Pattern exposure device, device manufacturing method, and exposure device

Abstract

To solve the problem of generation of an XY direction difference in imaging characteristics of an edge part when an intensity distribution formed in a pupil Ep is anisotropic.SOLUTION: A pattern exposure device for projection and exposure of a substrate with light, includes: a spatial light modulation element having a plurality of micromirrors selectively driven on the basis of drawn data; an illumination unit for irradiating the spatial light modulation element with illumination light at a predetermined incident angle; and a projection unit for making reflected light from the spatial light modulation element incident thereon and projecting the incident reflected light on a substrate. The illumination unit includes: a condensing optical member which condenses light from a surface light source having a predetermined shape, and irradiates the spatial light modulation element the with light in a tilted manner, is arranged along an optical axis inclined at an incident angle relative to the optical axis of the projection unit, and optically conjugates the surface light source with the pupil of the projection unit; and a correction optical member which deforms the shape of the contour of the surface light source so as to correct that the contour of the image of the surface light source formed on the pupil of the projection unit is distorted into an oval shape according to the incident angle by reflected light from the micromirrors in an ON state of the spatial light modulation element.SELECTED DRAWING: Figure 31

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