Thin film deposition apparatus, thin film deposition method, and manufacturing method

Abstract

To preferably control a position relationship between a member abutting to a substrate and the substrate in a film deposition apparatus for depositing a film with the substrate and a mask aligned.SOLUTION: A film deposition apparatus to be used includes: a chamber for depositing a film on a substrate; a substrate support part that is arranged in the chamber and supports a periphery of the substrate; a mask support part that is arranged in the chamber and supports a mask so as to be parallel to the substrate; first alignment means that adjusts a distance between the substrate and the mask as well as adjusts a relative position in plane with a first member, the substrate, and the mask, the first member being arranged in the chamber through the substrate on an opposite side to the mask and being capable of abutting to the substrate; and second alignment means that adjust a distance between the first member and at least either of the substrate and the mask as well as adjusts a relative position in plane with the first member and at least either of the substrate and the mask.SELECTED DRAWING: Figure 4

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