Gas barrier film

JP2025080417APending Publication Date: 2025-05-26TOPPAN HOLDINGS INC
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Patent Information

Application Number
JP2023193538
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2023-11-14
Publication Date
2025-05-26

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Abstract

To provide a gas barrier film comprising a gas barrier layer containing silicon oxide, while exhibiting stable water vapor barrier properties.SOLUTION: A gas barrier film 1 comprises a base layer 10 and a gas barrier layer 20 formed on the base layer and containing silicon oxide. The gas barrier layer has, in an infrared absorption spectrum from the surface side, a ratio of the peak area of the absorption peak at 2100 cm-1 or more and 2200 cm-1 or less derived from Si-H bonds to the peak area of the absorption peak at 720 cm-1 or more and 1320 cm-1 or less derived from Si-O-Si bonds, which is 0.003 or less.SELECTED DRAWING: Figure 1
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