Blank mask and method of fabricating the same
JP2025094190APending Publication Date: 2025-06-24SK ENPULSE CO LTD
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Patent Information
- Application Number
- JP2025049103
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2023-04-17
- Filing Date
- 2025-03-24
- Publication Date
- 2025-06-24
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Figure 2025094190000001_ABST
Abstract
To provide an apparatus for fabricating a blank mask that can provide a photomask having low defect occurrence, improved number of uses, and can provide high precision and a method of fabricating the blank mask, and to provide a method for fabricating a blank mask.SOLUTION: The embodiment presents a method of fabricating a blank mask, the method including the steps of: forming a light-shielding film on a light-transmissive substrate 10 to form an optical substrate; forming a photoresist layer on the light-shielding film; and removing droplets, generated in the forming of the photoresist layer, from a side surface of the light-transmissive substrate 10, wherein the number of droplet-type adsorption, derived from the droplets, on the side surface of the light-transmissive substrate, is less than 3 per cm2.SELECTED DRAWING: Figure 1
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Citation Information
Patent Citations
Method for manufacturing photomask blank and photomask blank and photomask
KR1020120057488A
Substrate for mask blank, substrate with multilayer reflective film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and method for manufacturing semiconductor device
KR1020140130420A