Exposure method, exposure device and manufacturing method of article

Abstract

To provide a technique advantageous for improving a throughput in an exposure treatment conducting an intermittent light exposure to one exposure region.SOLUTION: An exposure method conducts an intermittent light exposure that exposes a shot region of a substrate intermittently multiple times. The exposure method includes: a first step of switching a shutter for opening / closing an optical path of exposure light from a shading state to a light transmissive state to start a first light exposure of a first shot region; and a second step of switching the shutter from the light transmissive state to the shading state to end the first light exposure, and thereafter switching the shutter back to the light transmissive state again to start a second light exposure of the first shot region. In the second step, the shutter is not made still.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to an exposure method, an exposure apparatus, and an article manufacturing method. [Background technology]

[0002] Exposure apparatuses that expose substrates (glass plates, wafers, etc.) are used in the manufacture of devices (semiconductor devices, magnetic storage media, liquid crystal display elements, etc.), color filters, hard disks, etc. Exposure apparatuses expose substrates by, for example, irradiating an original (reticle, mask) on which a pattern is formed with light, and irradiating the substrate with the light from the original via a projection optical system.

[0003] Patent Document 1 discloses an exposure method in which exposure is intermittently performed on an area to be exposed (shot area) on a substrate in order to prevent an effect on the optical system of an exposure device caused by a rise in lens temperature due to exposure. Here, intermittently performing exposure on a shot area means repeatedly exposing and interrupting exposure of the shot area. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Patent No. 2844600 Summary of the Invention [Problem to be solved by the invention]

[0005] When exposure is performed intermittently on a shot area on a substrate, there are periods during which exposure is interrupted, which lengthens the period of exposure processing, and this may inhibit improvement in throughput. Therefore, it is desirable to improve throughput by shortening the period during which exposure is interrupted in an exposure process that performs intermittent exposure.

[0006] The present invention provides a technique that is advantageous in improving the throughput of an exposure process that performs intermittent exposure on one shot area. [Means for solving the problem]

[0007] According to one aspect of the present invention, there is provided an exposure method for performing intermittent exposure, in which a shot area of ​​a substrate is intermittently exposed multiple times, comprising: a first step of starting a first exposure of a first shot area by changing a shutter, for opening and closing an optical path of exposure light, from a light-blocking state to a light-passing state; and a second step of ending the first exposure by changing the shutter from the light-passing state to the light-blocking state, and then starting a second exposure of the first shot area by changing the shutter back to the light-passing state, wherein the shutter is not stopped during the second step. Effect of the Invention

[0008] According to the present invention, it is possible to provide a technique that is advantageous in improving the throughput of an exposure process in which intermittent exposure is performed on one exposure area. [Brief description of the drawings]

[0009] [Figure 1] FIG. 1 is a diagram showing the configuration of an exposure apparatus. [Diagram 2] FIG. 4 is a diagram showing the configuration of a light blocking mechanism. [Diagram 3] 1A and 1B are diagrams showing examples of a plurality of shot areas on a substrate. [Figure 4] FIG. 11 is a diagram showing an exposure process according to Comparative Example 1. [Diagram 5] 11A and 11B are diagrams showing an exposure process including intermittent exposure according to Comparative Example 2. [Figure 6] 4A to 4C are views showing an exposure process according to the first embodiment. [Figure 7] 6A to 6C are views showing an exposure process according to Modification 1 of the first embodiment. [Figure 8] 10A to 10C are views showing an exposure process according to Modification 2 of the first embodiment. [Figure 9] 10A to 10C are views showing an exposure process according to a second embodiment. [Figure 10] 13A to 13C are views showing an exposure process according to a modified example of the second embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0010] Hereinafter, the embodiments will be described in detail with reference to the attached drawings. Note that the following embodiments do not limit the invention according to the claims. Although the embodiments describe a number of features, not all of these features are essential to the invention, and the features may be combined in any manner. Furthermore, in the attached drawings, the same reference numbers are used for the same or similar configurations, and duplicated descriptions are omitted.

[0011] First Embodiment First, an exposure apparatus 100a according to the first embodiment will be described. Fig. 1 is a diagram showing the exposure apparatus 100a according to the first embodiment. The exposure apparatus 100a may include, for example, a light source unit 101, a light blocking mechanism 102 (switching unit), an illumination optical system 103, an original holding unit (not shown), a projection optical system 105, a stage 108, and a control unit 110. Note that in this specification and the accompanying drawings, the direction along the optical axis 109 of the projection optical system 105 is defined as the Z-axis direction, and two directions perpendicular to each other along a plane perpendicular to the Z-axis direction are defined as the X-axis direction and the Y-axis direction.

[0012] The light source unit 101 irradiates light for exposing the substrate 107. The light source unit 101 is an ultra-high pressure mercury lamp, a solid-state light source such as an LED or an LD, an ArF excimer laser, a KrF excimer laser, or the like. The light source unit 101 may be configured separately from the exposure apparatus 100a.

[0013] The light blocking mechanism 102 is a mechanism for switching between blocking and passing light from the light source unit 101, and may include, for example, a shutter. The shutter may include a light blocking member 102a as a light blocking portion for blocking light from the light source unit 101, and a light passing portion 102b for passing light from the light source unit 101 (see FIG. 2). The light blocking mechanism 102 further includes a drive unit 102c for driving the shutter. The drive unit 102c drives the shutter so as to place the light blocking member 102a on the optical path of the exposure light to put the shutter in a light blocking state, and to place the light passing portion 102b on the optical path to put the shutter in a light passing state. In the example of FIG. 1, the light blocking mechanism 102 is disposed on the optical path between the light source unit 101 and the illumination optical system 103, but may be disposed in another location as long as it can block light from the light source unit 101.

[0014] Here, the movement of the light blocking member 102a will be described. Fig. 2 is a diagram showing the positional relationship between the light blocking member 102a according to this embodiment and the light beam 101a of light from the light source unit 101. In the example of Fig. 2, the driving unit 102c rotates (moves in the rotation direction) the light blocking member 102a to switch between blocking and passing the light from the light source unit 101. In one example, three light blocking members 102a are arranged at intervals of 120 degrees, and the driving unit 102c rotates the light blocking member 102a with the center of the light blocking member 102a as the rotation axis.

[0015] FIG. 2(a) shows a state where the light shielding member 102a is in a position where it blocks the light from the light source unit 101. As shown in FIG. 2(a), the light from the light source unit 101 is blocked by positioning any of the three light shielding members 102a so as to overlap the light beam 101a. Also, FIG. 2(b) shows a state where the light passing portion 102b is positioned on the optical path of the exposure light from the light source unit 101. As shown in FIG. 2(b), the light passing portion 102b between the two light shielding members 102a is positioned on the optical path, thereby passing the light from the light source unit 101. In other words, the light shielding members 102a are positioned so that none of the three light shielding members 102a overlaps the light beam 101a of the light from the light source unit 101, thereby passing the light from the light source unit 101.

[0016] Here, an example of the light blocking mechanism 102 in which the light blocking member 102a rotates to switch between passing and blocking light has been described, but the light blocking mechanism may be one in which the light blocking member moves back and forth along a predetermined path to switch between passing and blocking light. In addition, the number of light blocking parts of the light blocking member 102a and the arrangement of the light blocking parts are not limited to the example shown in FIG.

[0017] Returning to the explanation of Fig. 1, the illumination optical system 103 shapes the light beam from the light source unit 101 into a predetermined shape suitable for exposure and illuminates the original 104. The illumination optical system 103 may include lenses, mirrors, optical integrators, diaphragms, etc. to provide a function of uniformly illuminating the original 104 and a function of polarized illumination. The original 104 is, for example, a quartz original (reticle, mask) on which a circuit pattern to be transferred to a substrate 107 is formed, and is held and moved by an original holding unit (not shown).

[0018] The original plate holding unit holds the original plate 104 and moves in the X-axis, Y-axis, and Z-axis directions and in rotational directions around each axis. The original plate holding unit holds the original plate 104 via an original plate holding mechanism (not shown) that holds the original plate 104, and is connected to an original plate moving mechanism (not shown). The original plate moving mechanism is composed of a linear motor or the like, and moves the original plate 104 by driving the original plate holding unit in the X-axis, Y-axis, and Z-axis directions and in rotational directions around each axis.

[0019] The projection optical system 105 projects the pattern of the original 104 illuminated by the illumination optical system 103 onto the substrate 107, thereby exposing the substrate 107. The projection optical system 105 has a function of forming an image of a light beam from an object plane onto an image plane, and in this embodiment, forms an image of diffracted light that has passed through the pattern formed on the original 104 onto the substrate 107. The projection optical system 105 can be, for example, an optical system including multiple lens elements, multiple lens elements and at least one concave mirror (catadioptric optical system), or an optical system including multiple lens elements and at least one diffractive optical element such as a kinoform.

[0020] Stage 108 (moving section) holds substrate 107 and moves in the X-axis direction, Y-axis direction, Z-axis direction, and rotational directions around each axis. Stage 108 is configured to hold substrate 107 using a substrate holding mechanism (not shown) that holds substrate 107 and to be able to change the position and attitude of substrate 107. Like the original holding section, stage 108 uses a substrate moving mechanism (not shown) formed of a linear motor or the like to move substrate 107 in the X-axis direction, Y-axis direction, Z-axis direction, and rotational directions around each axis. In addition, photosensitive agent 106 (resist) is applied to substrate 107.

[0021] Control unit 110 is configured, for example, by a computer (information processing device) including a CPU, memory, etc. and connected to enable communication, and performs overall control of each part of exposure apparatus 100a according to a program stored in a storage unit. Control unit 110 may also be configured by multiple computers including a board computer for individually controlling each part of exposure apparatus 100a.

[0022] Exposure apparatus 100a is an apparatus that performs a process (exposure process) of forming a pattern on substrate 107 according to, for example, a step-and-repeat system. Exposure apparatus 100a may also be an apparatus that performs a process of forming a pattern on substrate 107 according to a step-and-scan system or other system.

[0023] Here, a case where exposure apparatus 100a performs exposure processing according to the step-and-repeat method will be described. FIG. 3 is a diagram showing an example of a plurality of shot areas (exposure areas) on substrate 107. In the example of FIG. 3, 21 exposure areas a to u exist on substrate 107, but this is not limiting, and the size and number of the exposure areas can be set arbitrarily. Also, exposure apparatus 100a starts exposure processing from exposure area a, for example, and performs exposure processing in the order of exposure areas a, b, c, ..., u. Note that this order is one example, and exposure processing can be performed in any order.

[0024] The control unit 110 first moves the stage 108 so that the exposure area a of the substrate 107 is positioned on the optical axis 109 of the projection optical system 105. Then, the control unit 110 moves the light blocking member 102a to a position that passes the light from the light source unit 101. As a result, the light from the light source unit 101 illuminates the original 104 via the illumination optical system 103. Then, the pattern of the illuminated original 104 is projected onto the substrate 107 via the projection optical system 105, and the exposure area a is exposed. After the exposure area a is exposed with a predetermined exposure amount, the control unit 110 moves the light blocking member 102a of the light blocking mechanism 102 to a position where it blocks the light from the light source unit 101. Thus, the exposure process of the exposure area a is completed. Next, the control unit 110 moves the stage 108 so that the exposure area b of the substrate 107 is positioned on the optical axis 109 of the projection optical system 105. Then, the exposure process of the exposure area b is performed in the same manner as the exposure area a. Moreover, the exposure process is similarly carried out for the exposure regions subsequent to the exposure region c.

[0025] Comparative Example 1 Next, an exposure process in which the exposure area is continuously exposed will be described as Comparative Example 1. FIG. 4 is a diagram showing an exposure process according to Comparative Example 1. In FIG. 4(A), the horizontal axis represents time t, and the vertical axis represents the state θ of the light blocking mechanism 102. In FIG. 4(B), the horizontal axis represents time t, and the vertical axis represents the driving speed (rotation speed) v of the light blocking mechanism 102. The state θ includes a light blocking state θ1 in which the light blocking mechanism 102 blocks all of the light from the light source unit 101, and a light passing state θ2 in which the light blocking mechanism 102 passes all of the light from the light source unit 101. The state θ also includes an intermediate state (θ1<θ<θ2) in which the light blocking mechanism 102 blocks some of the light from the light source unit 101 and passes the other light. The light blocking state θ1 is a state in which the light blocking member 102a is in a position where it blocks all of the light from the light source unit 101, as shown in FIG. 2(a). 2(b), the light passing state θ2 is a state in which the light blocking member 102a is in a position that passes all of the light from the light source unit 101. The intermediate state is a state in which the light blocking member 102a is in a position that blocks a portion of the light from the light source unit 101 and passes the remaining light.

[0026] During the period (movement (a)) in which the stage 108 moves so that the exposure area a is positioned on the optical axis 109, the light blocking mechanism 102 starts to transition from the light blocking state θ1 to the light passing state θ2. For this state transition, the light blocking mechanism 102 performs acceleration drive and constant speed drive. During the constant speed drive, when the light blocking member 102a reaches a position that allows complete passage of light from the light source 101, the exposure period (exposure (a)) of the exposure area a begins. During the exposure period (exposure (a)), the light blocking mechanism 102 enters the light passing state θ2. At this time, the light blocking mechanism 102 performs deceleration drive to stop the light blocking member 102a.

[0027] At the timing when the exposure period (exposure (a)) is completed, the light blocking mechanism 102 starts transitioning from the light passing state θ2 to the light blocking state θ1. For this state transition, the light blocking mechanism 102 performs acceleration drive and constant speed drive. When the light blocking member 102a reaches a position where it completely blocks the light from the light source 101, the exposure period (exposure (a)) ends.

[0028] Thereafter, during a period (movement (b)) in which the stage 108 moves so that the exposure region b is positioned on the optical axis 109, the light blocking mechanism 102 is in the light blocking state θ1. At this time, the light blocking mechanism 102 performs deceleration driving to stop the light blocking member 102a.

[0029] In synchronization with the start of exposure of exposure region b, the light blocking mechanism 102 starts transitioning from the light blocking state θ1 to the light passing state θ2. For this state transition, the light blocking mechanism 102 performs acceleration drive and constant speed drive. During constant speed drive, when the light blocking member 102a reaches a position that allows complete passage of light from the light source 101, the exposure period (exposure (b)) of exposure region b starts. During the exposure period (exposure (b)), the light blocking mechanism 102 is in the light passing state θ2. At this time, the light blocking mechanism 102 performs deceleration drive to stop the light blocking member 102a.

[0030] At the timing when the exposure period (exposure (b)) is completed, the light blocking mechanism 102 starts transitioning from the light passing state θ2 to the light blocking state θ1. For this state transition, the light blocking mechanism 102 performs acceleration driving and constant speed driving. Thereafter, the movement of the stage 108 for exposing the exposure area c and the exposure processing of the exposure area c are performed in the same manner.

[0031] Here, the exposure of the substrate 107 coated with the photosensitive agent 106 containing a radical polymerization type curing resin will be described. The photosensitive agent 106 containing a radical polymerization type curing resin is cured by absorbing the light irradiated to the photosensitive agent 106 and undergoing a radical reaction. In addition, the concentration of radicals generated by the radical reaction in the photosensitive agent 106 is determined according to the illuminance of the light irradiated to the photosensitive agent 106. In addition, since the irradiated light is absorbed by the photosensitive agent 106, a difference in radical concentration (concentration gradient) occurs between the upper layer and the lower layer of the photosensitive agent 106. Therefore, the upper layer of the photosensitive agent 106 is easily cured, but the lower layer is difficult to cure. Therefore, a difference occurs in the amount of the photosensitive agent 106 cured between the upper layer and the lower layer of the photosensitive agent 106, and the accuracy of the pattern profile of the pattern formed by the cured photosensitive agent 106 may decrease.

[0032] Therefore, in order to prevent the accuracy of the pattern profile from decreasing, it is possible to perform intermittent exposure on the exposure area of ​​the substrate 107. Here, performing intermittent exposure on the exposure area means interrupting exposure midway during the exposure process for one exposure area and repeating the exposure. Here, interrupting exposure can include not only not irradiating the exposure area with light, but also irradiating light with reduced illuminance to such an extent that the photosensitive agent 106 on the exposure area is not exposed to light. In other words, performing intermittent exposure on the exposure area includes providing the following periods in the period in which exposure process is performed for one exposure area: (1) an exposure period in which the exposure area is irradiated with light and exposed, and (2) An interruption period during which exposure is interrupted by not irradiating the exposure area with light (or by reducing the illuminance of light irradiating the exposure area).

[0033] Moreover, in order to improve the accuracy of the pattern profile, it is important to be able to control the interruption period in accordance with the characteristics of the photosensitive agent 106 .

[0034] Comparative Example 2 As Comparative Example 2, an exposure process in which exposure is performed intermittently will be described. First, an exposure process in which exposure is performed intermittently by the light shielding mechanism 102 will be described. FIG. 5 is a diagram showing an exposure process according to Comparative Example 2. The relationship between the horizontal and vertical axes in FIG. 5 is the same as in FIG. 4. That is, in FIG. 5(A), the horizontal axis represents time t, and the vertical axis represents the state θ of the light shielding mechanism 102. In FIG. 5(B), the horizontal axis represents time t, and the vertical axis represents the drive speed (rotation speed) v of the light shielding mechanism 102. Note that, in the example of FIG. 5, an exposure process in which one exposure area is intermittently exposed twice will be described, but the number of times one exposure area is exposed is not limited to two times.

[0035] During a period (movement (a)) in which the stage 108 moves so that the exposure area a is positioned on the optical axis 109, the light blocking mechanism 102 starts to transition from the light blocking state θ1 to the light passing state θ2. For this state transition, the light blocking mechanism 102 performs acceleration drive and constant speed drive. During the constant speed drive, when the light blocking member 102a reaches a position that allows the light from the light source 101 to pass completely, a first exposure period (exposure 1(a)) of the exposure area a starts. During the first exposure period (exposure 1(a)), the light blocking mechanism 102 enters the light passing state θ2. At this time, the light blocking mechanism 102 performs deceleration drive to stop the light blocking member 102a.

[0036] At the timing when the first exposure period (exposure 1(a)) is completed, the light blocking mechanism 102 starts to transition from the light passing state θ2 to the light blocking state θ1. For this state transition, the light blocking mechanism 102 performs acceleration drive and constant speed drive. When the light blocking member 102a reaches a position where it completely blocks the light from the light source 101, the first exposure period (exposure 1(a)) ends and an interruption period (interruption(a)) during which the exposure area a is not exposed begins. During the interruption period (interruption(a)), the light blocking mechanism 102 is in the light blocking state θ1. At this time, the light blocking mechanism 102 performs deceleration drive to stop the light blocking member 102a.

[0037] At the timing when the interruption period (interruption (a)) is completed, the light blocking mechanism 102 starts to transition from the light blocking state θ1 to the light passing state θ2. For this state transition, the light blocking mechanism 102 performs acceleration drive and constant speed drive. During the constant speed drive, when the light blocking member 102a reaches a position that allows the light from the light source 101 to pass completely, a second exposure period (exposure 2(a)) begins in which the exposure area a is exposed for the second time. During the second exposure period (exposure 2(a)), the light blocking mechanism 102 enters the light passing state θ2. At this time, the light blocking mechanism 102 performs deceleration drive to stop the light blocking member 102a.

[0038] At the same time as the second exposure period (exposure 2(a)) is completed, the light blocking mechanism 102 starts to transition from the light passing state θ2 to the light blocking state θ1. For this state transition, the light blocking mechanism 102 performs acceleration driving and constant speed driving. Thereafter, similarly, movement of the stage 108 for exposing the exposure area b and intermittent exposure processing of the exposure area b are performed.

[0039] 5, intermittent exposure is performed on one exposure area by moving the light blocking member 102a of the light blocking mechanism 102. In this case, when driving the light blocking mechanism 102, control is performed in accordance with accelerated, constant speed, and decelerated driving, and there is a limit to shortening the interruption period during which exposure is interrupted due to restrictions on the performance of the light blocking mechanism 102, such as speed restrictions.

[0040] (Example) As described below, in this embodiment, in an exposure apparatus that performs intermittent exposure in which each of multiple shot areas of a substrate is exposed intermittently multiple times, drive control of a light blocking mechanism 102 is realized that is advantageous for shortening the interruption period.

[0041] Fig. 6 is a diagram showing an exposure process according to this embodiment. The relationship between the horizontal and vertical axes in Fig. 6 is the same as in Fig. 4 and Fig. 5. That is, in Fig. 6(A), the horizontal axis represents time t, and the vertical axis represents the state θ of the light blocking mechanism 102. In Fig. 6(B), the horizontal axis represents time t, and the vertical axis represents the drive speed (rotation speed) v of the light blocking mechanism 102. Note that, in the example of Fig. 6, an exposure process in which one exposure area is intermittently exposed twice is described, but the number of times that one exposure area is exposed is not limited to two times.

[0042] During a period (movement (a)) in which the stage 108 moves so that the exposure area a (first shot area) is positioned on the optical axis 109, the light blocking mechanism 102 starts to transition from the light blocking state θ1 to the light passing state θ2. For this state transition, the light blocking mechanism 102 performs acceleration drive and constant speed drive. During the constant speed drive, when the light blocking member 102a reaches a position that allows the light from the light source 101 to pass completely, a first exposure period (exposure 1(a)), which is a period of the first exposure of the exposure area a, starts (first step). During the first exposure period (exposure 1(a)), the light blocking mechanism 102 is in the light passing state θ2. At this time, the light blocking mechanism 102 performs deceleration drive to stop the light blocking member 102a.

[0043] At the same time as the first exposure period (exposure 1(a)) is completed, the light blocking mechanism 102 starts to transition from the light passing state θ2 to the light blocking state θ1. For this state transition, the light blocking mechanism 102 performs accelerated driving and constant speed driving. When the light blocking member 102a reaches a position where it completely blocks the light from the light source 101, the first exposure period (exposure 1(a)) ends and an interruption period (interruption(a)) in which the exposure area a is not exposed begins.

[0044] In this embodiment, even if the light blocking mechanism 102 is in the light blocking state θ1 during the interruption period (interruption (a)), the light blocking member 102a is not stopped, and the constant speed drive continues as it is. This constant speed motion moves the light blocking mechanism 102 from the light blocking state θ1 back to the light passing state θ2. During this constant speed drive, when the light blocking member 102a reaches a position that completely passes the light from the light source 101, the interruption period (interruption (a)) ends, and a second exposure period (exposure 2(a)), which is a period of the second exposure of the exposure area a, starts (second step). During the second exposure period (exposure 2(a)), the light blocking mechanism 102 is in the light passing state θ2. At this time, the light blocking mechanism 102 performs deceleration drive to stop the light blocking member 102a.

[0045] At the same time as the second exposure period (exposure 2(a)) is completed, the light blocking mechanism 102 starts to transition from the light passing state θ2 to the light blocking state θ1. For this state transition, the light blocking mechanism 102 performs acceleration drive and constant speed drive. When the light blocking member 102a reaches a position where it completely blocks the light from the light source 101, the second exposure period (exposure 2(a)) ends.

[0046] Thereafter, during a movement step (movement (b)) in which the stage 108 moves so that the exposure region b (second shot region) is positioned on the optical axis 109, the light blocking mechanism 102 is in the light blocking state θ1. Similarly, exposure processes for the exposure region b and onward are performed.

[0047] In this manner, in this embodiment, the method of driving and controlling the light blocking mechanism 102 may differ between the period in which the stage 108 moves between exposure processes of multiple exposure regions and the period in which exposure process is performed intermittently on one exposure region. In particular, the exposure method for performing intermittent exposure in this embodiment may include the following steps. (1) a first step of starting a first exposure of a first shot area by changing a shutter for opening and closing an optical path of exposure light from a light blocking state to a light passing state; and (2) A second step of ending the first exposure by switching the shutter from a light transmitting state to a light blocking state, and then starting a second exposure of the first shot area by switching the shutter back to a light transmitting state. In the second step, the shutter is not stopped. This makes it possible to reduce the number of times that the light blocking mechanism 102 is accelerated or decelerated during an interruption period of the exposure process in one exposure area. This leads to a shortening of the interruption period, and makes it possible to improve the throughput of the exposure process that performs intermittent exposure.

[0048] (Variation 1) Fig. 7 is a diagram showing an exposure process according to Modification 1 of this embodiment. The relationship between the horizontal and vertical axes in Fig. 7 is the same as in Fig. 6. That is, in Fig. 7(A), the horizontal axis represents time t, and the vertical axis represents the state θ of the light blocking mechanism 102. In Fig. 7(B), the horizontal axis represents time t, and the vertical axis represents the drive speed (rotation speed) v of the light blocking mechanism 102. In the example of Fig. 7, an exposure process in which one exposure area is intermittently exposed twice is described, but the number of times that one exposure area is exposed is not limited to two times.

[0049] The example of Fig. 7 is similar to Fig. 6 in that the shutter is not stopped during the interruption (a). That is, in the example of Fig. 7, at the timing when the first exposure period (exposure 1(a)) is completed, the light blocking member 102a is accelerated and driven at a constant speed to transition from the light transmitting state θ2 to the light blocking state θ1.

[0050] In the first modification, there may be a setting step of setting the drive profile of the shutter in the second step of starting the second exposure so that the length of the interruption period (interruption (a)) during which exposure is interrupted between the first exposure (exposure (a)) and the second exposure (exposure (b)) is adjusted. In the example of FIG. 7, the speed of the uniform speed drive in interruption (a) may be different from the speed of the uniform speed drive at the start of exposure 1(a) or the end of exposure 2(a). The drive speed of the uniform speed drive in interruption (a) may be determined based on, for example, the following parameters: (1) the driving distance required to transition from the light transmitting state θ2 in the first exposure period (exposure 1(a)) to the light blocking state θ1 in the interruption period (interruption(a)) and then to the light transmitting state θ2 in the second exposure period (exposure 2(a)); and (2) The timing at which the transition from the light transmitting state θ2 to the light blocking state θ1 begins during the first exposure period (exposure 1(a)), and the timing at which the transition to the light transmitting state θ2 occurs during the second exposure period (exposure 2(a)).

[0051] In addition, in the setting step, the duration of the constant speed drive in the interruption (a) can be set to be different from the duration of the constant speed drive at the start of exposure 1 (a) or the end of exposure 2 (a). For example, as shown in Fig. 7, in the setting step, the speed of the constant speed drive in the interruption period can be set slower than the speed of the constant speed drive in the moving step, and the duration of the constant speed drive in the interruption period can be set longer than the duration of the constant speed drive in the moving step.

[0052] Therefore, according to this example, it becomes possible to appropriately set the interruption period (interruption (a)) between the first exposure period (exposure 1(a)) and the second exposure period (exposure 2(a)) depending on the pattern profile of the material, etc.

[0053] (Variation 2) When there are multiple interruption periods, the length of the first interruption period and the length of the second interruption period may be set independently. FIG. 8 shows an example of an exposure process in which one exposure area is intermittently exposed three times. In FIG. 8(A), the horizontal axis represents time t, and the vertical axis represents the state θ of the light blocking mechanism 102. In FIG. 8(B), the horizontal axis represents time t, and the vertical axis represents the driving speed (rotation speed) v of the light blocking mechanism 102. In the example of FIG. 8, the second exposure (exposure 2(a)) is terminated by changing the shutter from the light passing state θ2 to the light blocking state θ1. Thereafter, the third exposure (exposure 3(a)) of the first shot area is started by changing the shutter to the light passing state θ2 (third process (interruption 2(a))).

[0054] In the third step (interruption 2(a)), the shutter is not stopped. In addition, the drive profile of the shutter may be different between the first interruption period (interruption 1(a)) related to the second step and the second interruption period (interruption 2(a)) related to the third step. For example, as shown in FIG. 8, the drive profile may be set so that the first interruption period (interruption 1(a)) is shorter than the second interruption period (interruption 2(a)). Alternatively, conversely, the drive profile may be set so that the first interruption period (interruption 1(a)) is longer than the second interruption period (interruption 2(a)). This makes it possible to determine a control profile from the perspectives of both the optimal interruption period for the pattern profile and the realization of improved throughput.

[0055] <Second embodiment> In the second embodiment, an example is shown in which either the first exposure period (exposure 1(a)) or the second exposure period (exposure 2(a)) includes a period in which the shutter is stopped in the light passing state θ2, and the other period in which the shutter is not stopped. FIG. 9 is a diagram showing an exposure process according to the second embodiment. The relationship between the horizontal and vertical axes in FIG. 9 is the same as in FIG. 6 and the like. That is, in FIG. 9(A), the horizontal axis represents time t, and the vertical axis represents the state θ of the light blocking mechanism 102. In FIG. 9(B), the horizontal axis represents time t, and the vertical axis represents the drive speed (rotation speed) v of the light blocking mechanism 102.

[0056] During a movement period (movement (a)) in which the stage 108 moves so that the exposure area a is positioned on the optical axis 109, the light blocking mechanism 102 starts to transition from the light blocking state θ1 to the light passing state θ2. For this state transition, the light blocking mechanism 102 performs acceleration driving and constant speed driving. In the intermediate state, a first exposure period (exposure 1(a)) in which the exposure area a is exposed starts.

[0057] In the first exposure period (exposure 1(a)), the light blocking mechanism 102 drives at a constant speed toward the light passing state θ2. In the second embodiment, even if the light passing state θ2 is reached, the light blocking mechanism 102 does not decelerate but continues to drive at a constant speed. Therefore, the light passing state θ2 ends with a constant speed rotational motion, and the light blocking state θ1 is again moved toward the light blocking state θ1. The first exposure period (exposure 1(a)) ends at the timing when the light blocking member 102a completely blocks light, and an interruption period (interruption (a)) begins. Thereafter, the light blocking mechanism 102 enters the light blocking state θ1, but even at this time, the light blocking mechanism 102 continues to drive at a constant speed without decelerating. Therefore, the light blocking state θ1 ends with a constant speed rotational motion, and the light blocking state θ2 is again moved toward the light passing state θ2. The interruption period (interruption (a)) ends at the timing when the light blocking member 102a completely passes light, and a second exposure period (exposure 2(a)) in which the exposure area a is exposed begins.

[0058] Thereafter, in the second exposure period (exposure 2(a)), the light blocking member 102a is in the light transmitting state θ2. At this time, the light blocking mechanism 102 decelerates and drives the light blocking member 102a to stop it. At this time, in the first drive control of the light blocking mechanism 102, the light blocking member 102a has rotated, for example, 180 degrees.

[0059] Next, in synchronization with the completion of the second exposure period (exposure 2(a)), the light blocking mechanism 102 starts driving the light blocking member 102a from the light passing state θ2 to the light blocking state θ1. At this time, the light blocking mechanism 102 performs accelerated driving and constant speed driving. When the light blocking member 102a reaches a position where it completely blocks the light from the light source 101, the second exposure period (exposure 2(a)) ends. At this time, in the second drive control of the light blocking mechanism 102, the light blocking member 102a has rotated by, for example, 60 degrees.

[0060] Next, during a period (movement (b)) in which the stage 108 moves so that the exposure region b is positioned on the optical axis 109, the light blocking member 102a starts to transition from the light transmitting state θ2 to the light blocking state θ1. At this time, the light blocking mechanism 102 performs deceleration driving. Similarly, exposure processing is performed for the exposure region b and onward.

[0061] In this way, in the second embodiment, when performing intermittent exposure processing on one exposure area, the driving of the light blocking mechanism 102 in each exposure is controlled independently. This makes it possible to improve the throughput of the exposure processing that performs intermittent exposure.

[0062] (Modification) When there are a plurality of interruption periods, the driving amount of the light shielding member 102a to be moved by one drive control may be set independently. In the modified example of the second embodiment shown below, any one of the first exposure period (exposure 1(a)), the second exposure period (exposure 2(a)), and the third exposure period (exposure 3(a)) includes a period in which the shutter is stopped in the light passing state θ2. In the remaining periods, the shutter is not stopped. FIG. 10 is a diagram showing an exposure process according to the modified example of the second embodiment. In FIG. 10(A), the horizontal axis represents time t, and the vertical axis represents the state θ of the light shielding mechanism 102. In FIG. 10(B), the horizontal axis represents time t, and the vertical axis represents the drive speed (rotation speed) v of the light shielding mechanism 102. FIG. 10 shows an example of an exposure process in which one exposure area is intermittently exposed three times. In FIG. 10, the first driving of the light blocking mechanism 102 is performed in the first exposure period (exposure 1(a)), the first interruption period (interruption 1(a)), the second exposure period (exposure 2(a)), the second interruption period (interruption 2(a)), and the third exposure period (exposure 3(a)). On the other hand, the second driving of the light blocking mechanism 102 is performed only in the third exposure period (exposure 3(a)) and the movement period (movement (b)). This means that the light blocking member 102a rotates, for example, 300 degrees in the first driving by the light blocking mechanism 102, whereas the light blocking mechanism 102a rotates, for example, 60 degrees in the second driving by the light blocking mechanism 102. Thus, according to this example, in the exposure process in which one exposure area is intermittently exposed multiple times, the driving amount of the light blocking member 102 in each exposure process can be set independently.

[0063] <Embodiment of the article manufacturing method> The article manufacturing method according to the embodiment of the present invention is suitable for manufacturing articles such as microdevices such as semiconductor devices and elements having a fine structure. The article manufacturing method of the present embodiment includes a step of forming a latent image pattern on a photosensitive agent applied to a substrate using the above-mentioned exposure apparatus (a step of exposing the substrate), and a step of developing the substrate on which the latent image pattern has been formed in the step. Furthermore, the manufacturing method includes other well-known steps (oxidation, film formation, deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, etc.). The article manufacturing method of the present embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article compared to conventional methods.

[0064] The disclosure of the present specification includes at least the following exposure method, exposure apparatus, and article manufacturing method. (Item 1) 1. An exposure method for performing intermittent exposure in which a shot area of ​​a substrate is exposed intermittently multiple times, comprising the steps of: a first step of starting a first exposure of a first shot area by changing a shutter for opening and closing an optical path of exposure light from a light blocking state to a light passing state; a second step of ending the first exposure by switching the shutter from the light passing state to the light blocking state, and then starting a second exposure of the first shot area by switching the shutter back to the light passing state; having In the second step, the shutter is not stopped. 13. An exposure method comprising: (Item 2) 2. The exposure method according to item 1, further comprising a setting step of setting a drive profile of the shutter in the second step so that a length of an interruption period during which exposure is interrupted between the first exposure and the second exposure is adjusted. (Item 3) 3. The exposure method according to item 2, wherein in the setting step, a speed of the constant-speed drive during the interruption period and a duration of the constant-speed drive are set. (Item 4) a moving step of moving the stage holding the substrate to expose a second shot area next to the first shot area by changing the shutter from the light passing state to the light blocking state after the second exposure, In the setting step, a speed of the constant speed drive during the interruption period is set slower than a speed of the constant speed drive during the movement step, and a duration of the constant speed drive during the interruption period is set longer than a duration of the constant speed drive during the movement step. 4. The exposure method according to item 3, (Item 5) a third step of ending the second exposure by switching the shutter from the light passing state to the light blocking state, and then starting a third exposure of the first shot area by switching the shutter back to the light passing state; In the third step, the shutter is not stopped, The second step and the third step have different drive profiles for the shutter. 2. The exposure method according to item 1, (Item 6) 5. The exposure method according to any one of items 1 to 4, wherein the period during which the first exposure is performed and the period during which the second exposure is performed each include a period during which the shutter is stopped in the light passing state. (Item 7) 6. The exposure method according to item 5, wherein the period during which the first exposure is performed, the period during which the second exposure is performed, and the period during which the third exposure is performed each include a period during which the shutter is stopped in the light passing state. (Item 8) 5. The exposure method according to any one of items 1 to 4, wherein one of the period during which the first exposure is performed and the period during which the second exposure is performed includes a period during which the shutter is stopped in the light passing state, and the other period during which the shutter is not stopped. (Item 9) 6. The exposure method according to item 5, wherein any one of the periods during which the first exposure is performed, the period during which the second exposure is performed, and the period during which the third exposure is performed includes a period during which the shutter is stopped in the light passing state, and the shutter is not stopped in the remaining periods. (Item 10) An exposure apparatus that performs intermittent exposure by intermittently exposing a shot area of ​​a substrate multiple times, comprising: a shutter having a light passing portion and a light blocking portion; a drive unit that drives the shutter so as to place the light blocking portion on an optical path of exposure light to place the shutter in a light blocking state, and to place the light passing portion on the optical path to place the shutter in a light passing state; A control unit, The control unit is a first step of starting a first exposure of a first shot area by changing the shutter from the light blocking state to the light passing state; a second step of ending the first exposure by switching the shutter from the light passing state to the light blocking state, and then starting a second exposure of the first shot area by switching the shutter back to the light passing state; The control unit does not stop the shutter in the first step. An exposure apparatus comprising: (Item 11) Exposing a substrate according to the exposure method according to any one of items 1 to 9; developing the exposed substrate; and producing an article from the developed substrate.

[0065] The invention is not limited to the above-described embodiments, and various modifications and variations are possible without departing from the spirit and scope of the invention. Accordingly, the following claims are appended to apprise the public of the scope of the invention. [Explanation of symbols]

[0066] 100a: exposure device, 101: light source unit, 102: light shielding mechanism, 103: illumination optical system, 105: projection optical system, 108: stage, 110: control unit

Claims

1. An exposure method for performing intermittent exposure in which a shot area of ​​a substrate is exposed intermittently multiple times, comprising the steps of: a first step of starting a first exposure of a first shot area by changing a shutter for opening and closing an optical path of exposure light from a light blocking state to a light passing state; a second step of ending the first exposure by switching the shutter from the light passing state to the light blocking state, and then starting a second exposure of the first shot area by switching the shutter back to the light passing state; having In the second step, the shutter is not stopped.

13. An exposure method comprising:

2. 2. The exposure method according to claim 1, further comprising a setting step of setting a drive profile of the shutter in the second step so that a length of an interruption period during which exposure is interrupted between the first exposure and the second exposure is adjusted.

3. 3. The exposure method according to claim 2, wherein in said setting step, a speed of the constant-speed drive during said interruption period and a duration of said constant-speed drive are set.

4. a moving step of moving the stage holding the substrate to expose a second shot area next to the first shot area by changing the shutter from the light passing state to the light blocking state after the second exposure, In the setting step, a speed of the constant speed drive during the interruption period is set slower than a speed of the constant speed drive during the movement step, and a duration of the constant speed drive during the interruption period is set longer than a duration of the constant speed drive during the movement step.

4. The exposure method according to claim 3.

5. a third step of ending the second exposure by switching the shutter from the light passing state to the light blocking state, and then starting a third exposure of the first shot area by switching the shutter back to the light passing state; In the third step, the shutter is not stopped, The second step and the third step have different drive profiles for the shutter.

2. The exposure method according to claim 1.

6. 2. The exposure method according to claim 1, wherein each of the period during which the first exposure is performed and the period during which the second exposure is performed includes a period during which the shutter is stationary in the light passing state.

7. 6. The exposure method according to claim 5, wherein the period during which the first exposure is performed, the period during which the second exposure is performed, and the period during which the third exposure is performed each include a period during which the shutter is stationary in the light passing state.

8. 2. The exposure method according to claim 1, wherein one of the period during which the first exposure is performed and the period during which the second exposure is performed includes a period during which the shutter is stopped in the light passing state, and the other period includes a period during which the shutter is not stopped.

9. 6. The exposure method according to claim 5, wherein any one of the periods during which the first exposure is performed, the period during which the second exposure is performed, and the period during which the third exposure is performed includes a period during which the shutter is stopped in the light passing state, and the shutter is not stopped in the remaining periods.

10. An exposure apparatus that performs intermittent exposure by intermittently exposing a shot area of ​​a substrate multiple times, comprising: a shutter having a light passing portion and a light blocking portion; a drive unit that drives the shutter so as to place the light blocking portion on an optical path of exposure light to place the shutter in a light blocking state, and to place the light passing portion on the optical path to place the shutter in a light passing state; A control unit, The control unit is a first step of starting a first exposure of a first shot area by changing the shutter from the light blocking state to the light passing state; a second step of ending the first exposure by switching the shutter from the light passing state to the light blocking state, and then starting a second exposure of the first shot area by switching the shutter back to the light passing state; The control unit controls the drive unit so as not to stop the shutter in the first step. An exposure apparatus comprising:

11. exposing a substrate according to the exposure method of any one of claims 1 to 9; developing the exposed substrate; and producing an article from the developed substrate.

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