 1(b) shows a schematic state in which the lower surface of the reticle 1 is supported by two reticle supports 34a, 34b (or 74a, 74b) such that the pellicle frame 2 is located between the two reticle supports 34a, 34b (or 74a, 74b) spaced apart from each other.

[0012] 2 shows a schematic configuration of an exposure apparatus EXP according to an embodiment. The exposure apparatus EXP may include a transport robot 20 that transports the reticle assembly RA with the pellicle frame 2 positioned under the reticle 1. The exposure apparatus EXP may include a reticle stage mechanism 30 that holds the reticle assembly RA with a reticle support mechanism 32 including two reticle supports 34a, 34b, and a substrate stage mechanism 64 that holds and drives the substrate S. The exposure apparatus EXP may also include a projection optical system 62 that projects the pattern of the reticle 1 of the reticle assembly RA supported by the reticle support mechanism 32 (reticle stage mechanism 30) onto the substrate S. The exposure apparatus EXP may also include an illumination optical system 60 that illuminates the reticle assembly RA supported by the reticle support mechanism 32 (reticle stage mechanism 30). The exposure apparatus EXP can be configured to illuminate a reticle assembly RA (reticle 1) by an illumination optical system 60, and project the pattern of the reticle 1 onto a substrate S by a projection optical system 62, thereby exposing the substrate S to light.

[0013] The exposure apparatus EXP may also include a reticle inspection apparatus 70 that supports the reticle assembly RA by two reticle supports 74a, 74b and inspects the reticle assembly RA. The exposure apparatus EXP may also include a metrology instrument 40 that measures the relative position of the pellicle frame 2 with respect to the reticle 1. The metrology instrument 40 may measure the relative position of the pellicle frame 2 with respect to the reticle 1, for example, while the reticle assembly RA is held by the transfer robot 20. The reticle inspection apparatus 70 may be configured, for example, as a foreign matter inspection apparatus that inspects for foreign matter attached to the reticle assembly RA. The exposure apparatus EXP may also include a chamber 90 that houses the reticle stage mechanism 30 (reticle support mechanism 32), the substrate stage mechanism 64, the projection optical system 62, the metrology instrument 40, and the transfer robot 20. The measuring instrument 40 is disposed in the chamber 90 and can measure the relative position of the pellicle frame 2 with respect to the reticle 1 for the reticle assembly RA that has been loaded into the chamber 90 .

[0014] The exposure apparatus EXP may also include a controller 50. The controller 50 may control a transport process of the reticle assembly RA by the transport robot 20. The transport process of the reticle assembly RA by the transport robot 20 may include, for example, a process of transporting the reticle assembly RA from a supply source 10 (e.g., a cassette, a loader) of the reticle assembly RA to a transport target position via a measurement region 41 of the measurement instrument 40. The controller 50 may, for example, correct a transport target position of the reticle assembly RA by the transport robot 20 based on a relative position measured by the measurement instrument 40, i.e., a relative position of the pellicle frame 2 with respect to the reticle 1. The controller 50 may correct a transport target position TP based on a relative position measured by the measurement instrument 40 so that the reticle assembly RA is transported in a state in which the pellicle frame 2 is separated from the reticle support mechanisms 32 and 72. The controller 50 may also control an exposure operation of the substrate S in the exposure apparatus EXP. The controller 50 may be configured, for example, by a PLD (Programmable Logic Device) such as an FPGA (Field Programmable Gate Array), or an ASIC (Application Specific Integrated Circuit), or a general-purpose or dedicated computer with an embedded program, or a combination of all or part of these.

[0015] FIG. 3 shows a schematic configuration example of the measuring instrument 40. The measuring instrument 40 can measure the relative position of the pellicle frame 2 with respect to the reticle 1 by irradiating a measuring area 41 with a measuring light 42. The measuring instrument 40 can include, for example, a laser displacement meter that measures displacement by laser light. The relative position of the pellicle frame 2 with respect to the reticle 1 can be expressed by various information or parameters. The relative position of the pellicle frame 2 with respect to the reticle 1 can be indicated, for example, by the values ​​of parameters a and b exemplified in FIG. 4. Here, the parameter a indicates the distance between the first side 11a of the reticle 1 and the first side 21a of the pellicle frame 2, and the parameter b indicates the distance between the second side 11b of the reticle 1 and the second side 21b of the pellicle frame 2. The first side 11a and the second side 11b are opposite sides. Also, the first side 21a and the second side 21b are opposite sides.

[0016] The amount of deviation of the center of the pellicle frame 2 from the center of the reticle 1 is also the relative position of the pellicle frame 2 with respect to the reticle 1, which corresponds to (ba). If (ba)=0, the center of the pellicle frame 2 coincides with the center of the reticle 1. If the minimum allowable gap between the first reticle support 34a and the pellicle frame 2 is c, then if c≦(ba), the pellicle frame 2 may interfere with the first reticle support 34a. If the minimum allowable gap between the second reticle support 34b and the pellicle frame 2 is d, then if d≦(ba), the pellicle frame 2 may interfere with the second reticle support 34b. The controller 50, for example, corrects the transfer target position TP of the reticle assembly RA by the transfer robot 20 based on the relative position measured by the measuring device 40, i.e., the relative position of the pellicle frame 2 with respect to the reticle 1. In one example where a corrected transport target position (hereinafter, corrected target position TP') is generated by this, the correction amount Δ is Δ=(ba) / 2, and (ba) / 2 is expressed as TP'=TP+(ba) / 2. The transport target position TP and the corrected target position TP' can be positions where the center of gravity of the reticle assembly RA should be located.

[0017] The controller 50 may store and manage the relative position information corresponding to the relative position measured by the measuring instrument 40 and the identifier ID of the reticle assembly RA in the storage device 52 in association with each other. The controller 50 may obtain the identifier ID by, for example, reading a code (e.g., a barcode) or a tag (e.g., an RF tag) attached to the reticle assembly RA using a reader (not shown). When the relative position information corresponding to the identifier ID has already been stored in the storage device 52, the controller 50 may correct the transfer target position TP based on the relative position information stored in the storage device 52 without causing the measuring instrument 40 to measure the reticle assembly RA. FIG. 5 shows an example in which the relative position information corresponding to the relative position measured by the measuring instrument 40 and the identifier ID of the reticle assembly RA are stored in association with each other in the storage device 52. In the example shown in FIG. 5, the values ​​a and b are stored as the relative position information in association with the identifier ID of the reticle assembly RA. In the example shown in FIG. 5, a correction value Δ is also stored in association with the identifier ID of the reticle assembly RA. The storage device 52 may be located anywhere as long as it is located so as to be accessible by the controller 50. The storage device 52 may be shared by a plurality of exposure apparatuses EXP. Such a plurality of exposure apparatuses EXP are a plurality of exposure apparatuses that may share a reticle assembly RA, and may be, for example, a plurality of exposure apparatuses installed in the same factory.

[0018] The transfer robot 20 may be controlled to transfer the reticle assembly RA so that the reticle assembly RA passes through a measurement region 41 of the measuring instrument 40. The measuring instrument 40 may be controlled to measure the relative position of the pellicle frame 2 with respect to the reticle 1 when the reticle assembly RA being transferred by the transfer robot 20 passes through the measurement region 41. In another aspect, the transfer robot 20 may transfer the reticle assembly RA so that the reticle assembly RA reaches the reticle support mechanism 32 (or 72) from the supply source 10 of the reticle assembly RA via the measurement region 41. The controller 50 may control the transfer robot 20 so that the reticle assembly RA is transferred according to a transfer path set in advance until the reticle assembly RA passes through the measurement region 41. The controller 50 may also be configured to correct the transfer target position TP based on the relative position of the pellicle frame 2 with respect to the reticle 1 measured by the measuring instrument 40 in the measurement region 41. The measurement instrument 40 can measure the relative position of the pellicle frame 2 with respect to the reticle 1 while the reticle assembly RA is moving in the measurement area 41 .

[0019] As illustrated in Fig. 6, the exposure apparatus EXP may include a plurality of measuring instruments 40 for measuring the relative position of the pellicle frame 2 with respect to the reticle 1. As illustrated in Fig. 6, each measuring instrument 4 may be arranged so as to include a corner of the pellicle frame 2 and a corner of the reticle 1 in its field of view. As illustrated in Fig. 3, the pellicle frame 2 may be arranged to be located between the measuring instrument 40 and the reticle 1, or as illustrated in Fig. 6, the reticle 1 may be arranged to be located between the measuring instrument 40 and the pellicle frame 2.

[0020] FIG. 7 shows an exposure method of one embodiment that can be performed in the exposure apparatus EXP. The exposure method or operation shown in FIG. 7 is controlled by the controller 50. In step S701, the controller 50 acquires an identifier ID by reading a code (e.g., a barcode) or a tag (e.g., an RF tag) attached to the reticle assembly RA using a reader (not shown). In step S702, the controller 50 determines whether there is relative position information registered in the storage device 52 in association with the identifier ID acquired in step S701, and if such relative position information is registered in the storage device 52, the process proceeds to step S710. On the other hand, if such relative position information is not registered in the storage device 52, the process proceeds to step S703.

[0021] In step S703, the controller 50 causes the transport robot 20 to start the transport process of the reticle assembly RA. Specifically, the controller 50 controls the transport robot 20 to start the transport of the reticle assembly RA from the supply source 10 (e.g., a cassette, a loader) of the reticle assembly RA toward the measurement area 41 of the measuring instrument 40. Although the following description is omitted, it is assumed that the controller 50 performs the transport process of the reticle assembly RA according to the above description. In step S704, the controller 50 controls the measuring instrument 40 so that the measuring instrument 40 measures the relative position of the pellicle frame 2 with respect to the reticle 1 when passing through the measurement area 41 of the measuring instrument 40, and obtains relative position information regarding the relative position (measurement step). In step S710, the controller 50 obtains the relative position information stored in the storage device 52 based on the identification information ID obtained in step S701 (i.e., the relative position information associated with the identification information ID obtained in step S701).

[0022] In step S705, the controller 50 obtains a corrected target position TP' by correcting the transfer target position TP based on relative position information corresponding to the relative position of the pellicle frame 2 with respect to the reticle 1 (correction step). In step S706, the controller 50 controls the transfer robot 20 so that the reticle assembly RA is transferred to the corrected target position TP' with the pellicle frame 2 positioned below the reticle 1 (transfer step). Then, once the reticle assembly RA has been transferred to the corrected target position TP', in step S707, the controller 50 controls the transfer robot 20 to end the transfer of the reticle assembly RA.

[0023] In step S708, the controller 50 causes the reticle support mechanism 32 of the reticle stage mechanism 30 to support the reticle assembly RA. In step S709, the controller 50 controls a process of exposing the substrate S using the reticle assembly RA (exposure process). The substrate S may have a plurality of shot areas, and each shot area may be exposed. Also, a plurality of substrates S may be exposed.

[0024] Hereinafter, an article manufacturing method for manufacturing an article by applying the above-mentioned exposure method will be described. The article may be, for example, a semiconductor device, a microdevice such as MEMS, or other articles. The article manufacturing method may include a lithography process for exposing a substrate to light according to the exposure method illustrated in FIG. 7 to form a pattern on the substrate, and a processing process for processing the substrate that has undergone the lithography process to obtain an article. The processing process may include, for example, an etching process, an ion implantation process, a dicing process, a sealing process, and the like.

[0025] The present disclosure includes the following disclosures. (Item 1) 1. An exposure apparatus for exposing a substrate using a reticle assembly having a reticle, a pellicle frame, and a pellicle, comprising: a measuring device that measures a relative position of the pellicle frame with respect to the reticle; a transfer robot that transfers the reticle assembly in a state where the pellicle frame is positioned under the reticle; a controller that corrects a transfer target position of the reticle assembly by the transfer robot based on the relative position measured by the measuring device; a reticle support mechanism for receiving the reticle assembly transferred to the transfer target position; the reticle support mechanism includes two reticle support parts spaced apart from each other, and supports a lower surface of the reticle by the two reticle support parts such that the pellicle frame is positioned between the two reticle support parts; An exposure apparatus comprising: (Item 2) the controller corrects the transfer target position based on the relative position measured by the measuring device so that the reticle assembly is transferred in a state in which the pellicle frame is separated from the two reticle supports. 2. An exposure apparatus according to item 1, (Item 3) the reticle support mechanism is provided on a reticle stage mechanism that holds and drives the reticle; 3. The exposure apparatus according to item 2, (Item 4) The reticle support mechanism is provided in a reticle inspection apparatus. 3. The exposure apparatus according to item 2, (Item 5) the controller stores in a storage device relative position information corresponding to the relative position measured by the measuring device and an identifier of the reticle assembly in association with each other; 5. The exposure apparatus according to any one of items 1 to 4. (Item 6) when the relative position information associated with the identifier has already been stored in the storage device, the controller does not cause the measuring instrument to measure the reticle assembly, and corrects the transfer target position based on the relative position information stored in the storage device. 6. The exposure apparatus according to item 5, (Item 7) the storage device is shared by a plurality of exposure apparatuses; 7. The exposure apparatus according to item 6, (Item 8) the transfer robot transfers the reticle assembly so that the reticle assembly passes through a measurement region of the measurement instrument; the measurement device measures the relative position when the reticle assembly being transferred by the transfer robot passes through the measurement area; 8. The exposure apparatus according to any one of items 1 to 7, (Item 9) the transfer robot transfers the reticle assembly from a supply source of the reticle assembly through the metrology region to the reticle support mechanism; the controller controls the transport robot so that the reticle assembly is transported along a preset transport path until the reticle assembly passes through the measurement area, and corrects the transport target position based on the relative position measured by the measuring device in the measurement area. 9. The exposure apparatus according to item 8, (Item 10) the metrology instrument measures the relative position while the reticle assembly moves through the metrology region; 10. The exposure apparatus according to item 9, (Item 11) a substrate stage mechanism that holds and drives the substrate; a projection optical system that projects a pattern of the reticle of the reticle assembly supported by the reticle support mechanism onto the substrate; a chamber that accommodates the reticle support mechanism, the substrate stage mechanism, the projection optical system, the measuring instrument, and the transfer robot, the measuring instrument measures the relative position of the pellicle frame with respect to the reticle, the reticle assembly being loaded into the chamber; 11. The exposure apparatus according to any one of items 1 to 10, (Item 12) 1. An exposure method for exposing a substrate using a reticle assembly having a reticle, a pellicle frame, and a pellicle, comprising: a measuring step of measuring a relative position of the pellicle frame with respect to the reticle; a correction step of correcting a transfer target position of the reticle assembly based on the relative position to obtain a corrected target position; a transport step of transporting the reticle assembly to the correction target position in a state where the pellicle frame is positioned under the reticle; a supporting step in which a reticle stage mechanism supports the reticle assembly transported to the correction target position; exposing the substrate using the reticle assembly held by the reticle stage mechanism; the reticle stage mechanism includes two reticle supports spaced apart from each other, and supports a lower surface of the reticle by the two reticle supports such that the pellicle frame is located between the two reticle supports. 13. An exposure method comprising: (Item 13) In the correcting step, the transfer target position is corrected based on the relative positions so that the reticle assembly is transferred in a state in which the pellicle frame is separated from the two reticle supports. 13. The exposure method according to item 12, (Item 14) a storing step of storing in a storage device relative position information corresponding to the relative position measured in the measuring step and an identifier of the reticle assembly in association with each other. 14. The exposure method according to item 12 or 13, (Item 15) the storage device is a storage device shared by a plurality of exposure apparatuses; 15. The exposure method according to item 14, (Item 16) In the transporting step, the reticle assembly is transported so as to pass through a measurement area in which the measurement step is performed; In the measurement step, the relative position is measured when the reticle assembly passes through the measurement area. 16. The exposure method according to any one of items 12 to 15. (Item 17) the transport step transports the reticle assembly from a supply source of the reticle assembly to the correction target position via the measurement region; In the transport step, the reticle assembly is transported along a preset transport path until the reticle assembly passes through the measurement area, and the transport target position is corrected based on the relative position measured in the measurement step to obtain the corrected target position. 17. The exposure method according to item 16, (Item 18) In the measurement step, the relative position is measured while the reticle assembly is moving through the measurement area. 18. The exposure method according to item 17, (Item 19) the measuring step measures the relative position by a measuring instrument arranged in a chamber that houses the reticle stage mechanism, the substrate stage mechanism, and the projection optical system; 19. The exposure method according to any one of items 12 to 18, (Item 20) A lithography process of exposing a substrate to light according to the exposure method according to any one of items 12 to 19 to form a pattern on the substrate; a processing step for processing the substrate that has undergone the lithography step to obtain an article; A method for manufacturing an article, comprising:

[0026] The invention is not limited to the above-described embodiments, and various modifications and variations are possible without departing from the spirit and scope of the invention. Accordingly, the following claims are appended to apprise the public of the scope of the invention. [Explanation of symbols]

[0027] 1: reticle, 2: pellicle frame, 3: pellicle, RA: reticle assembly, 40: inspector, 32: reticle support mechanism, 50: controller

Claims

1. An exposure apparatus for exposing a substrate using a reticle, a pellicle frame, and a reticle assembly having a pellicle, A measuring instrument for measuring the relative position of the pellicle frame with respect to the reticle, A transport robot that transports the reticle assembly with the pellicle frame positioned below the reticle, A controller that corrects the target position of the reticle assembly being transported by the transport robot based on the relative position measured by the measuring instrument, An exposure apparatus characterized by comprising:

2. A reticle support mechanism that receives the reticle assembly transported to the transport target position, The reticle support mechanism includes two reticle support parts spaced apart from each other, and the lower surface of the reticle is supported by the two reticle support parts such that the pellicle frame is positioned between the two reticle support parts. The exposure apparatus according to feature 1.

3. The controller corrects the transport target position based on the relative position measured by the measuring instrument so that the reticle assembly is transported with the pellicle frame separated from the two reticle support portions. The exposure apparatus according to feature 2.

4. The reticle support mechanism is provided in the reticle stage mechanism that holds and drives the reticle. The exposure apparatus according to feature 3.

5. The aforementioned reticle support mechanism is provided in the reticle inspection device. The exposure apparatus according to feature 3.

6. The controller stores in a memory device the relative position information corresponding to the relative position measured by the measuring instrument and the identifier of the reticle assembly in association with each other. The exposure apparatus according to feature 1.

7. If the controller has already stored the relative position information associated with the identifier in the storage device, it will not allow the measuring instrument to measure the reticle assembly, but will correct the transport target position based on the relative position information stored in the storage device. The exposure apparatus according to feature 6.

8. The aforementioned storage device is shared by multiple exposure apparatuses. The exposure apparatus according to claim 7.

9. The transport robot transports the reticle assembly so that it passes through the measurement area of ​​the measuring instrument. The measuring instrument measures the relative position when the reticle assembly being transported by the transport robot passes through the measurement area. The exposure apparatus according to feature 2.

10. The transport robot transports the reticle assembly from the reticle assembly supply source, through the measurement area, to the reticle support mechanism. The controller controls the transport robot so that the reticle assembly is transported according to a preset transport path until the reticle assembly passes through the measurement area, and corrects the transport target position based on the relative position measured by the measuring instrument in the measurement area. The exposure apparatus according to feature 9.

11. The measuring instrument measures the relative position while the reticle assembly is moving through the measurement area. The exposure apparatus according to claim 10.

12. A substrate stage mechanism that holds and drives the aforementioned substrate, A projection optical system for projecting the pattern of the reticle of the reticle assembly, which is supported by the reticle support mechanism, onto the substrate, The system further comprises the substrate stage mechanism, the projection optical system, the measuring instrument, and a chamber housing the transport robot, The measuring instrument measures the relative position of the pellicle frame to the reticle, with respect to the reticle assembly that has been brought into the chamber. The exposure apparatus according to any one of claims 2 to 5.

13. An exposure method for exposing a substrate using a reticle, a pellicle frame, and a reticle assembly having a pellicle, A measurement step of measuring the relative position of the pellicle frame with respect to the reticle, A correction step to obtain a corrected target position by correcting the transport target position of the reticle assembly based on the relative position, A transport step of transporting the reticle assembly to the correction target position while the pellicle frame is positioned below the reticle, The process includes an exposure step of exposing the substrate using the reticle assembly, A method of exposure characterized by the following features.

14. A support step in which the reticle stage mechanism supports the reticle assembly that has been transported to the correction target position, The reticle stage mechanism includes two reticle support parts spaced apart from each other, and the lower surface of the reticle is supported by the two reticle support parts such that the pellicle frame is positioned between the two reticle support parts. The exposure method according to feature 13.

15. In the correction step, the transport target position is corrected based on the relative position so that the reticle assembly is transported with the pellicle frame separated from the two reticle support parts. The exposure method according to feature 14.

16. The process further includes a storage step of associating relative position information corresponding to the relative position measured in the measurement step with the identifier of the reticle assembly and storing it in a storage device. The exposure method according to feature 13.

17. The aforementioned storage device is a storage device shared by multiple exposure devices. The exposure method according to feature 16.

18. In the transport process, the reticle assembly is transported so as to pass through the measurement area where the measurement process is performed. In the measurement step, the relative position is measured as the reticle assembly passes through the measurement area. The exposure method according to feature 13.

19. In the transport process, the reticle assembly is transported from the source of the reticle assembly, through the measurement area, to the correction target position. In the transport step, the reticle assembly is transported according to a predetermined transport path until it passes through the measurement area, and the transport target position is corrected based on the relative position measured in the measurement step to obtain the corrected target position. The exposure method according to feature 18.

20. In the measurement step, the relative position is measured while the reticle assembly moves through the measurement area. The exposure method according to feature 19.

21. The measurement step involves measuring the relative position using a measuring instrument placed inside a chamber housing the substrate stage mechanism and the projection optical system. The exposure method according to feature 13.

22. A lithography step of exposing a substrate according to the exposure method described in any one of claims 13 to 21 to form a pattern on the substrate, A processing step to obtain an article by processing the substrate that has undergone the lithography process, A method for manufacturing articles, characterized by including the following:

Images